CdS/TiO_2球棒结构异质结的合成及其光电化学性能研究

利用循环伏安电沉积法将CdS纳米颗粒沉积在TiO2纳米棒阵列上制备了CdS/TiO2复合薄膜,采用XRD、SEM和UV-Vis分光光度计对样品的晶体结构、微观形貌和光学性质进行了表征,并研究了紫外光预处理TiO2对复合薄膜的结构和光电化学性能的影响。结果表明,制备的TiO2薄膜为沿c轴择优取向的金红石单晶,CdS成功电沉积到TiO2纳米棒的顶部形成了CdS/TiO2球棒结构异质结,所制复合薄膜的光吸收边均扩展到了可见光区域。特别是对TiO2纳米棒阵列进行紫外线照射预处理后,复合薄膜中CdS的含量显著提高,其表现出更好的光电化学性能。     

基于分等级中空微球结构Co3O4/WO3复合材料的制备及对H2S的气敏性能

通过简单的水热法合成了由纳米颗粒自组装而成的分等级中空微球结构WO₃和Co₃O₄/WO₃材料,整个实验过程中不添加任何的表面活性剂和模板剂,符合绿色化学发展理念。对样品的形貌、结构、化学成分和气敏性能进行了表征。结果表明,Co₃O₄/WO₃复合材料成功构筑p-n异质结并呈中空微球结构。在气敏性能测试中,Co₃O₄/WO₃复合材料传感器在最佳工作温度50℃下对体积分数为1×10^-5的H₂S气体的响应值为42.1,约为WO₃传感器的3.37倍,响应时间仅为8 s。本实验还进行了1×10^-8～5×10^-5不同体积分数的H₂S气体连续循环检测,检测下限低至1×10^-8。同时,所制备的传感器具有良好的稳定性、选择性和重现性。此外...     

电纺SnO2∶PVP复合纳米线/带制备及其在钙钛矿太阳能电池中的应用

利用静电纺丝技术制备SnO₂∶聚乙烯吡咯烷酮(PVP)复合纳米线(NW)和纳米带(NB),然后将其应用到钙钛矿太阳能电池(PSC)来提高器件性能。首先利用静电纺丝和高温氧化制备出表面光滑、分布均匀、覆盖率可控的SnO₂∶PVP NW,随后通过溶剂处理展宽得到SnO₂∶PVP NB。分别将其作为电子传输层应用于钙钛矿太阳能电池,器件结构为氧化铟锡(ITO)/SnO₂/SnO₂∶PVP NW (NB)/FAx MA1-x PbI yC l3-y/Spiro-OMe TAD/Ag。研究发现,在纺丝接收时间70 s内,覆盖率随接收时间线性增加。与参考器件相比,覆盖率31%的SnO₂∶PVP NW加入钙钛矿太阳能电池的光电转换效率(PCE)基本没有变化。将溶剂处理后得到的SnO₂∶PVP NB加入钙钛矿太阳能电池,其器件的PCE从18.52%提高到20.96%。同时,由于PVP对钙钛矿具有良好的钝化作用,器件的稳定性也得到较大的改善,12天后归...     

原子层沉积方法制备低温多层Al2O3/TiO2复合封装薄膜的研究

原子层沉积(ALD)方法可以制备出高质量薄膜,被认为是可应用于柔性有机电致发光器件(OLED)最有发展前景的薄膜封装技术之一。本文采用原子层沉积(ALD)技术,在低温(80℃)下,研究了Al₂O₃及TiO₂薄膜的生长规律,通过钙膜水汽透过率(WVTR)、薄膜接触角测试等手段,研究了不同堆叠结构的多层Al₂O₃/TiO₂复合封装薄膜的水汽阻隔特性,其中5 nm/5 nm×8 dyads(重复堆叠次数)的Al₂O₃/TiO₂叠层结构薄膜的WVTR达到2.1×10^-5 g/m²/day。采用优化后的Al₂O₃/TiO₂叠层结构薄膜对OLED器件进行封装,实验发现封装后的OLED器件在高温高湿条件下展现了较好的寿命特性。     

磁控溅射工作压强对β-Ga2O3薄膜特性的影响

作为新兴的第三代半导体材料,β-Ga₂O₃高质量薄膜是制备高效Ga₂O₃基器件的基础,β-Ga₂O₃薄膜的制备、表征及光电特性的研究具有深刻的意义。通过分析研究磁控溅射工作压强变化对薄膜性能和形貌的影响,为制备更高质量的薄膜提供了一种新的方法。基于射频磁控溅射方法,在单晶c面蓝宝石(Al₂O₃)衬底上沉积生长Ga₂O₃薄膜,并进行900℃、90min的氮气退火处理,以得到β-Ga₂O₃薄膜。沉积过程不改变其他实验参数,仅改变工作压强,研究工作压强对β-Ga₂O₃薄膜特性的影响。X射线衍射仪(XRD)和原子力显微镜(AFM)表征结果显示,β-Ga₂O₃薄膜具有不同取向的衍射峰,沿着■晶向择优生长,薄膜呈多晶状态。适当增大工作压强可使β-Ga<...     

基于脉冲电沉积法制备RuO2材料及其超级电容器性能

RuO₂作为一种比较优秀的电极材料,在超级电容器中具有较大应用,但RuO₂电容性能受限于颗粒粒径大小以及分散性。为解决RuO₂颗粒容易团聚和分散性较差的问题,以RuCl₃·nH₂O为前驱体,采用新型脉冲电沉积法在泡沫Ni上电沉积RuO₂作为超级电容器的电极材料。并使用扫描电子显微镜、X射线衍射仪以及电化学工作站表征材料的表面微观形貌、物相组成和电化学性能。结果表明：分别电沉积15 min和30 min, RuO₂在Ni上生长为一层50 nm和150 nm厚度均匀的薄膜;电化学性能测试表明其内阻较低以及充放电时间较长;电沉积15 min的P15样品在20 mV/s扫描速率下具有576 F/g的比电容,在1 A/g电流密度下具有400 F/g的比电容。因此,脉冲电沉积法制备的RuO₂材料具有比较优异的性能,在超级电容器的电极材料制备中具有一定的应用前景。     

原子层沉积低温生长α-MoO3薄膜

以六羰基钼和氧气为前驱体,通过等离子增强原子层沉积技术（PE-ALD）在硅基片上实现了α-MoO₃薄膜的低温制备。利用X射线衍射仪、扫描电子显微镜、原子力显微镜、X射线光电子能谱仪等手段对薄膜的晶体结构、表面形貌及薄膜成分进行表征和分析。研究发现衬底温度和氧源脉冲时间对MoO₃薄膜的晶体结构和表面形貌变化起关键作用。当衬底温度为170℃及以上时所制备的薄膜为α-MoO₃;适当延长ALD单循环中的氧源脉冲时间有利于低温沉积沿（0k0）高度择优取向的MoO₃薄膜。根据对不同厚度MoO₃薄膜表面的原子力显微图片分析,MoO₃薄膜为岛状生长模式。     

HfO2薄膜的亲疏水性对石墨烯沉积的影响

研究了在不同表面润湿性的HfO₂薄膜上沉积石墨烯的质量,判断了不同表面能大小碳原子的沉积方向。采用电子束工艺制备不同生长时间的HfO₂薄膜,经过静态接触角测量可知,所有HfO₂薄膜均为疏水性,且随着薄膜厚度的增加,表面疏水性加强。再通过等离子体化学气相沉积工艺在HfO₂样品表面制备石墨烯薄膜。通过拉曼测试得出,表面中性润湿性基底对于碳沉积密度贡献不大;表面微疏水性基底对于碳原子总沉积量增益不大,但是对于形成sp²轨道的碳碳双键则增强明显,原因主要是由于碳原子在表面横向迁移的作用增强,从而形成大面积石墨烯薄膜。     

高k材料镧前驱体La(tmhd)3和La(tmod)3的热力学及其ALD应用

通过同步热分析研究两种不同的前驱体(La(tmhd)₃和La(tmod)₃)在升华过程中的热稳定性。结果表明,具有不对称分子结构的La(tmod)₃的挥发性大于La(tmhd)₃,其可以作为镧前驱体应用于原子层沉积(ALD)技术。将La(tmod)₃和O₃作为前驱体,通过ALD技术在SiO₂基片上实现了LaO_x薄膜的制备。实验结果表明,其最佳的ALD工艺参数包括：La(tmod)₃和O₃的脉冲时间分别为6 s和2 s, O₃的清洗时间为5 s,沉积温度为250℃。在制备的薄膜中发现了理想的自限性沉积行为。通过X射线光电子能谱仪(XPS)、扫描电子显微镜(SEM)和原子力显微镜(AFM)证实了生长的薄膜具有良好的纯度和表面形貌,其在250℃的沉积温度下具有稳定的生长速率(约0.16?/cycle, 1?=0.1 nm),薄膜的主要成分为La_...     

MoS2/MoO2共形异质结构的制备、表征及其生长机理

作为典型的二维层状半导体材料,MoS₂及其异质结构在后摩尔时代的电子学和光电子学领域具有广阔的应用前景。以MoO₃为前驱体,利用化学气相沉积法(CVD)先制备了MoO₂纳米片,随后使用硫蒸气对其进行硫化合成了含2～4层MoS₂的MoS₂/MoO₂的共形异质结构。通过X射线光电子能谱(XPS)和Raman光谱对MoS₂/MoO₂共形异质结构进行表征,确定了MoS₂的层数随硫化时间的变化关系,即随着硫化时间的延长,MoS₂层数逐渐增加。利用原子力显微镜(AFM)对异质结构的厚度表征结果发现,硫化后纳米片厚度有所减薄,并且随着硫化时间的增加,MoO₂纳米片硫化前后的厚度差呈现出反常的先下降后上升的趋势。最后通过高分辨环形暗场扫描透射电子显微镜(ADF-STEM)对MoS₂/MoO₂共形异质结构截面进行表征,并揭...     

WO3/NiWO4复合薄膜的制备及其光电化学性能

采用两步水热法在导电玻璃(FTO)上制备了WO₃/NiWO₄复合薄膜。通过XRD,SEM表征了WO₃/NiWO₄复合薄膜的组成结构及微观形貌,利用UV-Vis、光电流测试、光电催化测试和交流阻抗测试分析了WO₃/NiWO₄复合薄膜的光电性能。结果表明:WO₃/NiWO₄复合薄膜相较于WO₃薄膜具有更好的光吸收特性、光电流密度和光电催化活性,其中水热反应3h的WO₃/NiWO₄复合薄膜的光电化学性能最佳。WO₃/NiWO₄-3h在1.4V(vs.Ag/AgCl)时的光电流密度为1.94mA/cm²,光电催化210min对亚甲基蓝溶液的降解效率为57.1%。交流阻抗图谱表明WO₃/NiWO₄薄膜的电荷转移电阻小于WO₃薄膜,光电化学性能更优。     

暴露(002)晶面的WO3纳米片薄膜的光电催化性能

采用一步水热法,以钨酸钠(Na2WO4·2H2O)为原料,草酸(H2C2O4)为结构导向剂,在FTO衬底上制备了具有高活性(002)面的WO3纳米片薄膜.利用XRD,FESEM对薄膜的物相和形貌进行了分析,通过UV-Vis,PL对薄膜的能带结构和载流子的分离能力进行了表征,通过电化学工作站对WO3薄膜的光电性能进行了研究.分析了草酸用量对WO3 纳米片薄膜的晶体取向、形貌尺寸和光电催化性能的影响.结果表明:草酸用量为0.30 g时,WO3纳米片薄膜的(002)面衍射峰强度最高,具有良好的光电催化性能.     

纳米氧化钨薄膜改性的大孔硅气敏传感器

通过双槽电化学腐蚀法在P型单晶硅表面制备了大孔硅。然后通过直流对靶反应磁控溅射法在大孔硅表面淀积了纳米氧化钨薄膜。使用场发射扫描电子显微镜（FESEM）观察大孔硅和氧化钨/大孔硅样品的形貌。分别使用X射线衍射（XRD）图谱和X射线光电子能谱（XPS）分析氧化钨晶体结构和钨的化合价。在室温下测试大孔硅和氧化钨/大孔硅气敏传感器的气敏特性。结果表明：氧化钨/大孔硅气敏传感器表现出了P型半导体气敏传感器的气敏特性。它对1ppm的二氧化氮显示了良好的恢复特性和重复性。氧化钨/大孔硅气敏传感器的长期稳定性要好于大孔硅气敏传感器。氧化钨的添加提高了大孔硅气敏传感器对二氧化氮的灵敏度。氧化钨/大孔硅气敏传感器对于二氧化氮的灵敏度要高于其对氨气和乙醇的灵敏度。通过淀积纳米氧化钨薄膜,改善了大孔硅对二氧化氮的选择性。     

Atomic-layer-deposited Al2O3 and HfO2 on GaN: A comparative study on interfaces and electrical characteristics

Al₂O₃, HfO₂, and composite HfO₂/Al₂O₃ films were deposited on n-type GaN using atomic layer deposition (ALD). The interfacial layer of GaON and HfON was observed between HfO₂ and GaN, whereas the absence of an interfacial layer at Al₂O₃/GaN was confirmed using X-ray photoelectron spectroscopy and transmission electron microscopy. The dielectric constants of Al₂O₃, HfO₂, and composite HfO₂/Al₂O₃ calculated from the C-V measurement are 9, 16.5, and 13.8, respectively. The Al₂O₃ employed as a template in the composite structure has suppressed the interfacial layer formation during the subsequent ALD-HfO₂ and effectively reduced the gate leakage current. While the dielectric constant of the composite HfO₂/Al₂O₃ film is lower than that of HfO₂, the composite structure provides sharp oxide/GaN interface without interfacial layer, leading to better electrical properties.     

Determination of the electronic parameters of nanostructure SnO2/p-Si diode

The current–voltage and capacitance–voltage characteristics of the nanostructure SnO₂/p-Si diode have been investigated. The optical band gap and microstructure properties of the SnO₂ film were analyzed by optical absorption method and scanning electron microscopy, respectively. The optical band of the film was found to be 3.58 eV with a direct optical transition. The scanning electron microcopy results show that the SnO₂ film has the nanostructure. The ideality factor, barrier height and series resistance values of the nanostructure SnO₂/p-Si diode were found to be 2.1, 0.87 eV and 36.35 kΩ, respectively. The barrier height obtained from C–V measurement is higher than obtained from I–V measurement and this discrepancy can be explained by introducing a spatial distribution of barrier heights due to barrier height inhomogeneities, which are available at the nanostructure SnO₂/p-Si interface. The interface state density of the diode was determined by conductance technique and was found to be 8.41 × 10¹⁰ eV⁻¹ cm⁻².It is evaluated that the nanostructure of the SnO₂ film has an important effect on the ideality factor, barrier height and interface state density parameters of SnO₂/p-Si diode.     

Effect of titanium dioxide (TiO2) seed layer on the phase composition of 0.7Pb (Mg1/3Nb2/3)O3-0.3PbTiO3 film prepared by pulsed laser deposition

Lead-magnesium niobate-lead titanate (PMN-PT) thin films with and without the TiO₂ seed layer were deposited on Pt/Ti/SiO₂/Si substrates through pulsed laser deposition. The study aimed to characterize the effect of the TiO₂ seed layer on the phase composition and properties of PMN-PT film. Without the TiO₂ seed layer, the pure perovskite phase could be obtained in the thinner PMN-PT film while with the TiO₂ seed layer, the pure perovskite phase was formed in the thicker PMN-PT film. The ferroelectric properties of PMN-PT films with the TiO₂ seed layer were exhibited. As a result, the maximum amount of remnant polarization reached the amount of 32 μC/cm² for the PMN-PT thin film with the TiO₂ seed layer.     

Characteristics of metal-ferroelectric-insulator-semiconductor structure using Sr0.8Bi2.2Ta2O9 and Sr0.8Bi2.2Ta2O9-BaZrO3 for ferroelectric gates

Characteristics of BaZrO₃ (BZO) modified Sr_0.8Bi_2.2Ta₂O₉ (SBT) thin films fabricated by sol-gel method on HfO₂ coated Si substrates have been investigated in a metal-ferroelectric-insulator-semiconductor (MFIS) structure for potential use in a ferroelectric field effect transistor (FeFET) type memory. MFIS structures consisting of pure SBT and doped with 5 and 7 mol% BZO exhibited memory windows of 0.81, 0.82 and 0.95 V with gate voltage sweeps between −5 and +5 V, respectively. Leakage current density levels of 10⁻⁸ A/cm² for BZO doped SBT gate materials were observed and attributed to the metallic Bi on the surface as well as intrinsic defects and a porous film microstructure. The higher than expected leakage current is attributed to electron trapping/de-trapping, which reduces the data retention time and memory window. Further process improvements are expected to enhance the electronic properties of doped SBT for FeFET.     

Enhancement of photodetection based on perovskite/MoS2 hybrid thin film transistor

Perovskite/MoS₂ hybrid thin film transistor photodetectors consist of few-layered MoS₂ and CH₃NH₃PbI₃ film with various thickness prepared by two-step vacuum deposition. By implementing perovskite CH₃NH₃PbI₃ film onto the MoS₂ flake, the perovskite/MoS₂ hybrid photodetector exhibited a photoresponsivity of 10⁴A/W and fast response time of about 40 ms. Improvement of photodetection performance is attributed to the balance between light absorption in the perovskite layer and an effective transfer of photogenerated carriers from perovskite entering the MoS₂ channel. This work may provide guidance to develop high-performance hybrid structure optoelectronic devices.     

利用偏钨酸铵的DMF/水溶液旋涂热解制备WO3薄膜及其在钙钛矿太阳电池致密层中的应用

本文首次通过旋涂热解偏钨酸铵((NH₄)₆H₂W₁₂O₄₀)的DMF/水溶液成功制备了致密的三氧化钨(WO₃)薄膜, 系统研究了WO₃薄膜厚度及用异丙醇冲洗处理气相辅助溶液法制备的CH₃NH₃PbI₃薄膜对相应钙钛矿太阳电池光伏性能的影响. 结果表明, 使用厚度为62nmWO₃致密层的平板钙钛矿太阳电池获得了短路电流密度17.39 mA.cm_-2, 开路电压0.58 V, 填充因子0.57, 相应光电转化效率5.72%. 使用异丙醇冲洗CH₃NH₃PbI₃薄膜后, 相应太阳电池的光电转化效率由5.72 % 升高到7.04 %.     

Influence of La substitution on the electrical properties of metal-ferroelectric (BiFeO3)-insulator (CeO2)-semiconductor nonvolatile memory structures

Metal-multiferroic (La-substituted BiFeO₃)-insulator (CeO₂)-semiconductor (MFIS) capacitors has been fabricated. The crystalline phase and amount of La³⁺ substitution at Bi-site were investigated by XRD and XPS in the postannealing temperature range from 500 to 700 °C, respectively. The microstructure and interfacial layer between CeO₂ and Si substrate were characterized by HRTEM. The memory windows as functions of insulator film thickness and DC power for La were measured. The maximum memory window is about 1.9 V under ±6 V applied voltage. The ferroelectric polarization increases with increasing substitution amount. The morphologies of La-substituted BiFeO₃ films were also studied by AFM.