基于正交试验设计的塑封球栅阵列器件焊点工艺参数与可靠性关系研究

基于正交试验设计法对塑封球栅阵列(PBGA)器件焊点工艺参数与可靠性关系进行了研究.采用混合水平正交表L₁₈(2×3⁷)设计了18种不同工艺参数组合的PBGA测试样件,进行了546小时、最大循环周数2140周的PBGA测试样件可靠性加速热循环试验.基于试验结果进行了极差分析和方差分析;研究了PBGA测试样件寿命的威布尔分布;采用有限元分析方法对热循环加载条件下PBGA焊点内应力应变分布进行了研究.试验结果表明失效焊点裂纹出现于焊点与芯片基板的交界面上.研究结果表明:样件规格对PBGA焊点可靠性有高度显著影响,芯片配重对PBGA焊点可靠性有显著的影响,焊盘直径和钢网厚度对PBGA焊点可靠性无显著影响;最优工艺参数组合为:S2D2G2M1和S2D2G2M2.有限元分析表明在热循环加载条件下PBGA器件内应力最大区域位于焊点与芯片基板的接触面上,裂纹首先在焊点与芯片基板的接触面处产生,有限元分析结果与试验结果相吻合.     

高导热氮化硅覆铜板在功率器件中的应用可靠性

采用活性金属钎焊技术制备Cu/Si3N4/Cu陶瓷覆铜板,在-65～150℃温度条件下经历500次温度循环后,基板无裂纹、翘起、起皮等缺陷.对基板进行微电子组装和可靠性试验,基板与芯片的焊接浸润性较好,焊接强度及长期可靠性满足标准要求.基板粘接元器件后无渗胶现象,且环境组考核合格.在基板上键合4种常用规格的铝丝,键合后...     

微波芯片元件的导电胶粘接工艺与应用

导电胶常用于微波组件的组装过程,其粘接强度、导电、导热和韧性等性能指标严重影响其应用范围.分析了导电胶的国内外情况和主要性能参数,总结了混合微电路对导电胶应用的指标要求.通过微波芯片元件粘接工艺过程,分析了导电胶的固化工艺与粘接强度和玻璃化转变温度的关系、胶层厚度与热阻的关系、胶点位置和大小与粘片位置控制等方面的影响关系.测试结果显示,经导电胶粘接的芯片元件的电性能和粘接强度等指标均满足设计和使用要求,产品具有较好的可靠性和一致性.     

粘接技术在微组装中的应用

本文讲述了微组装中粘接技术需采用性能良好的导电胶,从粘接理论入手,结合实施结果和实践经验,详细论述了如何选择适当的导电胶,并具体分析了粘接工艺中胶层厚度,固化温度、时间、压力及粘接表面对粘接强度,导电性、导热性和可靠性等的影响。     

金锡合金自动共晶焊接工艺参数优化研究

为了更好地控制共晶焊接空洞率和剪切力,提出了一种采用正交试验法优化自动共晶焊接参数的方法。对焊接温度、焊接时间、焊接压力三个关键参数采用正交法进行三因子两水平极差分析,得到了影响芯片金锡共晶焊接质量的主次因子及共晶焊接参数的最优组合。试验结果证明,使用优化的工艺参数,芯片焊接质量得到明显提升,共晶焊接区空洞率均值及芯片剪切力Cpk值均完全满足GJB548B的要求。     

基于组合参数分析的LED散热结构优化研究

为了提高LED的散热性能,利用数值计算软件Icepak对其散热过程仿真模拟。LED散热受众多结构参数影响,选定影响芯片结温的主要因素,并逐一进行模拟计算,确定目标函数随各变量的变化趋势。为了进一步合理设计散热主体结构,通过正交试验优化参数组合,分析肋片个数、肋片高度、散热器高度以及基板厚度等4个因素对芯片结温的综合影响,得到优化后的参数组合。将所得最优组合参数解模拟计算,与初始结构相比芯片结温降低了9.02℃,达到了优化目标。     

胶粘剂在SMT组装技术中的应用(续完)

6.3.3　印制电路板粘接强度受印制板的影响主要是与其表面清洁程度、阻焊层的类型及其与基板基材的粘接情况有关 ,一般很少有因粘胶剂与阻焊层不相容而影响粘接强度。如果阻焊层与基板基材间粘接不良 ,或者阻焊剂没有被正确固化 ,这样元件脱落的可能性大大增加 ,因此必须正确固化阻焊剂。同时如果基板表面存在严重的粉尘污染 ,亦会影响胶粘剂与基板的接合 ,致使粘接强度低下 ,因而必须保持基板表面清洁。6.3.4　固化过程要保证最高的粘接强度和可靠性 ,粘胶剂必须完成正确固化。大部分情况下 ,由于胶粘剂固化不良或未完全固化 ,在进行运输、…     

声表面波器件用粘片胶的试验研究

针对目前声表面波器件用粘接剂固化时间长、小尺寸(面积小于10mm2),芯片剪切强度低的问题,测试分析了988粘片胶热稳定性、材料放气和胶成分;研究了在不同的固化工艺条件下,988胶粘片胶对声表面波器件的小尺寸芯片剪切强度和声表面波滤波器带外抑制的影响。测试和研究结果表明,采用988粘片胶能够缩短固化周期,满足国军标规定的芯片剪切强度的要求,同时能使滤波器性能得到提升。     

各向异性导电胶粘接可靠性研究进展

介绍各向异性导电胶导电机理和粘接工艺,以及影响它的粘接可靠性因素和最佳参数的研究,如粘接温度、固化时间、粘接压力、粒子含量等。对各向异性导电胶粘接可靠性中的开路、短路、接触电阻与粘接压力和温度循环的关系进行了讨论,并介绍了各向异性导电胶可靠性的理论计算模型。     

再流焊高温对导电胶粘接工艺可靠性影响研究

该文描述了H20E导电胶粘接工艺优化为先粘接固化再回流焊接工艺流程后过程经过高温冲击,对该工艺流程下环氧胶粘接强度、电气连接可靠性进行验证.通过剪切强度评价、可靠性试验考核、接触电阻测试统计分析、电容粘接界面切面微观金相研究,表明工艺流程优化为先粘接再回流焊接,H20E导电胶粘接工艺满足可靠性需求.     

InSb红外探测器芯片金丝引线键合工艺研究

InSb红外探测器芯片镀金焊盘与外部管脚的引线键合质量直接决定着光电信号输出的可靠性,对于引线键合质量来说,超声功率、键合压力、键合时间是最主要的工艺参数。从实际应用出发,采用KS公司4124金丝球焊机实现芯片镀金焊盘与外部管脚的引线键合,主要研究芯片镀金焊盘第一焊点键合工艺参数对引线键合强度及键合区域的影响,通过分析键合失效方式,结合焊点的表面形貌,给出了适合InSb芯片引线键合质量要求的最优工艺方案,为实现InSb芯片引线键合可靠性的提高打下了坚实的基础。     

基于DOE和BP神经网络对Al线键合工艺优化

Al丝超声引线键合工艺被广泛地应用在大功率器件封装中,以实现大功率芯片与引 线框架之间的电互连.Al丝引线键合的质量严重影响功率器件的整体封装水平,对其工艺参数的优化具有重要工业应用意义.利用正交实验设计方法,对Al丝引线键合工艺中的三个最重要影响因数(超声功率P/DAC、键合时间t/ms、键合压力F/g)进行了正交实验设计,实验表明拉力优化后的工艺参数为:键合时间为40 ms,超声功率为25 DAC,键合压力为120g;剪切推力优化的工艺参数为:键合时间为50 ms,超声功率为40 DAC,键合压力为120 g.基于BP神经网络系统,建立了铝丝超声引线键合工艺的预测模型,揭示了Al丝超声键合工艺参数与键合质量之间的内在联系.网络训练结果表明训练预测值与实验值之间符合很好,检验样本的结果也符合较好,其误差基本控制在10%以内.     

导电胶粘接可伐载板工艺的仿真与优化

导电胶是一种很有潜力的互连材料,其粘接可靠性是制约其应用的主要因素。基于对某混频模块粘接失效的分析,探索温度试验条件及载板尺寸对可伐载板粘接可靠性的影响。通过仿真和试验设计,研究不同温度试验条件下不同尺寸载板在粘接界面处的应力分布情况,并优化了可伐载板粘接工艺。结果表明,温度试验条件越严苛,载板尺寸越大,可伐载板粘接可靠性越差,可采取环氧绝缘胶加固或柔性导电胶粘接的方式对其粘接工艺进行优化。     

高芯片键合质量与高生产率的新型银浆体系的研究

高键合强度与高生产率的银浆体系是芯片实现小型化、轻薄化的基础,本文研发了一种高芯片键合强度的新型银浆体系(银浆B),通过五元素三水平(53)正交实验,探讨了银浆量、点胶高度、芯片键合力、银浆固化时间、固化温度等五因素对芯片键合强度及结构的影响;以及基于实验设计(DOE)和响应曲面分析(RSM)等统计方法,分析了芯片键合的过程,优化了芯片键合过程的固化时间、固化温度和银浆量等参数。采用银浆B体系以及优化的制程参数,使得芯片键合强度制程能力指数(Cpk)从0.56提高到2.8。     

Effects of different bonding parameters on the electrical performance and peeling strengths of ACF interconnection

The effects of different bonding parameters, such as temperature, pressure, curing time, bonding temperature ramp and post-processing, on the electrical performance and the adhesive strengths of anisotropic conductive film (ACF) interconnection are investigated. The test results show that the contact resistances change slightly, but the adhesive strengths increase with the bonding temperature increased. The curing time has great influence on the adhesive strength of ACF joints. The contact resistance and adhesive strength both are improved with the bonding pressure increased, but the adhesive strengths decrease if the bonding pressure is over 0.25 MPa. The optimum temperature, pressure, and curing time ranges for ACF bonding are concluded to be at 180–200 °C, 0.15–0.2 MPa, and 18–25 s, respectively. The effects of different Teflon thickness and post-processing on the contact resistance and adhesive strength of anisotropic conductive film (ACF) joints are studied. It is shown that the contact resistance and the adhesive strength both become deteriorated with the Teflon thickness increased. The tests of different post-processing conditions show that the specimens kept in 120 °C chamber for 30 min present the best performance of the ACF joints. The thermal cycling (−40 to 125 °C) and the high temperature/humidity (85 °C, 85% RH) aging test are conducted to evaluate the reliability of the specimens with different bonding parameters. It is shown that the high temperature/humidity is the worst condition to the ACF interconnection.     

ALE法对InSb/GaAs异质薄膜电学性能的改进

以GaAs(100)为衬底,采用原子层外延(ALE)的方法在GaAs缓冲层和常规InSb外延层间引入85个周期约30 nm的InSb低温缓冲层,以快速降低InSb和GaAs界面间较大的晶格失配(14.6%)对外延层质量造成的不利影响,从而改进异质外延薄膜的电学性能。实验结果显示,ALE低温缓冲层能较快地释放晶格失配应力,降低位错密度。室温和77 K的Hall测试显示,引入低温ALE缓冲层生长的InSb/GaAs异质外延薄膜,其InSb外延层本征载流子浓度和迁移率等电学性能较常规的方法有着较大的改进。     

Processability and reliability of nonconductive adhesives (NCAs) in fine-pitch chip-on-flex applications

The use of NCAs to form direct contact interconnections between chip bumps and substrate pads have become a viable option in interconnection technology for fine-pitch applications. However, the primary concerns with NCAs are their long-term reliability, stability, and consistent electrical performance in particulate interconnections. Results of assembly process studies and environmental testing using NCAs on flexible substrates are analyzed and discussed herein. An extensive design experiment was performed to determine which process parameters were critical in obtaining good electrical connections. A reliability evaluation of NCAs for flexible substrate applications was carried out to gain more insight into the failure mechanisms of this type of interconnect. Pressure cooker test results showed that failures occurring in NCA joints are primarily due to moisture absorption, which could lead to interfacial delamination at the substrate/adhesive interface, accompanied by hygroscopic swelling. NCAs with lower coefficients of thermal expansion also exhibited better contact resistance stability during high-temperature storage tests.     

各向异性导电胶粘结工艺技术研究

分析了影响各向异性导电胶粘结可靠性的各因素,通过正交实验优化工艺参数,并在150℃高温贮存以及-65℃～150℃温度循环后对导电胶的剪切强度和接触电阻进行了可靠性实验。结果表明:影响ACA可靠性的主要因素导电粒子体积比例为15%,粘结温度200℃,时间10s,粘结压力为39.2N时,导电胶的剪切强度为286.2N,凸点的接触电阻为35mΩ。在可靠性试验后,导电胶的剪切强度满足GJB548B-2005的要求,接触电阻变化率小于5%。     

Role of bonding time and temperature on the physical properties of coupled anisotropic conductive-nonconductive adhesive film for flip chip on glass technology

Using thermosetting epoxy based conductive adhesive films for the flip chip interconnect possess a great deal of attractions to the electronics manufacturing industries due to the ever increasing demands for miniaturized electronic products. Adhesive manufacturers have taken many attempts over the last decade to produce a number of types of adhesives and the coupled anisotropic conductive-nonconductive adhesive film is one of them. The successful formation of the flip chip interconnection using this particular type of adhesive depends on, among factors, how the physical properties of the adhesive changes during the bonding process. Experimental measurements of the temperature in the adhesive have revealed that the temperature becomes very close to the required maximum bonding temperature within the first 1 s of the bonding time. The higher the bonding temperature the faster the ramp up of temperature is. A dynamic mechanical analysis (DMA) has been carried out to investigate the nature of the changes of the physical properties of the coupled anisotropic conductive-nonconductive adhesive film for a range of bonding parameters. Adhesive samples that are pre-cured at 170, 190 and 210 °C for 3, 5 and 10 s have been analyzed using a DMA instrument. The results have revealed that the glass transition temperature of this type of adhesive increases with the increase in the bonding time for the bonding temperatures that have been used in this work. For the curing time of 3 and 5 s, the maximum glass transition temperature increases with the increase in the bonding temperature, but for the curing time of 10 s the maximum glass transition temperature has been observed in the sample which is cured at 190 °C. Based on these results it has been concluded that the optimal bonding temperature and time for this kind of adhesive are 190 °C and 10 s, respectively.