Geometrical Characteristics and Surface Polarity of Inclined Crystallographic Planes of the Wurtzite and Zincblende Structures

Inclined crystallographic planes of the wurtzite structure were investigated in comparison with the zincblende structure in terms of surface geometry characteristics. The ball–stick model indicates that the semipolar surface possesses a surface polarity resembling the anion polarity, which agrees with the common experimental observations of epitaxial growth preference for the cation-polarity surface over the surface. The wurtzite surface was found to share geometrical similarities with the zincblende {100} surface uniquely among the possible semipolar planes. This finding encourages epitaxial growth on the plane of wurtzite semiconductors, e.g., GaN, with the potential of avoiding atomic step formations typically associated with off-axis crystallographic planes.     

Extruded Bismuth-Telluride-Based <Emphasis Type="Italic">n</Emphasis>-Type Alloys for Waste Heat Thermoelectric Recovery Applications

Thermoelectric (TE) generator modules for a number of waste heat recovery applications are required to operate between room temperature and 500 K, a temperature range for which the composition of bismuth-telluride-based alloys needs to be adjusted to optimize performance. In particular n-type alloys do not perform as well as p-type and require a more systematic study. We have produced, by mechanical alloying followed by hot extrusion, alloys, within the range with fixed carrier concentration () to optimize their TE performance in the temperature range 300 K to 420 K. The optimum composition has been identified to be and which is very close to the composition that also maximizes the ratio of the electron mobility to the lattice component of the thermal conductivity. The optimized alloy performance can be further increased by adjusting the carrier concentration.     

Nanotrenches Induced by Catalyst Particles on ZnSe Surfaces

Nanotrenches are induced by thermal annealing Au droplets on ZnSe surfaces. High-resolution scanning electron microscopy studies of the nanotrench structures reveal that the preferred migration directions of the catalyst droplets are along the direction family. On a ZnSe(111)B surface, each of the trenches is along one of the six directions while on a nonvicinal ZnSe(100) surface, the trenches are along a pair of antiparallel directions. Based on the results obtained from atomic force microscopy surface profiling and electron energy-loss spectroscopy chemical analysis techniques, a model is proposed to describe the possible formation mechanisms of the␣observed nanotrenches. The highly parallel nanotrenches induced on the Au/ZnSe(100) structure as revealed in this study are potentially useful as a template for in situ fabrication of ordered one-dimensional nanostructures (such as nanowires) of many materials.     

Creep behavior of eutectic Sn-Cu lead-free solder alloy

Tensile creep behavior of precipitation-strengthened, tin-based eutectic Sn-0.7Cu alloy was investigated at three temperatures ranging from 303–393 K. The steady-state creep rates cover six orders of magnitude (10⁻³−10⁻⁸ s⁻¹) under the stress range of σ/E=10⁻⁴−10⁻³. The initial microstructure reveals that the intermetallic compound Cu₆Sn₅ is finely dispersed in the matrix of β-Sn. By incorporating a threshold stress, σ _th, into the analysis, the creep data of eutectic Sn-Cu at all temperatures can be fitted by a single straight line with a slope of 7 after normalizing the steady-state creep rate and the effective stress, indicating that the creep rates are controlled by the dislocation-pipe diffusion in the tin matrix. So the steady-state creep rate, , can be expressed as exp , where Q_c is the activation energy for creep, G is the temperature-dependent shear modulus, b is the Burgers vector, R is the universal gas constant, T is the temperature, σ is the applied stress, A is a material-dependent constant, and , in which σ _OB is the Orowan bowing stress, and k_R is the relaxation factor. An erratum to this article is available at .     

Creep rupture of lead-free Sn-3.5Ag-Cu solders

Creep-rupture properties of lead-free Sn-3.5Ag-based alloys with varying amount of Cu were investigated using rolled and heat-treated dog-bone-shaped specimens. Nominal compositions of added copper were 0 wt.%, 0.5 wt.%, 0.75 wt.%, 1.0 wt.%, and 1.5 wt.%. During creep tests, the matrix hardness dropped significantly, and the minimum strain rates ( ) were lowest for the 0.75Cu specimens. The stress exponents (n) of were usually around 4, with the exception of the 0.5Cu and 0.75Cu alloys, which showed somewhat higher values of n. Fractographic analyses revealed typical creep rupture by the nucleation and growth of cavities in the matrix except the 1.5Cu specimens, which showed cavity nucleation at brittle Cu₆Sn₅ particles.     

Structural Analysis of CdTe Hetero-epitaxy on (211) Si

X-ray diffraction full-width at half-maximum (XRD FWHM), reflection high-energy electron diffraction (RHEED), and atomic force microscopy (AFM) indicate a mosaic structure for molecular-beam epitaxy (MBE) (211)B CdTe/Si. AFM measurements indicate long, thin, small-angle-disoriented grains for CdTe/Si epilayers. These disoriented grains are ~1 μm in the [] direction and are ~40 nm in the [] direction. The RHEED pattern in the [] direction depicts nearly ideal single-crystal periodicity. The RHEED pattern in the [] direction is indicative of small-angle-disoriented crystalline grains. Scanning electron microscopy (SEM), AFM, and XRD measurements all indicate an approximate factor of 10 increase in the Everson etch pit density (EPD) over standard Nomarski microscopy Everson EPD determination.     

Surface Morphology and Defect Formation Mechanisms for HgCdTe (211)B Grown by Molecular Beam Epitaxy

The surface morphology and crystallinity of HgCdTe films grown by molecular beam epitaxy (MBE) on both CdZnTe and CdTe/Si (211)B substrates were characterized using atomic force microscopy (AFM), as well as scanning (SEM) and transmission (TEM) electron microscopy. Crosshatch patterns and sandy-beach-like morphologies were commonly found on MBE (211) HgCdTe epilayers grown on both CdZnTe and CdTe/Si substrates. The patterns were oriented along the , , and directions, which were associated with the intersection between the (211) growth plane and each of the eight equivalent HgCdTe slip planes. This was caused by strain-driven operation of slip in these systems with relative large Schmid factor, and was accompanied by dislocation formation as well as surface strain relief. Surface crater defects were associated with relatively high growth temperature and/or low Hg flux, whereas microtwins were associated with relatively low growth temperature and/or high Hg flux. AFM and electron microscopy were used to reveal the formation mechanisms of these defects. HgCdTe/HgCdTe superlattices with layer composition differences of less than 2% were grown by MBE on CdZnTe substrates in order to clarify the formation mechanisms of void defects. The micrographs directly revealed the spiral nature of growth, hence demonstrating that the formation of void defects could be associated with the Burton, Cabrera, and Frank (BCF) growth mode. Void defects, including microvoids and craters, were caused by screw defect clusters, which could be triggered by Te precipitates, impurities, dust, other contamination or flakes. Needle defects originated from screw defect clusters linearly aligned along the directions with opposite Burgers vector directions. They were visible in HgCdTe epilayers grown on interfacial superlattices. Hillocks were generated owing to twin growth of void or needle defects on (111) planes due to low growth temperature and the corresponding insufficient Hg movement on the growth surface. Therefore, in addition to nucleation and growth of HgCdTe in the normal two-dimensional layer growth mode, the BCF growth mode played an important role and should be taken into account during investigation of HgCdTe MBE growth mechanisms.     

How r-Plane Al<Subscript>2</Subscript>O<Subscript>3</Subscript> Surface Modifications Impact the Growth of Epitaxial (001) CeO<Subscript>2</Subscript> Thin Films

We present evidence that it is the presence or absence of atomic terraces with a specific crystallographic orientation on the (102) Al₂O₃ surface that promotes growth of single-crystal (001) CeO₂ films over polycrystalline (111) CeO₂ films. The CeO₂ film nucleates so that the [010] and [100] directions of the film align parallel and perpendicular to the terrace edges. In the absence of terraces, multidomain (111) CeO₂ films result in which the in-plane orientation of the two domains are rotated by 85.71°, so that a [110] CeO₂ direction aligns parallel to either the or Al₂O₃ direction.     

Predicting and Understanding Order of Heteroepitaxial Quantum Dots

Heteroepitaxial self-assembled quantum dots (SAQDs) will allow breakthroughs in electronics and optoelectronics. SAQDs are a result of Stranski–Krastanow growth, whereby a growing planar film becomes unstable after an initial wetting layer is formed. Common systems are and For applications, SAQD arrays need to be ordered. The roles of crystal anisotropy, random initial conditions and thermal fluctuations in influencing SAQD order during early stages of SAQD formation are studied through a simple stochastic model of surface diffusion. Surface diffusion is analyzed through a linear and perturbatively non-linear analysis. The role of crystal anisotropy in enhancing SAQD order is elucidated. It is also found that SAQD order is enhanced when the deposited film is allowed to evolve at heights near the critical wetting surface height that marks the onset of non-planar film growth.     

Growth and Characterization of Pulsed-Laser-Deposited Ilmenite–Hematite Thin Films

The ilmenite–hematite (1 − x) FeTiO₃ · xFe₂O₃ solid solution system is considered to be a novel material for spin-electronics, microelectronics, high-temperature electronics, and radhard electronics. This paper focuses on thin films of composition x = 0.33 grown on (100) MgO single-crystal substrates using pulsed-laser deposition (PLD) under different argon–oxygen mixtures. The surface of the MgO was found to possess MgO₂ crystals, yielding an orientation relationship, [001] MgO ∥ [011] MgO₂ and (00)MgO ∥ (10) MgO₂. The structural characterizations show that the films are crystalline and homogeneous without any secondary phase. The films show a weak and inclined (110) growth epitaxy. A bandgap of 3.4–3.7 eV was obtained for these films from optical measurements carried out in the UV–visible region. Electrical measurements confirmed the semiconducting behavior. However, the resistivity was found to increase substantially on the slightest addition of oxygen into the chamber.     

Polytype Stability and Microstructural Characterization of Silicon Carbide Epitaxial Films Grown on [ {\hbox{11}}\overline{{\hbox{2}}} {\hbox{0}} ]- and [0001]-Oriented Silicon Carbide Substrates

The polytype and surface and defect microstructure of epitaxial layers grown on 4H(), 4H(0001) on-axis, 4H(0001) 8° off-axis, and 6H(0001) on-axis substrates have been investigated. High-resolution x-ray diffraction (XRD) revealed the epitaxial layers on 4H() and 4H(0001) 8° off-axis to have the 4H-SiC (silicon carbide) polytype, while the 3C-SiC polytype was identified for epitaxial layers on 4H(0001) and 6H(0001) on-axis substrates. Cathodoluminescence (CL), Raman spectroscopy, and transmission electron microscopy (TEM) confirmed these results. The epitaxial surface of 4H() films was specular with a roughness of 0.16-nm root-mean-square (RMS), in contrast to the surfaces of the other epitaxial layer-substrate orientations, which contained curvilinear boundaries, growth pits (∼3 × 10⁴ cm⁻²), triangular defects >100 μm, and significant step bunching. Molten KOH etching revealed large defect densities within 4H() films that decreased with film thickness to ∼10⁶ cm⁻² at 2.5 μm, while cross-sectional TEM studies showed areas free of defects and an indistinguishable film-substrate interface for 4H() epitaxial layers.     

Fabrication of Mesa Shaped InGaN-Based Light-Emitting Diodes Through a Photoelectrochemical Process

InGaN-based light-emitting diodes (LEDs) were fabricated to have a higher light extraction through the photoelectrochemical (PEC) mesa shaping process. After the PEC selective wet oxidation and wet etching processes, stable and controllable crystallographic etching planes were formed as p-type GaN {} planes and n-type GaN {} planes included at an angle of 27 deg. The ever-present cone-shaped structure of a PEC-treated LED has a larger light scattering area and higher light extraction cones on the mesa sidewall, as analyzed by microphotoluminescence and light output power measurement. This cone-shaped-sidewall LED has a higher light output power and a larger divergence angle compared with a conventional LED measured in an LED chip form.     

Discommensuration of Doped [Ca<Subscript>2</Subscript>CoO<Subscript>3</Subscript>]<Subscript><Emphasis Type="Italic">p</Emphasis></Subscript>CoO<Subscript>2</Subscript>

Single-crystal x-ray diffraction and high-resolution electron microscopy studies were carried out for Co-121 ([Ca₂CoO₃] _p CoO₂) and Sr-doped Co-121 grown in a KCl flux at 810°C. Typically, the samples were 2 mm × 2 mm × 0.02 mm in size. The single-crystal diffraction intensities were measured by the use of a four-circle diffractometer. Twinned super reflections, e.g., and were observed in the electron diffraction patterns. These super reflections were not observed in the end-member. Diffuse scattering was observed in the same reciprocal space by the single-crystal x-ray diffraction study. A discommensurate crystal model is proposed for the Sr-doped system.     

Planar defects and double-domain epitaxy in epitaxial YSi<Subscript>2−x</Subscript> and ErSi<Subscript>2−x</Subscript> thin films on Si substrates

Interfacial reactions of Y and Er thin films on both (111)Si and (001)Si have been studied by transmission electron microscopy (TEM). Epitaxial rare-earth (RE) silicide films were grown on (111)Si. Planar defects, identified to be stacking faults on planes with 1/6 displacement vectors, were formed as a result of the coalescence of epitaxial silicide islands. Double-domain epitaxy was found to form in RE silicides on (001)Si samples resulting from a large lattice mismatch along one direction and symmetry conditions at the silicide/(001)Si interfaces. The orientation relationships are [0001]RESi_2−x// Si, RESi_2−x//(001)Si and [0001]RESi_2−x/ Si, RESi_2−x//(001)Si. The density of staking faults in (111) samples and the domain size in (001) samples were found to decrease and increase with annealing temperature, respectively.     

Pre-avalanche Ultraviolet Photoconduction Properties of Transitional-Metal-Doped ZnO Nanowires

The ultraviolet (UV) photoelectric characteristics of transitional metal (Cu) doped ZnO nanowires produced by the self-catalytic vapor–liquid–solid (VLS) method were investigated by performing a series of photoconduction and time-resolved measurements. The photocurrent voltage characteristics obtained on the nanowires configured as two-terminal metal–semiconductor–metal photodetectors exhibited a nonmonotonic behavior attributed to the interplay of several limiting mechanisms: Schottky contacts and trapping/detrapping effects that take place at low and intermediate (pre-avalanche) bias regimes, respectively. In the intermediate biases, the photocurrent was power-law dependent, i.e., changed with voltage as and for excitation wavelengths of 365 nm, 302 nm, and 254 nm, respectively. The dependence of the exponent on the wavelength of the light is analyzed and explained based on the detailed consideration of the contribution of different deep-defect Cu levels formed within the band gap of ZnO. The study will be important to those working in the area of ZnO-based nanophotodetectors, optical switches, and sensors.     

The shape of self-assembled InAs islands grown by molecular beam epitaxy

We have determined the shape of InAs quantum dots using reflection high energy electron diffraction. Our results indicate that self-assembled InAs islands possess a pyramidal shape with {136} bounding facets. This shape is characterized by C_2v symmetry and a parallelogram base, which is elongated along the direction. Cross-sectional transmission electron microscopy images taken along the [110] and directions as well as atomic force microscopy images strongly support the {136} shape. Furthermore, polarization-resolved photoluminescence spectra show strong in-plane anisotropy, with emission predominantly polarized along the direction, consistent with the proposed quantum dot shape.     

Phase Equilibria of BaO-R2O3-CuO z Systems (R = Y and Lanthanides) under CO2-free Conditions

For applications ranging from phase equilibria to the processing of second-generation high T _c superconductor-coated-conductors, phase diagrams constructed under carbonate-free conditions are needed. Subsolidus phase equilibria of BaO-R₂O₃-CuO _z (R = Ho) have been investigated at (810°C), 21 kPa (875°C) and 0.1 MPa (850 and 930°C) by applying controlled atmosphere methods to minimize the presence of carbonate and CO₂ and H₂O contamination. Under carbonate-free conditions, most of these phase diagrams are different from those reported in the literature. In this paper, we also review and compare the phase diagrams of ten BaO-R₂O₃-CuO _z systems (R = Nd, Sm, Eu, Gd, Dy, Y, Ho, Er, Tm and Yb) that were previously determined in this laboratory under Among these diagrams, a distinct trend of phase formation and tie-line relationships is observed.     

Characterization of Epitaxial Indium Nitride Interlayers for Ohmic Contacts to Silicon Carbide

Ohmic contacts to n-type 4H- and 6H-SiC without postdeposition annealing were achieved using an interlayer of epitaxial InN beneath a layer of Ti. The InN films were grown by reactive dc magnetron sputtering at 450°C, whereas the Ti films were deposited by electron-beam evaporation at room temperature. The InN films were characterized by x-ray diffraction (XRD), secondary electron microscopy (SEM), cross-sectional transmission electron microscopy (TEM), and Hall-effect measurements. Both XRD and TEM observations revealed that the Ti and InN films have epitaxial relationships with the 6H-SiC substrate as follows: (0001)[]_Ti∥(0001)[]_InN∥(0001)[]_6H-SiC. The Ti/InN/SiC contacts displayed ohmic behavior, whereas Ti/SiC contacts (without an InN interlayer) were nonohmic. These results suggest that InN reduces the Schottky barrier height at the SiC surface via a small conduction-band offset and support previous reports of an electron accumulation layer at the surface of InN.     

Multivariable backward-shift-invariant subspaces and observability operators

It is well known that subspaces of the Hardy space over the unit disk which are invariant under the backward shift occur as the image of an observability operator associated with a discrete-time linear system with stable state-dynamics, as well as the functional-model space for a Hilbert space contraction operator. We discuss two multivariable extensions of this structure, where the classical Hardy space is replaced by (1) the Fock space of formal power series in a collection of d noncommuting indeterminates with norm-square-summable vector coefficients, and (2) the reproducing kernel Hilbert space (often now called the Arveson space) over the unit ball in with reproducing kernel ). In the first case, the associated linear system is of noncommutative Fornasini–Marchesini type with evolution along a free semigroup with d generators, while in the second case the linear system is a standard (commutative) Fornasini–Marchesini-type system with evolution along the integer lattice . An abelianization map (or symmetrization of the Fock space) links the first case with the second. The second case has special features depending on whether the operator-tuple defining the state dynamics is commutative or not. The paper focuses on multidimensional state-output linear systems and the associated observability operators; followup papers Ball, Bollotnikov, and Fang (2007a, 2007b) use the results here to extend the analysis to represent observability-operator ranges as reproducing kernel Hilbert spaces with reproducing kernels constructed from the transfer function of a conservative multidimensional (noncommutative or commutative) input-state-output linear system.      

Creep behavior of eutectic Sn-Cu lead-free solder alloy

Due to a typographical error incorporated during the editing process, the following is a correction of that error. Tensile creep behavior of precipitation-strengthened tin-based eutectic Sn-0.7Cu alloy was investigated at three temperatures ranging from 303 to 393 K. The steady-state creep rates cover six orders of magnitude (10⁻³ s⁻¹ to 10⁻⁸ s⁻¹) under the stress range of σ/E=10⁻⁴ to 10⁻³. The initial microstructure reveals that intermetallic compound Cu₆Sn₅ is finely dispersed in the matrix of β-Sn. By incorporating a threshold stress, σ_th, into the analysis, the creep data of eutectic Sn-Cu at all temperatures can be fitted by a single straight line with a slope of 7 after normalizing the steady-state creep rate and the effective stress, indicating that the creep rates are controlled by the dislocation pipe diffusion in tin matrix. So the steady-state creep rate, , can be expressed as , where Q_C is the active energy for creep, G is the temperature-dependent shear modulus, b is the Burgers vector, R is the universal gas constant, T is the temperature, σ is the applied stress, A is a material-dependent constant, and σ_th=σ_OB√1−k _R ² , in which σ_oB is the Orowan bowing stress and k_R is the relaxation factor. J. Electron. Mater. 31(5)(2002), pp.442–448. The online version of the original article can be found at