Cu掺杂量对Zn-Cu共掺TiO2薄膜光学带隙的影响

采用溶胶-凝胶旋涂法,分别以钛酸四丁酯(Ti(O C₄H₉)₄)为钛源、硝酸锌(Zn(NO₃)₂·6H₂O)为锌源、硝酸铜(Cu(NO₃)₂·3H₂O)为铜源制备了不同掺杂量的Zn、Cu共掺TiO₂薄膜。分别采用X射线衍射仪(XRD )、薄膜测厚仪、紫外-可见分光光度计(UV-Vis)对所制备的样品进行表征。结果表明 :与本征TiO₂和2.0 at%Zn²⁺-TiO₂相比,Cu²⁺的掺 杂减小了样品的晶面间距及晶粒尺寸、增加了样品的半高宽及比表面积,进而提高了薄膜的 光催化活性能。随着Cu²⁺掺杂量的增加,样品沿(101)晶面择优取向先增强后减弱 ,薄膜的吸光度呈现先升高后降低的趋势,TiO₂的 带隙值由3.424 eV减小到3.325 eV。与本征TiO₂和2.0 at%Zn²⁺-TiO₂相比 ,2.0at%Zn²⁺－1.0 at%Cu²⁺-Ti O₂的样品结晶度最好,(101)晶面择优取向最佳,薄膜表面的缺陷较少、较为均匀平整 且吸光度更好,光学带隙值最小为3.325 eV。     

退火温度对电子束沉积Ag/TiO2薄膜光学性质和光催化性能的影响

研究了退火温度对电子束制备Ag/TiO₂薄膜光学 性质和光催化性能的影响。在石英玻璃、硅片 上沉积了Ag/TiO₂复合薄膜,在空气氛围下,进行了400℃, 500℃的退火一小时.用紫外-可见分光光度 计、X射线衍射仪(XRD) 、原子力显微镜(AFM)对沉积和退火后的薄膜分别进行光学、结构、 形貌分析。结 果表明:300℃下制备的Ag/TiO₂复合薄膜为无定形结构,400℃以上薄呈多晶态。吸光度和表面粗糙度 随退火温度的增加而增大,薄膜的光学带隙随退火温度的增加而减小。锐钛矿相表现出了更 好的光催化性能。     

Al/N共掺杂TiO2薄膜的制备及光学性能

采用溶胶-凝胶旋涂法(Sol-Gel Spin-Coating Method)制备了Al掺杂量为3.00at%,N掺杂量分别为6.00at%,7.00at%,8.00at%和9.00at%的Al/N共掺杂TiO₂薄膜样品。对样品测试的结果表明,共掺杂样品依旧保留了TiO₂的基本结构,并且Al/N共掺杂样品的晶粒尺寸有不同程度的减小,使样品表面得以修饰,变得更加均匀、平整。共掺杂样品吸收边都出现了不同程度的红移,在紫外光区以及可见光区的吸光性都有所增强。N掺杂量为7.00at%时,(101)衍射峰值最大,峰型最尖锐,所得到的TiO₂薄膜的光学性能最好。共掺杂后的样品与本征TiO₂相比带隙值都有所减小,且最小值为2.873eV。以上结果表明Al/N共掺杂TiO₂薄膜使其光学性能得到了改善。     

Ti掺杂对Sb2Te3薄膜的结构及光学性质的调控

对Sb₂Te₃薄膜的结构、线性光学及非线性吸收性质的Ti掺杂影响进行了系统性探究。利用磁控溅射和高温退火手段制备了不同Ti掺杂浓度的晶态Sb₂Te₃薄膜。X射线光电子能谱分析显示Sb₂Te₃薄膜中的Ti元素以Ti⁴⁺化学态以TiTe₂的形式存在。线性光学性质结果表明,在保持非线性器件中宽工作波长特性的同时,Ti掺杂可以提高Sb₂Te₃薄膜的透射率,并降低光学带隙从1.32 eV至1.25 eV,根据Burstein-Moss理论,这取决于载流子的减少。利用自主搭建的开孔Z扫描系统,测试了薄膜样品在132 GW/cm²强度下800 nm飞秒激光激发的非线性吸收性质,结果显示的Ti掺杂引起的饱和吸收可调谐行为可归因于光学带隙减小与晶化抑制的竞争效应。此外,Ti掺杂将Sb₂Te₃薄膜的激光损伤阈值从188.6 GW/cm²提高到了265.5 GW/cm²。总而言之,Ti掺杂Sb₂Te₃薄膜在非线性光学器件领域具有广泛的应用前景。     

退火温度对银-二氧化硅核壳(Ag@SiO2/TiO2)薄膜结构，光学特性以及光催化性能的影响

局部表面等离子共振广泛应用于光催化和太阳能 电池等领域。采用电子束和热沉积技 术,在融石英和Si片上制备了Ag@SiO₂/TiO₂薄膜。在300 ℃,400 ℃,500 ℃,600 ℃ 温度下,薄膜在空气氛围下退火2h。采用拉曼光谱仪,紫外-可见分光光度 计(UV-Vis)等手段对微结构,光学性能等特性进行了表征。利用能谱仪测定了元素成分及含 量。考察了薄膜在水溶液中降解甲基橙的光催化活性。结果表明:Ag@SiO₂/TiO₂薄膜具有优 异的光催化性能。测试结果表明:在250℃下制备的TiO₂薄膜为无定形结构;在本实验条 件下,随着退火温度的升高,薄膜呈锐钛矿结构;锐钛矿相表现出了更好的光催化性能。     

Ag掺杂对TiO2薄膜光学性能的影响

氧化钛(TiO₂)作为一种重要的半导体材料可应用于多个领域。实验通过溶胶-凝胶旋 涂 法,分别用钛酸丁酯(Ti(OC₄H₉)₄)提供钛源、硝酸银(AgNO₃)提供银源,制备了TiO ₂的本征 和Ag单掺的薄膜样品。样品的结构、表面形貌及光学性能分别采用X射线衍射仪(X-ray diffractometer,XRD)、扫描电子显微镜(scanning electron microscope,SEM)、紫外- 可见分光光 度计(ultraviolet-visible spectrophotometer,UV-Vis)进行分析、表征。结果表明: 所制备的样 品均为锐钛矿相且沿(101)晶面取向择优生长。与本征TiO₂相比,Ag⁺的掺杂并没有改变 衍 射峰的峰位或出现杂峰,样品的晶粒尺寸相对减小、晶面间距及半高宽均有所增大;样品的 表面得到修饰,缺陷减少,变得更为致密、均匀、晶粒之间的排列更加有序;样品的吸收边 出现红移的现象,带隙能减小。当Ag⁺掺杂量为1.5 at%时,样品的性能相对较好,表现为 (101) 衍射峰最为尖锐,晶粒尺寸最小,薄膜间的孔隙最少,禁带宽度最小为3.476 eV。     

非稀土红色荧光粉Mn4+:Li2TiO3发光特性研究

利用高温固相法成功合成了非稀土类红色荧光粉 Mn⁴⁺:Li₂TiO₃,并对所制得的样品进行X射线衍射(XRD)、吸收谱和荧光发射谱等 表征。在波长为475nm的LED蓝光照射时,获得了最大强度位于〖J P 〗682nm波长处的红色荧光,量 子效率约为10%,其对应Mn⁴⁺自旋²Eg→⁴A 2g。计 算了晶体场强度因子Dq和Racah参数B、C,并据此分析了Mn⁴⁺在Li₂TiO₃中的电 子云重排效应。通 过改变掺杂浓度,分析了Mn⁴⁺掺杂在Li₂TiO₃中的浓度淬灭效 应。最后进行了LED白光性能 测试。     

空位缺陷金红石型TiO2电子结构和光学性质的理论研究

基于密度泛函理论(DFT)的第一性原理模守恒赝势 方法,对纯金红石型TiO₂和Ti、O两种空位缺 陷相的几何结构、能带结构、态密度(DOS)以及光学性质进行了 系统地对比研究。结果发现,含有空 位缺陷的TiO₂键长增大,原子布局值减小并出现微弱的磁性;空位缺陷导致导带变窄,导 带和价带 都向低能级方向移动,由空位原子贡献的载流子增强了体系的电导率,费米能级上移进入导 带;与 纯金红石型TiO₂的直接带隙宽度(3.0eV)相比较,Ti空位缺陷相转 变为P型半导体且直接带隙为1.816 eV,而O空位缺陷相转变为n型半导体且间接带隙为1.961eV。同时, 两种空位缺陷结构的介电峰显 著红移,折射率有明显变化,对可见光区的吸收系数均比纯TiO₂高。与O空位结构相比,Ti 空位结构的 介电常数、折射率、消光因子和对可见光的吸收强度更大,更能增强电子在低能端的光学跃 迁,具有更佳的可见光催化性能。     

用热蒸发法制备的Cu2ZnSnS4 薄膜的光电性能

在室温下用真空热蒸发法在玻璃基片上制备Sn/Cu/ZnS 前躯体膜层,然后对其在550C 下在硫气氛中硫化3小时以制得Cu₂ZnSnS₄ (CZTS) 多晶薄膜。对该薄膜进行X射线衍射（XRD）、能量色散X射线光谱（EDX）、紫外可见近红外分光光度计、霍尔测量系统和3D光学显微镜等分析测试。实验结果表明,当[Cu]/([Zn] [Sn]) =0.83和[Zn]/[Sn] =1.15时,该CZTS薄膜在光子能量范围在1.5 - 3.5 eV 时其吸收系数大于4.010₄cm_-1 ,直接带隙为1.47 eV。其载流子浓度、电阻率和迁移率分别为7.9710₁₆ cm_-3, 6.06 Ω.cm, 12.9 cm₂/(V.s), 导电类型为p型。因此,所制备出的CZTS 薄膜适合作为太阳电池的吸收层材料。     

溶胶-凝胶旋涂法制备In掺杂ZnO薄膜结构和光学性能的研究

采用溶胶-凝胶(sol-gel)旋涂法在常规玻璃衬底 上生长了In掺杂浓度分别为1at%、2at%、3at%、4at%、5at%的ZnO薄膜。借助X射线衍射仪(X RD)、扫描电子显微镜(SEM)、紫外- 可见分光光度计(UV-Vis)对样品的晶粒生长、结构以及光学性能进行表征。结果如下:所 制 备的薄膜均沿(002)方向择优生长,且随着In³⁺掺杂浓度增加 ,衍射峰的峰型及半高宽均呈 先降低后升高的趋势;In³⁺掺入后,ZnO薄膜晶粒由原来的六边形状发展成类似蠕虫 状,同 时粒径变小且大小不一;与本征样品相比,掺杂后的ZnO光透过率提高了10%,且吸收边向短 波长方向偏移,同时随着In³⁺的掺入,薄膜的光学带隙值从3.49 eV增加到3.80 eV。当In³⁺掺 杂浓度为4at%时,薄膜(002)峰的峰形最为尖锐、峰值最大,晶粒较为均匀、 晶格间距更小,光透过率最高,光学带隙值相对较大为3.77 eV。     

Effect of sputtering power on optical properties of prepared TiO2 thin films by thermal oxidation of sputtered Ti layers

In this research, TiO₂ thin films prepared via thermal oxidation of Ti layers were deposited by RF-magnetron sputtering method at three different sputtering powers. The effects of sputtering power on structure, surface and optical properties of TiO₂ thin films grown on glass substrate were studied by X-ray diffraction (XRD), atomic force microscopic (AFM) and UV–visible spectrophotometer. The results reveal that, the structure of layers is changed from amorphous to crystalline at anatase phase by thermal oxidation of deposited Ti layers and rutile phase is formed when sputtering power is increased. The optical parameters: absorption coefficient, dielectric constants, extinction coefficient, refractive index, optical conductivity and dissipation factor are decreased with increase in sputtering power, but increase in optical band gap is observed. The roughness of thin films surface is affected by changes in sputtering power which is obtained by AFM images.     

Nitrogen-doped Ge<Subscript>2</Subscript>Sb<Subscript>2</Subscript>Te<Subscript>5</Subscript> films for nonvolatile memory

Nitrogen-doped Ge₂Sb₂Te₅ (GST) films for nonvolatile memories were prepared by reactive sputtering with a GST alloy target. Doped nitrogen content was determined by using x-ray photoelectron spectroscopy (XPS). The crystallization behavior of the films was investigated by analyzing x-ray diffraction (XRD) and differential scanning calorimetry (DSC). Results show that nitrogen doping increases crystallization temperature, crystallization-activation energy, and phase transformation temperature from fcc to hexagonal (hex) structure. Doped nitrogen probably exists in the grain vacancies or grain boundaries and suppresses grain growth. The electrical properties of the films were studied by analyzing the optical band gap and the dependence of the resistivity on the annealing temperature. The optical band gap of the nitrogen-doped GST film is slightly larger than that of the pure GST film. Energy band theory is used to analyze the effect of doped nitrogen on electrical properties of GST films. Studies reveal that nitrogen doping increases resistivity and produces three relatively stable resistivity states in the plot of resistivity versus annealing temperature, which makes GST-based multilevel storage possible. Current-voltage (I-V) characteristics of the devices show that nitrogen doping increases the memory’s dynamic resistance, which reduces writing current from milliampere to microampere.     

溅射气压对氧化镓薄膜光学特性的影响

采用射频磁控溅射法在石英衬底上制备了氧化镓(Ga2O3)薄膜.利用X射线衍射仪和紫外-可见-红外分光光度计分别对Ga2O3薄膜的晶体结构和光学带隙进行了表征,并在室温下测量了 Ga2O3薄膜的光致发光(PL)谱.结果表明:制备的Ga2O3薄膜呈非晶态.吸收边随着溅射气压的增加先蓝移后红移,光学带隙值范围为5.06～5.37 eV,溅射气压为1 Pa时,制备的Ga2O3薄膜具有最大的光学带隙.在325 nm激光激发下,400 nm附近和525 nm附近处出现与缺陷能级相关的发光峰.     

Preparation and characterization of TiO2 thin film by thermal oxidation of sputtered Ti film

Titanium dioxide (TiO₂) thin films were successfully prepared on quartz substrate by thermal oxidation of sputtered titanium film in air. The structure, composition, morphology and optical properties of oxidized TiO₂ films were characterized by Raman spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and UV-visible spectroscopy. Meanwhile, the photocatalytic activity of the films was evaluated on the basis of the degradation of methyl orange solution under UV irradiation. Ti films after oxidation present mainly in TiO₂ form with a larger amount of adsorbed O₂, and oxidation temperature has a strong impact on the crystal structure and properties of the films. A phase transformation of anatase to rutile for oxidized TiO₂ films occurred in the temperature range of 700–800 °C. The energy band gap of oxidized TiO₂ films decreased first and then increased with annealing temperature. Furthermore, TiO₂ film oxidized at 600 °C exhibited the best photocatalytic activity due to suitable crystal phase and size. These results might contribute to the synthesis of metal oxide thin films with expectant structural morphology and properties by thermal oxidation methods.     

用溶胶-凝胶法制备的Cu2Bi2Cr2O8薄膜 及其光学和铁磁性能研究

以硝酸铜Cu(NO₃)₂·3H₂O、硝酸铬Cr(NO₃)₃·9H₂O、硝酸铋Bi(NO₃)₃·3H₂O和乙二醇为原料,利用溶胶-凝胶工艺在石英衬底上制备了纳米Cu₂Bi₂Cr₂O₈薄膜。通过X射线衍射(X-Ray Diffraction, XRD)和拉曼测试对样品进行了表征。结果表明,Cu₂Bi₂Cr₂O₈薄膜具有良好的光学特性,其禁带宽度为1.49 eV;在磁性测试方面,Cu₂Bi₂Cr₂O₈薄膜呈现出了良好的铁磁性。     

Chemical compositions and optical properties of HfOxNy thin films at different substrate temperatures

High-k HfO_xN_y thin films have been grown by radio frequency (rf) reactive sputtering of metal Hf target in N₂/Ar/O₂ ambient at different substrate temperatures. The chemical compositions of the films have been investigated as a function of substrate temperature by X-ray photoelectron spectroscopy (XPS). XPS measurements showed that nitrogen concentration increases with an increase in substrate temperature. Room-temperature spectroscopic ellipsometry (SE) with photon energy 0.75–6.5 eV was used to investigate the optical properties of the films. SE results demonstrated that refractive index n increases with an increase in substrate temperature. Based on TL parameters which were obtained from the best fit results used in a simulation of the measured spectra, meanwhile, we conclude that the energy band gap (E_g) decreases with an increase in substrate temperature.     

Effect of Sprayed Solution Flow Rate on the Physical Properties of Anatase TiO2 Thin Films

Titanium dioxide (TiO₂) thin films were synthesized on glass substrates by spray pyrolysis. The effect of solution flow rate on the physical properties of the films was investigated by use of x-ray diffraction (XRD), scanning electron microscopy, atomic force microscopy (AFM), and spectrophotometry techniques. XRD analysis revealed the tetragonal anatase phase of TiO₂ with highly preferred (101) orientation. AFM images showed that grain size on top of TiO₂ thin films depended on solution flow rate. An indirect band gap energy of 3.46 eV was determined by means of transmission and reflection measurements. The envelope method, based on the optical transmission spectrum, was used to determine film thickness and optical constants, for example real and imaginary parts of the dielectric constant, refractive index, and extinction coefficient. Ultraviolet and visible photoluminescence emission peaks were observed at room temperature. These peaks were attributed to the intrinsic emission and to the surface defect states, respectively.     

溅射压力对制备a-GaAs1-xNx 薄膜光学常数的影响

采用反应磁控溅射法在室温条件下制备了a-GaAs_1-xN_x 薄膜。实验测定了薄膜厚度、氮含量、载流子浓度和光学透过率及并研究了其随溅射压的变化。系统研究了溅射压对所制备薄膜的光学带隙、折射率和色散参数的影响。所制备的薄膜为直接带隙材料,利用Cauchy和Wemple模型能够很好地拟合所制备薄膜的折射率色散曲线。     

Hf掺杂锐钛矿TiO2电子结构的第一性原理研究

采用基于密度泛函理论的平面波超软赝势方法对Hf掺杂锐钛矿型TiO2的电子结构进行了第一性原理研究。对通过对能带和电子态密度的分析,发现在Hf掺杂后,导带底和价带顶同时降低,但是由于价带顶下降的比导带底多,从而使得锐钛矿型TiO2的禁带宽度变窄。     

NH3-Ar气氛下制备的Zn3N2薄膜的结构和光学性能

在NH3-Ar气氛下,用RF磁控溅射金属Zn靶在玻璃衬底上室温制备了Zn3N2薄膜,研究了NH3分压对Zn3N2薄膜的结构和光学特性的影响。XRD分析表明Zn3N2薄膜出现多晶结构,具有(321)择优取向。当NH3分压从5%变化到25%时,Zn3N2薄膜的间接光学带隙从2.33eV升高到2.70eV。室温下Zn3N2薄膜在437nm和459nm波长出现了发光峰,并对发光机理进行了分析。