Light‐trapping properties of patch textures created using laser assisted texturing

For crystalline silicon solar cells, the efficient collection of light at wavelengths in the infrared is a challenge because of long absorption lengths. Especially for thinner wafers, an efficient light‐trapping scheme, such as the patch texture, is required for high short‐circuit current densities. We have measured the light‐trapping properties of patch textures produced by laser assisted texturing (LAST) on polished ⟨100⟩silicon wafers, and compared them with ray‐tracing simulations. Single‐sided random pyramid textures are created for comparison. Excellent agreement between simulations and measurements is achieved by employing diffuse scattering with a narrow angular distribution in the simulations, confirming the successful implementation of the process. We use our optical measurements of the textures for simulations of textures with rear reflectors, where we also investigate the influence on light‐trapping properties when varying geometry and reflectance properties. The results from the optical simulations are imported into the solar cell simulation program PC1D. For a 50 μm‐thick solar cell, we simulate an improvement in J_sc of up to 0.4 mA/cm² when going from single‐sided random pyramid textures to patch textures, even when the performance of the texture is limited by process inaccuracies. Removing the physical inaccuracies of the laser system, the potential gain in J_sc on a 50 μm‐thick cell with a patch texture covering the complete wafer surface is 0.8 mA/cm². We therefore conclude that the LAST method for creating patch textures is suitable to achieve an improved J_sc in thin monocrystalline silicon solar cells. Copyright © 2013 John Wiley & Sons, Ltd.     

>16% thin‐film epitaxial silicon solar cells on 70‐cm2 area with 30‐µm active layer,porous silicon back reflector,and Cu‐based top‐contact metallization

We demonstrate the use of a copper‐based metallization scheme for the specific application of thin‐film epitaxial silicon wafer equivalent (EpiWE) solar cells with rear chemical vapor deposition emitter and conventional POCl₃ emitter. Thin‐film epitaxial silicon wafer equivalent cells are consisting of high‐quality epitaxial active layer of only 30 µm, beneath which a highly reflective porous silicon multilayer stack is embedded. By combining Cu‐plating metallization and narrow finger lines with an epitaxial cell architecture including the porous silicon reflector, a J_sc exceeding 32 mA/cm² was achieved. We report on reproducible cell efficiencies of >16% on >70‐cm² cells with rear epitaxial chemical vapor deposition emitters and Cu contacts. Copyright © 2011 John Wiley & Sons, Ltd.     

Diffusion‐free high efficiency silicon solar cells

Traditional POCl₃ diffusion is performed in large diffusion furnaces heated to ~850 C and takes an hour long. This may be replaced by an implant and subsequent 90‐s rapid thermal annealing step (in a firing furnace) for the fabrication of p‐type passivated emitter rear contacted silicon solar cells. Implantation has long been deemed a technology too expensive for fabrication of silicon solar cells, but if coupled with innovative process flows as that which is mentioned in this paper, implantation has a fighting chance. An SiOx/SiN_y rear side passivated p‐type wafer is implanted at the front with phosphorus. The implantation creates an inactive amorphous layer and a region of silicon full of interstitials and vacancies. The front side is then passivated using a plasma‐enhanced chemical vapor deposited SiN_xH_y. The wafer is placed in a firing furnace to achieve dopant activation. The hydrogen‐rich silicon nitride releases hydrogen that is diffused into the Si, the defect rich amorphous front side is immediately passivated by the readily available hydrogen; all the while, the amorphous silicon recrystallizes and dopants become electrically active. It is shown in this paper that the combination of this particular process flow leads to an efficient Si solar cell. Cell results on 160‐µm thick, 148.25‐cm² Cz Si wafers with the use of the proposed traditional diffusion‐free process flow are up to 18.8% with a V_oc of 638 mV, J_sc of 38.5 mA/cm², and a fill factor of 76.6%. Copyright © 2012 John Wiley & Sons, Ltd.     

Economic feasibility of bifacial silicon solar cells

Bifacial solar cells and modules are a promising approach to increase the energy output of photovoltaic systems, and therefore decrease levelized cost of electricity (LCOE). This work discusses the bifacial silicon solar cell concepts PERT (passivated emitter, rear totally diffused) and BOSCO (both sides collecting and contacted) in terms of expected module cost and LCOE based on in‐depth numerical device simulation and advanced cost modelling. As references, Al‐BSF (aluminium back‐surface field) and PERC (passivated emitter and rear) cells with local rear‐side contacts are considered. In order to exploit their bifacial potential, PERT structures (representing cells with single‐sided emitter) are shown to require bulk diffusion lengths of more than three times the cell thickness. For the BOSCO concept (representing cells with double‐sided emitter), diffusion lengths of half the cell thickness are sufficient to leverage its bifacial potential. In terms of nominal LCOE, BOSCO cells are shown to be cost‐competitive under monofacial operation compared with an 18% efficient (≙ p_MPP = 18 mW/cm²) multicrystalline silicon (mc‐Si) Al‐BSF cell and a 19% mc‐Si PERC cell for maximum output power densities of p_MPP ≥ 17.3 mW/cm² and p_MPP ≥ 18.1 mW/cm², respectively. These values assume the use of $10/kg silicon feedstock for the BOSCO and $20/kg for the Al‐BSF and PERC cells. For the PERT cell, corresponding values are p_MPP ≥ 21.7 mW/cm² and p_MPP ≥ 22.7 mW/cm², respectively, assuming the current price offset (≈50%, at the time of October 2014) of n‐type Czochralski‐grown silicon (Cz‐Si) compared with mc‐Si wafers. The material price offset of n‐type to p‐type Cz‐Si wafers (≈15%, October 2014) currently accounts for approximately 1 mW/cm², which correlates to a conversion efficiency difference of 1%_abs for monofacial illumination with 1 sun. From p‐type mc‐Si to p‐type Cz‐Si (≈30% wafer price offset, October 2014), this offset is approximately 2.5 mW/cm² for a PERT cell. When utilizing bifacial operation, these required maximum output power densities can be transformed into required minimum rear‐side illumination intensities for arbitrary front‐side efficiencies η_front by means of the performed numerical simulations. For a BOSCO cell with η_front = 18%, minimum rear‐side illumination intensities of ≤ 0.02 suns are required to match a 19% PERC cell in terms of nominal LCOE. For an n‐type Cz‐Si PERT cell with η_front = 21%, corresponding values are ≤ 0.11 suns with 0.05 suns being the n‐type to p‐type material price offset. This work strongly motivates the use of bifacial concepts to generate lowest LCOE. Copyright © 2016 John Wiley & Sons, Ltd.     

Characteristics of bifacial solar cells under bifacial illumination with various intensity levels

The characteristics of bifacial solar cells with different rear structures were investigated under front, rear and bifacial illumination with an intensity of 0.4–4.2 suns. Five kinds of solar cells, rear flat local‐BSF cells, rear textured local‐BSF cells (textured RLB cells), rear total‐BSF cells, rear floating‐emitter cells, and triode cells with double‐sided junctions, were tested. The I–V characteristics of the cells under bifacial illumination were measured with a newly designed measurement system that simultaneously illuminated both surfaces of the cells. In the short‐circuit current (J_SC) and the saturation current evaluations, the bifacial illumination effect, which means that the power output of the cell is intrinsically improved by adding rear illumination, was not observed. Although the RLB cells showed a nonlinear increase in J_SC and enhanced V_OC, these increases did not make a practical contribution to extra output because of the low levels of these characteristics. When we evaluated the maximum output power, the bifacial illumination effect was only observed in the triode cell. A triode cell can decrease resistive loss by introducing light from both surfaces, compared with a conventional cell with one junction. Copyright © 2001 John Wiley & Sons, Ltd.     

Bifacial potential of single‐ and double‐sided collecting silicon solar cells

Bifacial applications are a promising way to increase the performance of photovoltaic systems. Two silicon solar cell concepts suitable for bifacial operation are the passivated emitter, rear totally diffused (PERT) and the both sides collecting and contacted (BOSCO) cell concepts. This work investigates the bifacial potential of these concepts by means of in‐depth numerical device simulation and experiment with a focus on the impact of varying material quality. It is shown that the PERT cell concept (representing a structure with front‐side emitter only) requires high‐minority‐carrier‐diffusion‐length substrates with L_bulk > 3 × W (with cell thickness W) to exploit its bifacial potential, while the BOSCO cell (representing a structure with double‐sided emitter) can already utilise its bifacial potential on substrates with significantly lower diffusion lengths down to L_bulk ≈ 0.5 × W. Experimentally, BOSCO cells with and without activated rear‐side emitter are compared. For rear‐side illumination, the activated rear‐side emitter is measured to increase internal quantum efficiency at wavelengths λ < 850 nm by up to 45%_abs (factor of 9) and 30%_abs (factor of 2) for cells processed on p‐type multicrystalline silicon substrates with L_bulk ≈ 0.3 × W and L_bulk ≈ 2.6 × W, respectively. For PERT cells processed on n‐type Czochralski‐grown silicon substrates, an according increase in internal quantum efficiency for rear‐side illumination of more than 20%_abs (factor of 1.3) is measured when changing from a substrate with L_bulk ≈ 3.0 to 10.0 × W. The performed simulations and experiments demonstrate that the BOSCO cell concept is a promising candidate to successfully exploit bifacial gain also on low‐ to medium‐diffusion‐length substrates such as p‐type multicrystalline silicon, while PERT cells require a high‐diffusion‐length substrate to utilise their bifacial potential. Furthermore, the BOSCO cell concept is shown to be a promising option to achieve highest output power densities, even when using lower quality and therefore possibly more cost‐effective silicon substrates. Copyright © 2016 John Wiley & Sons, Ltd.     

Low temperature‐coefficient for solar cells processed from solar‐grade silicon purified by metallurgical route

This study is dedicated to the temperature (T)‐variation of the photovoltaic performances of solar cells made from solar‐grade silicon directly purified by metallurgical route (SoG_M‐Si). Experimental results were systematically compared with those for standard electronic‐grade silicon (EG‐Si) solar cells. We showed that the conversion efficiency (η) of SoG_M‐Si cells decreases much less when T increases than the η of EG‐Si cells. This major difference is due to a strong increase with T of the short‐circuit current density (J_sc) of the SoG_M‐Si solar cells. We showed that this a priori unexpected result could be described and explained by numerical simulations, by taking into account the main particularities of SoG_M‐Si: dopant compensation, moderate minority carrier diffusion length and larger amount of boron–oxygen complexes. These results are significant since T of a solar module under illumination being generally higher than 25°C, modules made from low‐cost SoG_M‐Si cells should have performances closer to those of standard EG‐Si solar panels. Copyright © 2011 John Wiley & Sons, Ltd.     

High efficiency screen‐printed EFG Si solar cells through rapid thermal processing‐induced bulk lifetime enhancement

This paper shows that one second (1 s) firing of Si solar cells with screen‐printed Al on the back and SiN _x anti‐reflection coating on the front can produce a high quality Al‐doped back‐surface‐field (Al‐BSF) and significantly enhance SiN _x ‐induced defect hydrogenation in the bulk Si. Open‐circuit voltage, internal quantum efficiency measurements, and cross‐sectional scanning electron microscopy pictures on float‐zone silicon cells revealed that 1 s firing in rapid thermal processing at 750°C produces just as good a BSF as 60 s firing, indicating that the quality of Al‐BSF region is not a strong function of RTP firing time at 750°C. Analysis of edge‐defined film‐fed grown (EFG) Si cells showed that short‐term firing is much more effective in improving the hydrogen passivation of bulk defects in EFG Si. Average minority‐carrier lifetime in EFG wafers improved from ∼3 to ∼33 μs by 60 s firing but reached as high as 95μs with 1 s firing, resulting in 15·6% efficient screen‐printed cells on EFG Si. Copyright © 2004 John Wiley & Sons, Ltd.     

SHORT COMMUNICATION: ACCELERATED PUBLICATION: Multicrystalline silicon solar cells exceeding 20% efficiency

This paper presents the first conversion efficiency above 20% for a multicrystalline silicon solar cell. The application of wet oxidation for rear surface passivation significantly reduces the process temperature and therefore prevents the degradation of minority‐carrier lifetime. The excellent optical properties of the dielectrically passivated rear surface in combination with a plasma textured front surface result in a superior light trapping and allow the use of substrates below 100 μm thickness. A simplified process scheme with laser‐fired rear contacts leads to conversion efficiencies of 20·3% for multicrystalline and 21·2% for monocrystalline silicon solar cells on small device areas (1 cm²). Copyright © 2004 John Wiley & Sons, Ltd.     

Optimizing annealing steps for crystalline silicon solar cells with screen printed front side metallization and an oxide‐passivated rear surface with local contacts

Silicon solar cells that feature screen printed front contacts and a passivated rear surface with local contacts allow higher efficiencies compared to present industrial solar cells that exhibit a full area rear side metallization. If thermal oxidation is used for the rear surface passivation, the final annealing step in the processing sequence is crucial. On the one hand, this post‐metallization annealing (PMA) step is required for decreasing the surface recombination velocity (SRV) at the aluminum‐coated oxide‐passivated rear surface. On the other hand, PMA can negatively affect the screen printed front side metallization leading to a lower fill factor. This work separately analyzes the impact of PMA on both, the screen printed front metallization and the oxide‐passivated rear surface. Measuring dark and illuminated IV‐curves of standard industrial aluminum back surface field (Al‐BSF) silicon solar cells reveals the impact of PMA on the front metallization, while measuring the effective minority carrier lifetime of symmetric lifetime samples provides information about the rear side SRV. One‐dimensional simulations are used for predicting the cell performance according to the contributions from both, the front metallization and the rear oxide‐passivation for different PMA temperatures and durations. The simulation also includes recombination at the local rear contacts. An optimized PMA process is presented according to the simulations and is experimentally verified. The optimized process is applied to silicon solar cells with a screen printed front side metallization and an oxide‐passivated rear surface. Efficiencies up to 18.1% are achieved on 148.8 cm² Czochralski (Cz) silicon wafers. Copyright © 2009 John Wiley & Sons, Ltd.     

20.0% Efficiency Si Nano/Microstructures Based Solar Cells with Excellent Broadband Spectral Response

Spectral response of solar cells determines the output performance of the devices. In this work, a 20.0% efficient silicon (Si) nano/microstructures (N/M‐Strus) based solar cell with a standard solar wafer size of 156 × 156 mm² (pseudo‐square) has been successfully fabricated, by employing the simultaneous stack SiO₂/SiN_x passivation for the front N/M‐Strus based n⁺‐emitter and the rear surface. The key to success lies in the excellent broadband spectral responses combining the improved short‐wavelength response of the stack SiO₂/SiN_x passivated Si N/M‐Strus based n⁺‐emitter with the extraordinary long‐wavelength response of the stack SiO₂/SiN_x passivated rear reflector. Benefiting from the broadband spectral response, the highest open‐circuit voltage (V_oc) and short‐circuit current density (J_sc) reach up to 0.653 V and 39.0 mA cm^?2, respectively. This high‐performance screen‐printed Si N/M‐Strus based solar cell has shown a very promising way to the commercial mass production of the Si based high‐efficient solar cells.     

Simulation and fabrication of heterojunction silicon solar cells from numerical computer and hot‐wire CVD

In this paper, we will present a Pc1D numerical simulation for heterojunction (HJ) silicon solar cells, and discuss their possibilities and limitations. By means of modeling and numerical computer simulation, the influence of emitter‐layer/intrinsic‐layer/crystalline‐Si heterostructures with different thickness and crystallinity on the solar cell performance is investigated and compared with hot wire chemical vapor deposition (HWCVD) experimental results. A new technique for characterization of n‐type microcrystalline silicon (n‐µc‐Si)/intrinsic amorphous silicon (i‐a‐Si)/crystalline silicon (c‐Si) heterojunction solar cells from Pc1D is developed. Results of numerical modeling as well as experimental data obtained using HWCVD on µc‐Si (n)/a‐Si (i)/c‐Si (p) heterojunction are presented. This work improves the understanding of HJ solar cells to derive arguments for design optimization. Some simulated parameters of solar cells were obtained: the best results for J_sc = 39·4 mA/cm², V_oc = 0·64 V, FF = 83%, and η = 21% have been achieved. After optimizing the deposition parameters of the n‐layer and the H₂ pretreatment of solar cell, the single‐side HJ solar cells with J_sc = 34·6 mA/cm², V_oc = 0·615 V, FF = 71%, and an efficiency of 15·2% have been achieved. The double‐side HJ solar cell with J_sc = 34·8 mA/cm², V_oc = 0·645 V, FF = 73%, and an efficiency of 16·4% has been fabricated. Copyright © 2009 John Wiley & Sons, Ltd.     

Interface Engineering for Both Cathode and Anode Enables Low‐Cost Highly Efficient Solution‐Processed CdTe Nanocrystal Solar Cells

Low‐cost solution‐processed CdTe nanocrystal (NC) solar cells always suffer from a high interface energy barrier and unbalanced hole/electron transport as well as anisotropic atom diffusion on the CdTe surface due to the limited amount of hole/electron interface materials or the difficulty in interface processing. In this work, a novel strategy is first adopted with gradient electron transport layer (CdS/CdSe) modification in the cathode and a new crosslinkable hole transport polymer (P‐TPA) implantation in the anode. The carrier recombination at interfaces is greatly decreased and thus the carrier collection is increased. Moreover, the light harvesting is improved both in short and long wavelength regions, making J_sc and V_oc increase simultaneously. A champion solar cell shows a very high power conversion efficiency of 9.2% and an outstanding J_sc of 25.31 mA cm^?2, which are among the highest values for all solution‐processed CdTe NC solar cells with a superstrate structure, and the latter value is even higher than that of traditional thick CdTe thin‐film solar cells (2 µm) via the high temperature close space sublimation method. This work demonstrates that facile surface modifications in both the cathode and anode with stepped extraction and organic–inorganic hybridization are very promising in constructing next‐generation highly efficient NC photovoltaic devices.     

Impact of silicon quantum dot super lattice and quantum well structure as intermediate layer on p‐i‐n silicon solar cells

The photovoltaic effect of the silicon (Si)/silicon carbide (SiC) quantum dot super lattice (QDSL) and multi‐quantum well (QW) strucutres is presented based on numerical simulation and experimental studies. The QDSL and QW structures act as an intermediate layer in a p‐i‐n Si solar cell. The QDSL consists of a stack of four 4‐nm Si nano disks and 2‐nm SiC barrier layers embedded in a SiC matrix fabricated with a top‐down etching process. The Si nano disks were observed with bright field‐scanning transmission electron microscopy. The simulation results based on the 3D finite element method confirmed that the quantum effect on the band structure for the QDSL and QW structures was different and had different effects on solar cell operation. The effect of vertical wave‐function coupling to form a miniband in the QDSL was observed based on the solar‐cell performance, showing a dramatic photovoltaic response in generating a high photocurrent density J_sc of 29.24 mA/cm², open circuit voltage V_oc of 0.51 V, fill factor FF of 0.74, and efficiency η of 11.07% with respect to a i‐QW solar cell with J_sc of 25.27 mA/cm², V_oc of 0.49 V, FF of 0.69, and η of 8.61% and an i‐Si solar cell with J_sc of 27.63 mA/cm², V_oc of 0.55 V, FF of 0.61, and η of 10.00%. A wide range of photo‐carrier transports by the QD arrays in the QDSL solar cell is possible in the internal quantum efficiency spectra with respect to the internal quantum efficiency of the i‐QW solar cell. Copyright © 2015 John Wiley & Sons, Ltd.     

On the determination of the emitter saturation current density from lifetime measurements of silicon devices

Contactless photoconductance measurements are commonly used to extract the emitter saturation current density (J_oe) for crystalline silicon samples containing an emitter on the surface. We review the physics behind the analysis of J_oe and compare the commonly used approximations with more generalised solutions using two‐dimensional device simulations. We quantify errors present in such approximations for different test conditions involving varying illumination conditions and surface properties in samples with the same emitter on both sides. The simulated J_oe obtained from the dark hole current from the emitter into the bulk is nearly the same as the simulated J_oe determined by photoconductance measurements of the rear diffusion. The simulated J_oe at the front emitter is equivalent to that at the rear emitter only when the sample is subject to a nearly constant and flat generation profile. For illumination conditions including visible light, the simulated J_oe at the front emitter is smaller than the simulated J_oe at the rear emitter. Both J_oe at the rear emitter and from the dark hole current in the emitter remain nearly constant over a wide range of base doping densities. The approximations used for the determination of J_oe from photoconductance measurements make J_oe dependent on the excess minority carrier density. Lifetime measurements demonstrate that, even in high‐quality silicon, J_oe should be determined from the analytical solution as a function of excess minority carrier density including Shockley‐Read‐Hall recombination. Copyright © 2012 John Wiley & Sons, Ltd.     

Autodiffusion: a novel method for emitter formation in crystalline silicon thin‐film solar cells

The in situ formation of an emitter in monocrystalline silicon thin‐film solar cells by solid‐state diffusion of dopants from the growth substrate during epitaxy is demonstrated. This approach, that we denote autodiffusion, combines the epitaxy and the diffusion into one single process. Layer‐transfer with porous silicon (PSI process) is used to fabricate n‐type silicon thin‐film solar cells. The cells feature a boron emitter on the cell rear side that is formed by autodiffusion. The sheet resistance of this autodiffused emitter is 330 Ω/□. An independently confirmed conversion efficiency of (14·5 ± 0·4)% with a high short circuit current density of (33·3 ± 0·8) mA/cm² is achieved for a 2 × 2 cm² large cell with a thickness of (24 ± 1) µm. Transferred n‐type silicon thin films made from the same run as the cells show effective carrier lifetimes exceeding 13 µs. From these samples a bulk diffusion length L > 111 µm is deduced. Amorphous silicon is used to passivate the rear surface of these samples after the layer‐transfer resulting in a surface recombination velocity lower than 38 cm/s. Copyright © 2006 John Wiley & Sons, Ltd.     

Investigation of laser ablation on boron emitters for n‐type rear‐junction PERT type silicon wafer solar cells

n‐type silicon wafer solar cells are receiving increasing attention for industrial application in recent years, such as the n‐type rear‐junction Passivated Emitter Rear Totally‐diffused (PERT) solar cells. One of the main challenges in fabricating the n‐PERT solar cells is the opening of the rear dielectric for localized contacts. In this work laser ablation is applied to locally ablate the rear dielectric. We investigate the laser damage to the emitter at the laser‐ablated regions using the emitter saturation current density, J_0e,laser, extracted by two approaches. J_0e,laser is observed to be injection dependent due to high J₀₂ recombination caused by laser damage to the space charge region. By using the optimized laser ablation parameters, n‐PERT solar cells with an efficiency of up to 21.0% are realized. Copyright © 2015 John Wiley & Sons, Ltd.     

A critical evaluation of the effective diffusion lengthdetermination in crystalline silicon solar cells from an extendedspectral analysis

This note draws attention to possible errors when characterizing silicon solar cells by means of the effective minority carrier diffusion length L_b as defined in the paper on “Numerical modeling of textured silicon solar cells using PC1D” by Basore (1990). The approximations underlying the analytical expression for L _eff are critically reviewed. Their impact on the determination of the minority carrier bulk diffusion length L_b from L_eff is discussed for a 250-μm thick Si solar cell. It is found that considerable errors occur in the case of diffusion lengths larger than the cell thickness even when neglecting any measurement uncertainty     

铝背场对单晶硅太阳电池输出特性的影响

利用PCID软件模拟了n~+/p-p~+结构的单晶硅太阳电池铝背场与硅片厚度对其输出特性的影响.结果表明,有铝背场时太阳电池获得明显的开路电压、短路电流以及光电转换效率的增益;硅片厚度越小,铝背场对其输出特性的影响越大;在有铝背场情况下,硅片厚度为120μm时,可获得最大的光电转换效率.

Abstract：

The PC1D was usecl to simulate the influence of Al-BSF and wafer thickness on electrical properties of n~+/p-p~+ structural monocrystalline silicon solar cells. It is found that solar cells with the Al-BSF structure can gain obvious open circuit voltage, short-circuit current, as well as photoelectric conversion efficiency; the smaller the wafer thickness is, the bigger of the effect of Al BSF works on the electrical properties; when the wafer thickness is 120 m, the solar cells can get the biggest photoelectric conversion efficiency.     

Influence of band gap of p-type hydrogenated nanocrystalline silicon layer on the short-circuit current density in thin-film silicon solar cells

The impact of the optical band gap (E_g) of a p-type hydrogenated nanocrystalline silicon layer on the short-circuit current density (J_sc) of a thin-film silicon solar cell is assessed. We have found that the J_sc reaches maximum when the E_g reaches optimum. The reason for the J_sc on E_g needs to be clarified. Our results exhibit that maximum J_sc is the balance between dark current and photocurrent. We show here that this dark current results from the density of defects in the p-layer and the barrier at the interface between p-and i-layers. An optimum cell can be designed by optimizing the p-layer via reducing the density of defects in the p-layer and the barrier at the p/i interface. Finally, a 6.6% increase in J_sc was obtained at optimum E_g for n-i-p solar cells.