Zn$lt;sub$gt;1-$lt;i$gt;x$lt;/i$gt;$lt;/sub$gt;Mg$lt;sub$gt;$lt;i$gt;x$lt;/i$gt;$lt;/sub$gt;O薄膜的光致发光特性研究

采用脉冲激光沉积方法在单晶Si（100）衬底上制备出c轴取向的Zn_1-xMg_xO单晶薄膜,通过荧光光谱仪研究了薄膜的光致发光特性.实验结果表明,Mg含量增加,Zn_1-xMg_xO单晶薄膜的紫外发光峰蓝移,发光峰强度减弱,缺陷发光强度增强.同时发现,由于Mg的掺杂,引入了一些束缚能较大的局域束缚态.对于氧气氛下制备的样品,实验发现紫外峰和绿光带发光峰同时增强,但是R值减小,紫外峰红移.对绿光发光机理研究发现,绿光发光带主要与锌空位、氧间隙（O_i）或锌位氧（O_Zn）等缺陷有关,它是由多个缺陷发光峰组成,各缺陷发光峰强度相对变化导致了绿光发光带的整体移动. 关键词： 1-xMg_xO薄膜')" href="#">Zn_1-xMg_xO薄膜 光致发光 脉冲激光沉积     

硅衬底上Zn1-xMgxO薄膜的结构与光学性质

采用脉冲激光法（PLD）在Si衬底上沉积Zn1-xMgxO薄膜.x射线衍射(XRD)表明薄膜为c轴取向，（002）峰的半高宽仅为0.211°，且没有MgO的相偏析.透射电子显微镜可以清楚看到Zn1-xMgxO薄膜的c轴择优取向.在选区电子衍射图中可以看到Zn1-xMgxO结晶薄膜整齐的衍射斑点.室温下对Zn1-xMgxO薄膜进行了光致荧光光谱分析，发现其带边发射峰相对ZnO晶体有0.4eV的蓝移，带边发射峰与杂质发射峰的强度之比高达159.Zn1-xMgxO结晶薄膜质量良好，显示了应用于光电器件的潜力. 关键词： Zn1-xMgxO合金薄膜 硅衬底 脉冲激光沉积法 c轴取向 光致荧光光谱     

制备工艺对Zn1-xMgxO薄膜结构及光学性能的影响

采用脉冲激光沉积(PLD)方法在单晶Si(100)衬底上沿c轴方向生长单晶Zn1-xMgxO薄膜,通过X射线衍射(XRD)、原子力显微镜(AFM)、扫描电镜(SEM)和荧光光谱(PL)研究了膜厚、Mg含量、退火温度及氧气氛等制备工艺对Zn1-xMgxO薄膜的结构、形貌和光学性质的影响.实验结果表明,Mg含量x≤0.15时, Zn1-xMgxO保持六角纤锌矿结构,0.25≤x≤0.35时为立方结构,经过600℃退火之后,Zn0.75Mg0.25O转化为六角纤锌矿结构;后续退火有利于晶粒长大,一定的氧气氛也有利于减少晶体缺陷和薄膜的c轴应力,但是过量的氧气容易与Mg元素结合形成MgO,不利于ZnO 六角纤锌矿结构的生长.对Zn0.925Mg0.075O薄膜进行荧光光谱分析,分析结果表明缺陷发光峰主要与锌空位、锌位氧(Ozn)或氧间隙(Oi)等缺陷有关,退火可以使紫外发射峰蓝移.     

MgxZn1-xO薄膜的光致发光性能研究

用溶胶-凝胶旋涂的方法在Si(100)衬底上成功制备了MgxZn1-xO薄膜.通过对样品的X射线衍射花样进行分析,发现制得的样品都有明显的C轴取向.掺入Mg后C轴参数逐渐变小,这表明Mg离子进入了ZnO晶格.随着镁的掺入,其光致发光谱中的紫外发射峰的峰位发生明显蓝移,从3.28eV线性地变化到3.45eV.值得注意的是,掺入镁离子后,薄膜的紫外发光和可见发光的强度都显著高于ZnO.     

Measurement of Mg Content in Zn1-xMgxO Films by Electron Probe Microanalysis

Zn1-xMgxO films are grown on A-sapphire substrates by molecular beam epitaxy, and Mg content in the Zn1-xMgxO films is measured by electron probe microanalysis （EPMA） when the acceleration voltage, the emission current, and the magnification are set to be 1 k V, 30 μA and 1000, respectively. The dead time is controlled within 17%-20% during the measurement with the receive angle of characteristic x-ray of 45°. The Mg content of the ZnMgO film is calculated by the low energy calibration and the ZAF calibration. By comparing the measurement result with the theoretical analysis and the EPMA result with the inductively coupled plasma （ICP）, one can obtain that the measured value of Mg content of the samples is in good agreement with the theoretical analysis no matter whether the phase separation exists or not, and the correctness of ICP and EPMA is valid when Mg content in the samples is less than 0.5.     

Ga2O3薄膜的光致发光及激光烧蚀产物的分布

采用脉冲激光沉积技术在氧气氛中制备了Ｃａ２Ｏ３薄膜,Ｘ射线衍射表明薄膜属于β单斜晶系,薄膜的颗粒在纳米量级;原子力显微镜显示随着氧气压强的增加,薄膜颗粒增大,测定了薄膜的光致发光,发现沉积时氧气压强的增加可以提高纯Ｇａ２Ｏ３薄膜的发光强度,且峰位红移,Ｇａ２Ｏ３靶物质中掺杂少量的ＣｅＯ２后所得到的薄膜,其发光强度可以明显地增加,此外,还利用发光光谱技术研究了由激光烧蚀所产生的羽状物中Ｇａ原子或离     

ZnO薄膜近带边紫外发光的研究

用ZnO陶瓷靶,采用脉冲激光沉积(PLD)技术在c-Al₂O₃衬底上制备了ZnO薄膜。通过不同温度下光致发光(PL)光谱的测量,对样品的紫外发光机理进行研究。 在较低温度(10 K)下的PL光谱中,观测到一个位于3.354 eV处的束缚激子(D⁰X)发射,随着温度的升高(~50 K),在D⁰X的高能侧观测到了自由激子的发射峰。在10 K温度下,3.309 eV处出现了一个较强的发光带A,此发光带强度随着温度升高先增大然后减小,并且一直延续到室温。重点讨论了此发光带的起源,并认为A带可归属于自由电子-受主之间的复合发射。     

Zn1-xMgxO薄膜p型导电和光学性能

采用超声喷雾热分解(Ultrasonic Spray Pyrolysis,USP)方法,以醋酸锌、醋酸镁、醋酸铵、氯化铝的混合水溶液为前驱溶液,在单晶Si(100)衬底上制备了ZnO,Zn_0.81Mg_0.19O,N-Al共掺杂ZnO和N-Al共掺杂Zn_0.81Mg_0.19O薄膜。以X射线衍射(XRD)、场发射-扫描电镜(FE-SEM)、霍尔效应(Hall-effect)、光致发光(Photoluminescence,PL)谱等手段研究了薄膜的晶体结构、表面形貌、电学性能、光学性能和带隙变化。电学测试结果表明,未掺杂ZnO及Zn_0.81Mg_0.19O薄膜为n型导电;而N-Al共掺杂ZnO和N-Al共掺杂Zn_0.81Mg_0.19O薄膜呈p型导电。Zn_0.81Mg_0.19O和N-Al共掺杂Zn_0.81Mg_0.19O(p型)薄膜在维持ZnO纤锌矿结构的前提下,光学带隙随Mg掺杂量增加而增大。初步结果显示,优化工艺参数下通过Mg掺杂制备光学带隙可调的p型Zn_0.81Mg_0.19O薄膜,对于试制Zn_1-xMg_xO基同质p-n结、短波长(紫外、深紫外)器件等方面有重要意义。     

Zn1-xCoxO稀磁半导体薄膜的结构及其磁性研究

利用X射线吸收精细结构、X射线衍射和磁性测量等技术研究脉冲激光气相沉积法制备的Zn1-zCoxO(x=0.01,0.02)稀磁半导体薄膜的结构和磁性.磁性测量结果表明Zn1-xCoxO样品都具有室温铁磁性.X射线衍射结果显示其薄膜样品具有结晶良好的纤锌矿结构.荧光X射线吸收精细结构测试结果表明,脉冲激光气相沉积法制备的样品中的Co离子全部进入ZnO晶格中替代了部分Zn的格点位置,生成单一相的Zn1-xCoxO稀磁半导体.通过对X射线吸收近边结构谱的分析,确定Zn1-xCoxO薄膜中存在O空位,表明Co离子与O空位的相互作用是诱导Zn1-xCoxO产生室温铁磁性的主要原因.     

溶胶-凝胶法制备Zn1-xMgxO薄膜及其发光性质

采用溶胶-凝胶工艺在玻璃衬底上制备了Zn1-xMgxO(x=0.1,0.2,0.3,0.4,0.5,0.6,0.7)薄膜。X射线衍射(XRD)谱测试结果发现:在0.10.3时出现MgO立方相。薄膜光致发光谱研究表明紫外发光峰随Mg含量的增加向短波方向移动,且随着退火温度的升高发生明显蓝移,禁带宽度增大。但是退火温度为590℃的样品较560℃样品的发光峰出现红移。     

Third-order optical nonlinearities of Zn1-xMgxO thin films

The Zn1-xMgxO thin films were deposited on sapphire substrates by reactive electron beam evaporation deposition (REBED). The X-ray diffraction (XRD) measurement demonstrates that these films undergo phase transition from hexagonal to cubic with increasing the Mg concentration. Absorption coefficients at 532 nm of the samples were obtained from the absorption spectra. Using optical Kerr effect, the thirdorder susceptibilities of the ternary films over a wide range of Mg concentrations were determined. The magnitude of x(3) of the ternary Zn1-xMgxO films is order of 10-11 esu at λ = 532 nm. The sample with phase mixture of both hexagonal and cubic structures shows the largest third-order susceptibility. The difference observed in the magnitude of x(3) of Zn1-xMgxO films is attributed to the different microstructures of the ternary films, such as crystalline phase separation and crystal grains that enhance stimulated scattering.     

利用ICP法测定ZnMgO薄膜的Mg组分

利用电感耦合等离子体(ICP)装置对分子束外延(MBE)法在Sapphire衬底上生长的Zn_1-xMg_xO薄膜的Mg组分进行了测试. 经理论分析，得到使用1次和2次检量式所确定的Zn_1-xMg_xO薄膜中的Mg组分的差异. 将采用1次检量式的ICP测定与EPMA测定结果进行对照，表明当Mg组分x≤0.5时二者的测试结果相当一致，由此证明ICP测试结果的正确性. 关键词： ZnMgO薄膜 Mg组分 分子束外延(MBE) 电感耦合等离子体(ICP)     

Al和N共掺对Zn_(1-x)Mg_xO光学性质的影响

基于密度泛函理论第一性原理方法计算了Al和N共掺对Zn1-xMgxO在紫外光波段和可见光波段光学性质的影响.计算结果表明:光学性质变化主要发生在低能区,在高能区光学性质基本保持不变.介电函数虚部、吸收光谱和消光系数计算表明,Al和N共掺后Zn1-xMgxO的光学吸收边产生红移,对部分紫外光和可见光的吸收增强.介电函数实部和反射光谱计算表明,Al和N共掺后Zn1-xMgxO的反射峰强度增大,静态介电常数ε1(0)从2.64增大为3.23.能量损失谱的计算表明,Al和N共掺后Zn1-xMgxO的等离子体共振频率发生蓝移,共振频率的振幅增大.     

Photoluminescence of InP:Zn

Photoluminescence spectra of diffusion layers of zinc-doped indium phosphide were investigated. A study was made of diffusion layers obtained in different regimes. A diffusion process was conducted for 30 and 60 min at temperatures of 450–500°C. The photoluminescence spectra consisted of bands with E₁=1.145 eV, E₂=1.37 eV, E₃=1.345 eV, E₄=1.15 eV. Photoluminescence was measured at 77 K upon excitation by laser radiation at 0.44 μm. An analysis is made of the regularities of the change in the spectral dependences for samples with different prehistories by using layer-by-layer etching as well as of the change in the integral Zn activation energy for different temperatures of postdiffusion annealing. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 64, No. 1, pp. 125–128, January–February, 1997.     

纤锌矿结构Zn1-xMgxO电子结构及吸收光谱的第一性原理研究

采用第一性原理计算方法,计算了纤锌矿结构Zn1-xMgxO(x=0,0.0625,0.125,0.25)的电子结构及吸收光谱. 计算结果表明,Mg的掺入使ZnO的电子结构发生了较大的改变,与Mg邻近的O原子得到电子的数目明显增大,进而O原子返回部分电子给邻近Zn原子. Zn-O间相互作用减弱,禁带宽度变大,这也从同一合金中Zn4s上移的程度得到证实. 其吸收光谱也随着Mg的掺入出现蓝移现象,其吸收边对应波长分别为379,366,357和333nm,与实验结果相一致.