O76mm智能剥离SOI材料的制备及其表面缺陷的分析

结合硅片低温键合和中等剂量的氢离子注入,用智能剥离技术（Ｓｍａｒｔ－ｃｕｔ○Ｒ）成功地制备了７６ｍｍ的ＳＯＩ材料．用原子力显微镜（ＡＦＭ）测得表面粗糙度约为７ｎｍ,比普通的抛光硅片约大一个数量级．ＳＯＩ上层硅膜存在表面缺陷,包括未转移区和气泡等,这是由剥离前硅片键合界面存在的空洞引起．通过改进低温键合工艺,提高键合质量,可得到基本无宏观表面缺陷的ＳＯＩ材料．     

硅片直接键合制作SOI结构的工艺研究

硅片直接键合制作ＳＯＩ结构的工艺研究＝［刊，俄］１９９４，２３（６）．－４６～５４本文研究了硅片热压键合前化学处理原始硅表面对低温下表面半粘附键合质量和ＳＯＩ结构质量的影响。采用二次离子质谱方法分析硅片直接键合形成的ＳＯＩ结构中的杂质分布剖面表明，在...     

φ76mm智能剥离SOI材料的制备及其表面缺陷的分析

结合硅片低温键合和中等剂量的氢离子注入,用智能剥离技术成功地制备了φ７６ｍｍ的ＳＯＩ材料,用原子力显微镜（ＡＦＭ）测得表面粗糙度约为７ｎｍ,比普通的抛光硅片约大一个数量级。ＳＯＩ上层硅膜存在表面缺陷,包括未转移区和气泡等,这是由剥离前硅片键合界面存在的空洞引起。通过改进低温键合工艺,提高键合质量,可得到基本无宏观表面缺陷的ＳＯＩ材料。     

超净硅片表面化学清洗工艺的优化研究

本文采用正交试验设计法优化硅片化学清洗工艺，由Ｘ光电子能谱（ＸＰＳ）检测清洗后的硅表面沾污杂质．结果表明，硅表面主要沾污杂质氧和碳的最低含量分别为１e１３／ｃｍ２和３．１e１３／ｃｍ２，均达到超净的水平（～３e１３／ｃｍ２）．本文还研究了Ⅰ号液和Ⅱ号液对硅片表面沾污的影响．     

超净硅片表达化学清洗工艺的优化研究

本采用正交试验设计法优化硅片化学清洗工艺，由Ｘ光电子能谱（ＸＰＳ）检测清洗后的硅表面沾污杂质，结果表明，硅表面上主要沾污杂质氧和碳的最低含量 １．６×１０＾１３／和３．１×１０＾１３／ｃｍ，均达到超净的水平。本还研究了Ｉ号和Ⅱ液对硅片表面沾污的影响     

SiO_2钝化腹对硅／玻璃静电键合的影响

本文分析了硅／玻璃静电键合过程中硅表面ＳｉＯ２钝化膜的作用．ＳｉＯ２膜的存在使键合过程中的静电力减弱，键合工艺所选择的电压上限受ＳｉＯ２膜击穿电压的控制，对于商用抛光硅片与玻璃，要完成良好的键合，一般ＳｉＯ２厚度要小于０．５μｍ．     

取代苯基硫脲在Au表面自组装单分子膜的AFM观察

采用自组装（ＳＡ）技术制备了对甲苯基硫脲、对氯苯基脲和２，４，６－三溴苯基硫脲Ａｕ表面的自装单分子膜（ＳＡＭｓ）。在Ａｕ－溶液界面，硫脲Ｓ原子与Ａｕ－Ｓ键诱导吸附分子形成取向在序排列的单分子膜。用原子力显微镜（ＡＦＭ）对单分子膜进行了直接观察，ＡＦＭ所获得的结构信息与椭圆偏振测量、接触角测量和Ｘ－射线光电子能谱（ＸＰＳ）分析结果一致。     

InP表面等离子体CVD淀积SiO2膜的界面结构及C—V特性

报道了以正硅酸乙酯（ＴＥＯＳ）为源，采用等离子体增强化学汽相淀积（ＰＥＣＶＤ）技术在ＩｎＰ表面低温生长ＳｉＯ２钝化膜。对ＳｉＯ２／ＩｎＰ界面态进行了Ｘ射线光谱（ＸＰＳ）分析和Ｃ－Ｖ特性研究。     

直接光CVD类金刚石碳膜的初期成膜结构

以微波激励氙（Ｘｅ） 发射的真空紫外光（ＶＵＶ） 作光源,乙炔（Ｃ２Ｈ２） 作反应气体,采用直接光化学汽相淀积（ＣＶＤ） 工艺,在硅（Ｓｉ） 、钼（ Ｍｏ） 及玻璃衬底上,１２０ ℃的低温下进行了类金刚石碳（ＤＬＣ） 膜的试生长。用Ｘ 射线光电子能谱（ＸＰＳ） 、扫描电子显微镜（ＳＥＭ） 等手段进行了初期成膜结构的测试分析。测试结果表明,在所有三种衬底上均能淀积生成ＤＬＣ 膜。其中Ｃ１ｓ 态原子的含量在６９ ．９８ ％ ～７４ ．６０ ％ 之间,相应的键合能为２８５ ．０ ～２８５ ．６ ｅＶ。淀积膜是以ＳＰ２ 键结构为主的ＤＬＣ膜。实验结果也表明,氧在成膜过程中是影响最大的因素。     

清洗后硅片表面的电子结构

介绍了一种含表面活性剂和螯合剂的新型半导体清洗剂和清洗工艺。利用红外吸收谱、X射线光电子谱和原子力显微镜等 ,把它和标准 RCA清洗工艺的清洗效果做了比较。测试结果表明 ,经清洗过的硅片表面主要是由硅、氧和碳三种元素组成 ,它们分别以 Si-O键、C-O键和 Si-C键的形式存在。两种清洗技术都在硅片表面产生氧化硅层 ,在硅片表面都存在有机碳污染 ,但新型半导体清洗工艺产生的有机碳污染少于标准 RCA清洗。在对硅片表面的粗糙化影响方面 ,新型半导体清洗技术清洗明显优于标准 RCA清洗技术     

Inner Ammonium Salt Carbocyanine Films on Si Surface and Their Photoelectric Properties

Two inner salt carbocyanines were filmed chemically on the Si surface through Si-O-C bond.The structures were characterized by SERS and XPS.And the spectral response and surface photovoltage spectrum were measured.These results show that the Si wafer can be sensitized by dyes.and the filmed Si wafers have photovoltage effect.     

气体吸附对SnO2／Si光电压的影响

测量了ＳｎＯ２／Ｓｉ表面吸附Ｈ２、液化石油气等还原性气体前后光电压的变化；分析了ＳｎＯ２／Ｓｉ表面的吸附性和机理。     

Effect of low-temperature interphase charge transport at the Si/SiO2 interface on the photoresponse of silicon barrier structures

The effect of low-temperature electron charge redistribution at the Si/SiO₂ interface between the interphase states and the conduction band of an n-Si crystal on the temperature behavior of conductance, photovoltage, and photocurrent in Si barrier structures with edge surface electron channels was studied in the temperature range of 77–300 K. The dynamics of the channel-current response to the voltage changes in the dark and under illumination can be explained qualitatively by dispersive hopping transport of holes in SiO₂, which induces electron transfer to, and accumulation at, the Si surface near the barrier contact. The leveling off of the photovoltage at low temperatures and the nonmonotonic temperature dependence of the photocurrent are attributed to the nonmonotonically increasing, localized hole density at the Si/SiO₂ interface and the free electron density at the Si surface with decreasing temperature, which reflects changes in the valence of oxygen complexes.     

GexSi1—x／Si量子阱和超晶格红外光电压谱

采用电容耦合法,在18～300K 温度范围内测量了一系列 Ge_xSi_(1-x)/Si应变层多量子阱和 Ge/Si 超薄超晶格在不同温度下的红外光电压谱。实验结果表明,在长波段有强的光电压信号。文中还对 Ge_xSi_(1-x)/Si 量子阱和超晶格的能带排列和光伏效应作了讨论。     

From Geometry to Activity: A Quantitative Analysis of WO3/Si Micropillar Arrays for Photoelectrochemical Water Splitting

The photoelectrochemical (PEC) activity of microstructured electrodes remains low despite the highly enlarged surface area and enhanced light harvesting. To obtain a deeper understanding of the effect of 3D geometry on the PEC performance, well‐defined WO₃/n‐Si and WO₃/pn‐Si micropillar arrays are fabricated and subjected to a quantitative analysis of the relationship between the geometry of the micropillars (length, pitch) and their PEC activity. For WO₃/n‐Si micropillars, it is found that the photocurrent increases for WO₃/n‐Si pillars, but not in proportion to the increase in surface area that results from increased pillar length or reduced pillar pitch. Optical simulations show that a reduced pillar pitch results in areas of low light intensity due to a shadowing effect. For WO₃/pn‐Si micropillar photoelectrodes, the p–n junction enhances the photocurrent density up to a factor of 4 at low applied bias potential (0.8 V vs RHE) compared to the WO₃/n‐Si. However, the enhancement in photocurrent density increases first and then decreases with reduced pillar pitch, which scales with the photovoltage generated by the p–n junction. This is related to an increased dead layer of the p–n junction Si surface, which results in a decreased photovoltage even though the total surface area increases.     

二氧化锡/多孔硅/硅光伏特性研究

测量了二氧化锡（SnO2）／多孔硅（PS）／硅（Si）的光电压谱，分析表明：在SnO2／PS／Si材料中存在着两个异质结；当样品吸附还原性气体时，其光电压明显下降。当样品在1％液化石油气的氛围时（相对于空气），光电压减少了16．4％-27．5％；在1％CO氛围时，减少了8．1％-19．4％；在1％H2氛围时，减少了12．1％-14．9％，因此SnO2／PS／Si可作为一种新的敏感元件。文中还对测量结果进行了讨论分析。     

SnO2/PS/Si吸附气体前后的光伏谱变化

制备了二氧化锡／ 多孔硅／ 硅（ＳｎＯ２／ＰＳ／Ｓｉ） 异质结构样品,在不同温度下,分别测量样品吸附氢气、液化石油气前后的光生电压谱。结合Ｘ 光电子能谱（ＸＰＳ） 测量结果,分析了光生电压谱变化的机理     

SnO2/PS/Si吸附气体前后的光伏谱变化

SnO₂/PS/Si heterojunction structure samples are fabricated.The photovoltage spectra of the samples during prior-and post-adsorption of H₂ or liquified petroleum at different temperature are measured.In combination with the results of XPS measurement,analysis on the variation mechanism of the photovoltage spectra is made.     

Surface photovoltage analysis of ZnO nanorods/p-Si heterostructure

In this work, n-type ZnO nanorods (NRs) were fabricated on a p-type Si substrate to form a ZnO NRs/Si structure using a low-temperature wet chemical bath deposition method. Kelvin-probe-based surface photovoltage (KP-based SPV) technology was used to study the behavior of surface photogenerated charges for the as-grown heterostructure. In general, the KP-based SPV response range of the ZnO NRs/Si structure was significantly expanded compared with the bare Si substrate, due to the incorporation of ZnO NRs. Moreover, the SPV response amplitude for ZnO NRs/Si structure also depended on the length and diameter of the NRs, and the corresponding mechanism was elucidated in terms of O₂ adsorption. The photovoltaic application of the ZnO NRs/Si based structure would benefit significantly from these achievements.     

量值恒定的表面光电压法测量半导体少子扩散长度的研究

为了在保持材料完整性的基础上,对单晶硅材料的质量进行评价,设计了一种利用表面光电压测量半导体少子扩散长度的系统.系统采用斩波器、单色仪和锁相放大器来获取半导体表面光电压信息,利用表面光电压与材料的光吸收系数的关系得出半导体少子扩散长度,重点阐述了系统的测量原理及各个模块的设计与实现方法.检测结果表明,量值恒定的表面光电压法用于测量半导体少子扩散长度能达到预期的效果.