热处理中Pr0.5Sr0.5MnO3薄膜的电学性能变化和应力弛豫

我们用脉冲激光法在(001)LaAlO3衬底上制备了Pr0.5Sr0.5MnO3薄膜,在900℃的空气中进行后退火处理,研究了退火前后薄膜的电磁性能和晶格结构变化.随着温度降低原位生长薄膜在低温段电阻率迅速上升,表现为绝缘体性质.磁化强度-温度曲线表明薄膜具有顺磁-铁磁-反铁磁的相变,并且存在相分离现象.相比之下,退火后薄膜随着温度降低只出现了顺磁绝缘体-铁磁金属相变,在低温区域一直表现为铁磁金属性.x光衍射实验发现退火使得薄膜在垂直于衬底表面方向的晶格伸长量明显减小,表明退火过程中发生了应力弛豫.为了搞清楚后退火中氧含量和应力弛豫的不同作用,我们进行了(110)SrTiO3衬底上Pr0.5Sr0.5MnO3薄膜的后退火对比实验,结果表明退火中的应力弛豫是导致退火前后薄膜电磁性质差异的主要原因.     

氧缺陷导致的结构无序对La_(2/3)Sr_(1/3)MnO_3薄膜电输运特性的影响(英文)

为了澄清结构无序对电输运特性,特别是低温下电阻极小的影响,采用脉冲激光沉积方法在LaAlO3(100)基片上制备了两类La2/3Sr1/3MnO3薄膜.一块是在通40Pa氧气的气氛下沉积,沉积后不再进行通氧气的原位退火.另一块在同样通40Pa氧气的气氛下沉积,但沉积后再在6×104Pa的氧气气氛下进行原位退火.对两种薄膜的结构,磁特性和电输运特性进行了对比研究.结果表明:氧缺陷导致了薄膜结构的无序,更导致了类似自旋玻璃行为的磁无序.电输运特性结果表明原位退火使得薄膜的金属-绝缘体转变温度Tc从约195K提高到335K.对由于结构无序的存在对低温电阻较小行为的影响作了系统对比研究,曲线拟合的结果表明对于缺氧薄膜和进行了原位退火的薄膜的低温电阻较小行为的主要影响因素分别是类近藤散射作用和电子-电子相互作用,这一结果对于澄清庞磁电阻锰氧化物体系的低温电阻极小现象有一定积极意义.     

氧气氛低温退火Pt/Ba0.8Sr0.2TiO3Pt引起的低频介电弛豫效应

研究了在不同温度区间氧气氛和氮气氛退火后处理对PtBa0.8Sr0.2TiO3Pt介电特性的影响.经过高温550℃氮气退火处理后,再放入350℃的氧气中退火,发现样品的介电特性出现了非常明显的低频弛豫现象,并且这种低频弛豫现象在350℃的氮气中退火后将会消失.通过在出现低频弛豫现象的样品的上下电极加一偏压,可以发现低频弛豫现象更加明显,并且在撤消偏压后这种增强将会逐渐减弱,直至最终恢复到偏压前的弛豫状态 关键词： 脉冲激光沉积 介电弛豫 动态随机存储器     

Y替代La2/3Ca1/3MnO3体系的结构与输运行为

系统研究了(La1-xYx)2/3Ca1/3MnO3(0.0≤x≤0.3)体系的结构和输运行为.结果表明，实验样品具有很好的单相结构，随Y掺杂浓度的增加，金属—绝缘体（M—I）转变温度T-MI向低温区移动，对应的峰值电阻率ρp升高，对x=0.3样品，较未替代样品（x=0.0）增幅达8个数量级.在外加磁场下，材料表现出很强的磁电阻效应.同时，从实验结果出发，直接给出了输运特性与晶体结构之间的关联，并从双交换模型和可变程跃迁理论出发，对实验结果进行了初步讨论. 关键词： La2/3Ca1/3MnO3锰氧化物 Y替代 晶体结构 输运行为     

Si基Bi3.25La0.75Ti3O12铁电薄膜的制备与特性研究

采用Sol-Gel工艺低温制备了Si基Bi_3.25La_0.75Ti₃O₁₂铁电薄膜.研究了退火温度对薄膜微观结构、介电特性与铁电性能的影响.500℃退火处理的Bi_3.25La_0.75Ti₃O₁₂薄膜未能充分晶化，晶粒细小且有非晶团聚，介电与铁电性能均较差.高于550℃退火处理的Bi_3.25La_{0.75 关键词： 铁电薄膜 3.25}La_0.75Ti₃O₁₂')" href="#">Bi_3.25La_0.75Ti₃O₁₂ Sol-Gel工艺     

SrTiO3同质外延过程中的反射高能电子衍射图案分析

在激光分子束外延实验中,用RHEED原位监测了SrTiO3基片初始、退火以及同质外延过程中的表面形态.通过对RHEED图案分析,获取了表面面内的晶格常数振荡与衍射条纹的半高宽振荡现象,前者是由退火重构表面与薄膜之间的界面造成的,后者与二维岛边界的弛豫相关.另外还观察到了等离子体对入射电子束的影响而导致的RHEED强度振荡行为的相位移现象. 关键词： 反射高能电子衍射 SrTiO3 表面晶格常数及衍射强度振荡     

La0.67Ca0.33MnO3多晶薄膜电流效应

研究了在不同电流下多晶La0.67Ca0.33MnO3薄膜的电输运特性.观察到电阻随着电流的增大而减小,在多晶样品中当外加电流为1mA时负的电电阻(ER)即达到30%.同时,电流对于磁阻(MR)也有影响.考虑多晶样品中晶界的作用,我们提出了极化电流传输模型,对所观察到的实验现象进行了解释.     

Si基Bi4Ti3O12铁电薄膜的制备与特性研究

采用sol-gel工艺, 在分层快速退火的工艺条件下成功地制备了高质量Si基Bi_{4Ti3O12铁电薄膜. 研究了Si基Bi4Ti3O12薄膜的生长行为、铁电性能、C-V特性和疲劳特性. 研究表明: Si基Bi4Ti3O12薄膜具有随退火温度升高沿c轴择优生长的趋势; 退火温度通过影响薄膜的晶粒尺寸、生长取向和薄膜中载流子的浓度来改变Si基Bi关键词： sol-gel法 铁电薄膜 4Ti3O12')" href="#">Bi4Ti3O12 C-V特性}     

嵌埋Ni颗粒的BaTiO_3/SrTiO_3薄膜的相变特性

采用高温X射线原位衍射和变温介电谱对SrTiO3基底上外延生长的BaTiO3(嵌埋Ni颗粒)薄膜进行了相变特性分析。从X射线衍射和介电谱的分析结果得出,BaTiO3的相变温度点转变为弥散的温度区间。在这个弥散的相变温度区间内,由于基底和薄膜之间的失配,以及嵌埋Ni颗粒的应力作用,薄膜的介电响应弥散剧烈,并偏离德拜弛豫。分析Cole-Cole图获知,BaTiO3薄膜在四方相转变为立方相的相变过程中同时存在几种极化机制,在高温状态下介电损耗随温度增大而增大。降温过程中,薄膜没有立即恢复四方相,可能是基底和Ni颗粒的共同作用影响了相变弛豫。     

不同退火温度下晶化硅薄膜的电学输运性质

采用等离子体化学气相沉积技术制备氢化非晶硅薄膜,经过不同温度下的热退火处理,使薄膜由非晶结构向晶化结构转变,得到含有纳米晶粒的晶化硅薄膜.在晶化过程中,采用Raman技术对样品的结构进行表征.通过变温电导率的测试,对薄膜的电学输运性质进行了分析.研究结果表明：退火温度为700 ℃时,样品中开始有纳米晶形成,随着退火温度的增加,样品的晶化比增大,在1000 ℃时,薄膜的晶化比达到90%以上.在700 ℃退火时,薄膜中晶化成分较低,载流子的传输特性主要受到与硅悬挂键有关的缺陷态影响,表现为带尾定域态的跳跃电导 关键词： 氢化非晶硅 退火 纳米硅 电输运     

Growth behavior of high k LaAlO3 films on Si by metalorganic chemical vapor deposition for alternative gate dielectric application

LaAlO₃ (LAO) is explored in this work to replace SiO₂ as the gate dielectric material in metal–oxide–semiconductor field effect transistor. Amorphous LAO gate dielectric films were deposited on Si (0 0 1) substrates by low pressure metalorganic chemical vapor deposition using La(dpm)₃ and Al(acac)₃ sources. The effect of processing parameters such as deposition temperature and precursor vapor flux on growth, structure, morphology, and composition of LAO films has been investigated by various analytical methods deeply. The film growth mechanism on Si is reaction limiting instead of mass transport control. The reaction is thermally activated with activation energy of 37 kJ/mol. In the initial growth stage, Al element is deficient due to higher nucleation barrier on Si. The LAO films show a smooth surface and good thermal stability and remain amorphous up to a high temperature of 850 °C. The electrical properties of amorphous LAO ultrathin films on Si have also been evaluated, indicating LAO is suitable for high k gate dielectric applications.     

Raman study of ultrathin Fe3O4 films on GaAs(001) substrate: stoichiometry,epitaxial orientation and strain

The growth and characterization of high‐quality ultrathin Fe₃O₄ films on semiconductor substrates is a key step for spintronic devices. A stable, single‐crystalline ultrathin Fe₃O₄ film on GaAs(001) substrate is obtained by post‐growth annealing of epitaxial Fe film with thicknesses of 5 and 12 nm in air. Raman spectroscopy shows a high ability to convincingly characterize the stoichiometry, epitaxial orientation and strain of such ultrathin Fe₃O₄ films. Polarized Raman spectroscopy confirms the unit cell of Fe₃O₄ films is rotated by 45° to match that of the Fe (001) layer on GaAs, which results in a built‐in strain of − 3.5% in Fe₃O₄ films. The phonon strain‐shift coefficient(−126 cm⁻¹) of the A_1g mode is proposed to probe strain effect and strain relaxation of thin Fe₃O₄ films on substrates. It can be used to identify whether the Fe layer is fully oxidized to Fe₃O₄ or not. Copyright © 2011 John Wiley & Sons, Ltd.     

Vacuum relaxation and annealing-induced enhancement of mobility of regioregular poly（3-hexylthiophene） field-effect transistors

In order to enhance the performance of regioregular poly(3-hexylthiophene) (RR-P3HT) field-effect transistors (FETs), RR-P3HT FETs are prepared by the spin-coating method followed by vacuum placement and annealing. This paper reports that the crystal structure, the molecule interconnection, the surface morphology, and the charge carrier mobility of RR-P3HT films are affected by vacuum relaxation and annealing. The results reveal that the field-effect mobility of RR-P3HT FETs can reach 4.17×10^ - 2~m²/(V.s) by vacuum relaxation at room temperature due to an enhanced local self-organization. Furthermore, it reports that an appropriate annealing temperature can facilitate the crystal structure, the orientation and the interconnection of polymer molecules. These results show that the field-effect mobility of device annealed at 150~℃ for 10 minutes in vacuum at atmosphere and followed by placement for 20 hours in vacuum at room temperature is enhanced dramatically to 9.00×10^ - 2 ~cm²/(V.s).     

应力下SmNiO_3钙钛矿氧化物薄膜材料的电导与红外光电导

稀土镍基钙钛矿氧化物RNiO_3(R为稀土元素)可以在温度触发下发生从电子游离态到局域态的金属绝缘体转变,这一特性在传感器,数据存储,调制开关等方面具有可观的应用价值.本文通过脉冲激光沉积法,在钛酸锶(SrTiO_3)、铝酸镧(LaAlO_3)单晶衬底上准外延生长热力学亚稳态镍酸钐(SmNiO_3)薄膜材料,利用薄膜与衬底间晶格失配引入界面应力,实现对SmNiO_3电子轨道结构与金属绝缘体相变温度的调节.结合电输运性质与红外透射实验的综合表征研究,论证了双向拉伸应变引起的晶格双向拉伸畸变,可以引起SmNiO_3的禁带宽度的展宽,从而稳定绝缘体相并提高金属-绝缘相转变温度.进一步结合近边吸收同步辐射实验表征,揭示了拉伸应变稳定SmNiO_3绝缘体相的本质在于Ni—O成键轨道在双向拉伸形变作用下的弱化,使得镍氧八面体中的价电子偏离镍原子从而稳定SmNiO_3的低镍价态绝缘体相.     

Effect of annealing on the structural, optical and electrical properties of ZnO thin films by spray pyrolysis

Zinc oxide thin films have been deposited on glass substrates at a substrate temperature of 673 K by spray pyrolysis. The samples are annealed in ambient atmosphere at various temperatures. The effect of annealing on structural, electrical, and optical properties of ZnO films has been investigated. X-ray diffraction patterns show that crystallinity of the ZnO films has been improved after annealing. The morphology of ZnO thin films is studied by atomic force microscopy. The tensile strain (compressive stress) is found to decrease with increase in annealing temperature which indicates the relaxation of tensile strain in ZnO thin films. A decrease in energy band gap is observed with increase of annealing temperature. The mechanism of blue-green luminescence of ZnO thin film has been analyzed. The resistivity is found to decrease with annealing temperature.     

Annealing effects on the structure and electrical characteristics of amorphous Er2O3 films

Amorphous Er 2 O 3 films are deposited on Si (001) substrates by using reactive evaporation.This paper reports the evolution of the structure,morphology and electrical characteristics with annealing temperatures in an oxygen ambience.X-ray diffraction and high resolution transimission electron microscopy measurement show that the films remain amorphous even after annealing at 700 C.The capacitance in the accumulation region of Er 2 O 3 films annealed at 450 C is higher than that of as-deposited films and films annealed at other temperatures.An Er 2 O 3 /ErO x /SiO x /Si structure model is proposed to explain the results.The annealed films also exhibit a low leakage current density (around 1.38 × 10 4 A/cm 2 at a bias of 1 V) due to the evolution of morphology and composition of the films after they are annealed.     

Microscopic structure and structuring of perovskite surfaces and interfaces: SrTiO3, RBa2Cu3O7-δ

3 surfaces and bicrystal interfaces and the growth of YBa₂Cu₃O_7-δ thin films on such substrates using scanning tunneling microscopy and X-ray diffraction. Proper annealing of SrTiO₃ in oxygen and/or ultrahigh vacuum produces uniformly terminated, atomically flat and well-ordered surfaces. For vicinal SrTiO₃(001) surfaces the particular annealing sequence and miscut angle sensitively determines the resulting step structure and thus the microscopic surface morphology. Steps of SrTiO₃(001) surfaces can be adjusted to a height of one, two, or multiple times the unit-cell height (a_STO=0.3905 nm). The growth of YBa₂Cu₃O_7-δ films on these substrates by pulsed laser deposition was traced from the initial nucleation to a thickness of about 300 nm. The morphology, texture, and defect structure of the films is determined by the specific structure and morphology of the pristine substrate. Anisotropic, planar defects, originating from substrate step edges, strongly modify the electronic transport properties of the film leading to critical currents up to ≈9×10⁷ A/cm² at 4 K as well as pronounced transport anisotropies. Surfaces and interface energy terms are discussed, which also determine the observed structure of bicrystal boundaries. Received: 16 April 1998/Accepted: 21 August 1998     

La0.67Ba0.33MnO3薄膜的激光辐照效应研究

利用脉冲激光沉积技术在LaAlO₃（00l）单晶衬底上制备了La_067Ba_033MnO₃薄膜,研究了CO₂激光辐照对La_067Ba_033MnO₃薄膜的微结构和磁电性能的影响.结果表明,经激光辐照后,La_067Ba_033MnO₃薄膜的结晶性增强,薄膜应变减小;薄膜表面形貌由“岛状”结构变为“平原"结构,且粗糙度大大降低;同时,薄膜的饱和磁化强度、铁磁居里温度、金属—绝缘态转变温度和磁电阻增大,而矫顽场和电阻率减小.根据对传统退火效应的分析和理论计算,认为激光辐照导致的表面微结构的变化以及薄膜的氧含量和均匀性的提高对La_067Ba_033MnO₃薄膜的磁电性能的改善与优化密切相关. 关键词： 庞磁电阻 激光辐照 脉冲激光溅射沉积     

Effect of annealing temperature on the decomposition of reactively sputtered Ag2Cu2O3 films

Ag₂Cu₂O₃ films were deposited on glass substrates by reactive sputtering of a composite silver-copper target. The deposited films were annealed in air at 100, 200 and 300 °C. The structure of the films was studied using X-ray diffraction (XRD), their surface morphology was characterised using scanning electron microscopy (SEM) and their electrical resistivity at room temperature was measured using the four point probe method. The 100 °C annealing did not modify either the film structure or the film morphology. On the other hand, Ag₂Cu₂O₃ films were partially decomposed into Ag and CuO after a 200 °C annealing. The decomposition was complete for a 300 °C annealing. The evolution of the film surface morphology as a function of the annealing temperature was discussed in connection to the evolution of the molar volume of the phases constituting the films.     

表面钝化前后Al0.22Ga0.78N/GaN异质结势垒层应变的高温特性

用高分辨X射线衍射仪(HRXRD)研究了表面钝化前后Al_0.22Ga_0.78N/ GaN异质结势垒层应变的高温特性，温度变化范围从室温到813K.结果表明，对未钝化的异质 结，当测试温度高于523K时，Al_0.22Ga_0.78N势垒层开始出现应变 弛豫；钝化后，在Al_0.22Ga_0.78N势垒层中会产生一个附加的平面 拉伸应变，并随着温度的增加，势垒层中的平面拉伸应变会呈现出一个初始的增加，接着应 变将减小，对100nm厚的Al_0.22Ga_0.78N势垒层，应变只是轻微地减 小，但对于50nm厚的Al_0.22Ga_0.78N势垒层，则出现了严重的应变 弛豫现象. 关键词： 0.22Ga_0.78N/GaN异质结')" href="#">Al_0.22Ga_0.78N/GaN异质结 应变 3 N₄钝化')" href="#">Si₃ N₄钝化 高温XRD