Pentacene thin-film transistors with sol-gel derived amorphous Ba0.6Sr0.4TiO3 gate dielectric

An amorphous Ba_0.6Sr_0.4TiO₃ (BST) film with the thickness of 200 nm was deposited on indium-tin-oxide (ITO)-coated glass substrate through sol-gel route and post-annealing at 500 °C. The dielectric constant of the BST film was determined to be 20.6 at 100 kHz by measuring the Ag/BST/ITO parallel plate capacitor, and no dielectric tunability was observed with the bias voltage varying from −5 to 5 V. The BST film shows a dense and uniform microstructure as well as a smooth surface with the root-mean-square (RMS) roughness of about 1.4 nm. The leakage current density was found to be 3.5 × 10⁻⁸ A/cm² at an applied voltage of −5 V. The transmittance of the BST/ITO/glass structure is more than 70% in the visible region. Pentacene based transistor using the as-prepared BST film as gate insulator exhibits a low threshold voltage of −1.3 V, the saturation field-effect mobility of 0.68 cm²/Vs, and the current on/off ratio of 3.6 × 10⁵. The results indicate that the sol-gel derived BST film is a promising high-k gate dielectric for large-area transparent organic transistor arrays on glass substrate.     

Organic light-emitting devices with double-block layer

We report on the fabrication of organic light-emitting devices (OLEDs) using double-block layers on the electron transport layer and emitting layer. The current efficiency of the organic light-emitting diode is improved by 43% to 9.16 cd A⁻¹ as compared to the device with a single host of Alq₃ as the electron transport layer. The maximum luminance is over 23 750 cd m⁻² at the bias of 18 V and the current of 338.3 mA cm⁻², which is 33% higher than the single host Alq₃ device without block layer. Using a step-by-step procedure to smooth electron injection and transport, the energy levels introduced by the insertion layers are an effective method of improving the luminance characteristics.     

MOS devices with tetragonal ZrO2 as gate dielectric formed by annealing ZrO2/Ge/ZrO2 laminate

A Ge-stabilized tetragonal ZrO₂ (t-ZrO₂) film with permittivity (κ) of 36.2 was formed by depositing a ZrO₂/Ge/ZrO₂ laminate and a subsequent annealing at 600 °C, which is a more reliable approach to control the incorporated amount of Ge in ZrO₂. On Si substrates, with thin SiON as an interfacial layer, the SiON/t-ZrO₂ gate stack with equivalent oxide thickness (EOT) of 1.75 nm shows tiny amount of hysteresis and negligible frequency dispersion in capacitance-voltage (C-V) characteristics. By passivating leaky channels derived from grain boundaries with NH₃ plasma, good leakage current of 4.8 × 10⁻⁸ A/cm² at V_g = V_fb − 1 V is achieved and desirable reliability confirmed by positive bias temperature instability (PBTI) test is also obtained.     

Composition and electrical characteristics of Al2O3-HfO2-HfTiO nanolaminates on Si

A dielectric constant of 27 was demonstrated in the as deposited state of a 5 nm thick, seven layer nanolaminate stack comprising Al₂O₃, HfO₂ and HfTiO. It reduces to an effective dielectric constant (k_eff) of ∼14 due to a ∼0.8 nm interfacial layer. This results in a quantum mechanical effective oxide thickness (EOT) of ∼1.15 nm. After annealing at 950 °C in an oxygen atmosphere k_eff reduces to ∼10 and EOT increases to 1.91 nm. A small leakage current density of about 8 × 10⁻⁷ and 1 × 10⁻⁴ A/cm², respectively at electric field 2 and 5 MV/cm and a breakdown electric field of about 11.5 MV/cm was achieved after annealing at 950 °C.     

Visible blind p-π-n-n ultraviolet photodetectors based on 4H-SiC homoepilayers

p⁺-π-n⁻-n⁺ ultraviolet photodetectors based on 4H-SiC homoepilayers have been presented. The growth of the 4H-SiC homoepilayers was carried out in a LPCVD system. The size of the active area of the photodetectors was 300×300 μm². The dark and illuminated I-V characteristics had been measured at reverse biases form 0 to 20 V at room temperature, and the illuminated current was at least two orders of magnitude than that of dark current below 13 V bias. The peak value zones of the photoresponse were located at 280-310 nm at different reverse biases, and the peak value located at 300 nm was 100 times greater than the cut-off response value in 380 nm at a bias of 10 V, which showed the device had good visible blind performance. A small red-shift about 5 nm on the peak responsivity occurred when reverse bias increased from 5 to 15 V.     

High performance p-type organic thin film transistors with an intrinsically photopatternable,ultrathin polymer dielectric layer

A high-performing bottom-gate top-contact pentacene-based oTFT technology with an ultrathin (25–48 nm) and electrically dense photopatternable polymeric gate dielectric layer is reported. The photosensitive polymer poly((±)endo,exo-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid, diphenylester) (PNDPE) is patterned directly by UV-exposure (λ = 254 nm) at a dose typical for conventionally used negative photoresists without the need for any additional photoinitiator. The polymer itself undergoes a photo-Fries rearrangement reaction under UV illumination, which is accompanied by a selective cross-linking of the macromolecules, leading to a change in solubility in organic solvents. This crosslinking reaction and the negative photoresist behavior are investigated by means of sol–gel analysis. The resulting transistors show a field-effect mobility up to 0.8 cm² V⁻¹ s⁻¹ at an operation voltage as low as −4.5 V. The ultra-low subthreshold swing in the order of 0.1 V dec⁻¹ as well as the completely hysteresis-free transistor characteristics are indicating a very low interface trap density. It can be shown that the device performance is completely stable upon UV-irradiation and development according to a very robust chemical rearrangement. The excellent interface properties, the high stability and the small thickness make the PNDPE gate dielectric a promising candidate for fast organic electronic circuits.     

Effect of a silicon nitride buffer layer on the electrical properties of tantalum pentoxide films

Ta₂O₅ films with a buffer layer of silicon nitride of various thicknesses were deposited on Si substrate by reactive sputtering and submitted to annealing at 700 °C in nitrogen atmosphere. The microstructure and the electrical properties of thin films were studied. It was found that with a buffer layer of silicon nitride the electrical properties of Si_xN_y/Ta₂O₅ film can be improved than Ta₂O₅ film. When the thickness of the buffer layer was 3 nm, the Si_xN_y/Ta₂O₅ film has the highest dielectric constant of 27.4 and the lowest leakage current density of 4.61 × 10⁻⁵ A/cm² (at −1 V). For the Si_xN_y (3 nm)/Ta₂O₅ film, the conduction mechanism of leakage current was also analyzed and showed four types of conduction mechanisms at different applied voltages.     

Interface control of conventional n-type silicon/metal by n-channel organic semiconductor

The rectifying and interface state density properties of n-Si/violanthrone-79/Au metal-diode have been investigated by current-voltage and capacitance-conductance-frequency methods. The ideality factor, barrier height and average series resistance of the diode were found to be 2.07, 0.81 eV and 5.04 kΩ respectively. At higher voltages, the organic layer contributes to I-V characteristics of the diode due to space-charge injection into the organic semiconductor layer and the trapped-charge-limited current mechanism is dominant mechanism for the diode. The barrier height obtained from C-V measurement is lower than the barrier height obtained I-V measurement and the organic layer creates an excess physical barrier for the diode. The interface state density of the diode was found to be 1.70 × 10¹¹ eV⁻¹ cm⁻² at 0.2 V and 1.72 × 10¹¹ eV⁻¹ cm⁻² at 0.4 V.The obtained electronic parameters indicate that the organic layer provides the conventional n-type silicon/metal interface control option.     

The electrical characteristics of Sn/methyl-red/p-type Si/Al contacts

The junction characteristics of the organic compound methyl-red film (2-[4-(dimethylamino)phenylazo]benzoic acid) on a p-type Si substrate have been studied. The current-voltage characteristics of the device have rectifying behavior with a potential barrier formed at the interface. The barrier height and ideality factor values of 0.73 eV and 3.22 for the structure have been obtained from the forward bias current-voltage (I-V) characteristics. The interface state energy distribution and their relaxation time have ranged from 1.68 × 10¹² cm⁻² eV⁻¹ and 1.68 × 10⁻³ s in (0.73-E_v) eV to 1.80 × 10¹² cm⁻² eV⁻¹ and 5.29 × 10⁻⁵ s in (0.43-E_v) eV, respectively, from the forward bias capacitance-frequency and conductance-frequency characteristics. Furthermore, the relaxation time of the interface states shows an exponential rise with bias from (0.43-E_v) eV towards (0.73-E_v) eV.     

Materials and interfaces issues in pentacene/PTCDI-C8 ambipolar organic field-effect transistors with solution-based gelatin dielectric

Gelatin is a natural protein, which works well as the gate dielectric for pentacene/N,N-dioctyl-3,4,9,10-perylene tetracarboxylic diimide (PTCDI-C₈) ambipolar organic field-effect transistors (OFETs) in air ambient and in vacuum. An aqueous solution process was used to form the gelatin gate dielectric film on poly(ethylene terephthalate) (PET) by spin-coating and subsequent casting. Pentacene morphology and interface roughness are two major factors affecting the electron and hole field-effect mobility (μ_FE) values of pentacene/PTCDI-C₈ ambipolar OFETs in vacuum and in air ambient. In contrast, water absorption in gelatin has higher contribution to the electron and hole μ_FE values in air ambient. The ambipolar performance of pentacene/PTCDI-C₈ ambipolar OFETs depends on their layer sequence. For example, when PTCDI-C₈ is deposited onto pentacene, i.e. in the structure of PTCDI-C₈/pentacene, unbalanced ambipolar characteristics appear. In contrast, better ambipolar performance occurs in the structure of pentacene/PTCDI-C₈. The optimum ambipolar characteristics with electron μ_FE of 0.85 cm² V⁻¹ s⁻¹ and hole μ_FE of 0.95 cm² V⁻¹ s⁻¹ occurs at the condition of pentacene (40 nm)/PTCDI-C₈ (40 nm). Surprisingly, water absorption plays a crucial role in ambipolar performance. The device performance changes tremendously in pentacene/PTCDI-C₈ ambipolar OFETs due to the removal of water out of gelatin in vacuum. The optimum ambipolar characteristics with electron μ_FE of 0.008 cm² V⁻¹ s⁻¹ and hole μ_FE of 0.007 cm² V⁻¹ s⁻¹ occurs at the condition of pentacene (65 nm)/PTCDI-C₈ (40 nm). The roles of layer sequence, relative layer thickness, and water absorption are proposed to explain the ambipolar performance.     

Fast response organic photodetectors with high detectivity based on rubrene and C60

We presented a fast response organic photodetector based on high mobility material rubrene and C60 as donor and acceptor, respectively. It was found the diffusing time of the excitons limited the bandwidth in photodetectors composing of rubrene/C60 bilayer heterojunction. As introducing a mixing layer of rubrene and C60 between rubrene/C60 heterojunction, the response speed is greatly improved. The presented organic photodetectors finally showed a bandwidth of 15.6 MHz under a small reverse bias of −2 V. Moreover, the specific detectivity exceeded 10¹² Jones and the dark current density was as low as 1.5 nA cm⁻².     

Comparison of short and long wavelength absorption electron donor materials in C60-based planar heterojunction organic photovoltaics

Buckminsterfullerene, C₆₀-based planar heterojunction (PHJ) organic photovoltaics (OPVs) have been created using a short wavelength absorption (λ_max = 490 nm) electron-donating bis(naphthylphenylaminophenyl)fumaronitrile (NPAFN). NPAFN exhibits a hole mobility greater than 0.07 cm² V⁻¹ s⁻¹ as determined by its field-effect transistor. It can be attributed to such hole mobility that enables a thin layer (<10 nm) NPAFN in PHJ OPV, ITO/NPAFN/C₆₀/bathocuproine/Al. Because of the low lying HOMO energy level (5.75 eV) of NPAFN and relatively high ionization potential ITO (∼5.58 eV), such OPVs exhibit a very high open circuit voltage of ∼1.0 V, relatively high fill factor of 0.60, and a relatively high shunt resistance of 1100 Ω cm⁻², which all compensate for a relatively low short circuit current of 3.15 mA cm⁻² due to the short absorption wavelength and inferred short exciton diffusion length of NPAFN. Altogether, NPAFN OPVs display a power conversion efficiency (η_PC) of 2.22%, which is better than other long wavelength absorption materials in similar PHJ OPVs, such as pentacene (λ_max 670 nm, HOMO 5.12 eV, η_PC 1.50%) and copper phthalocyanine (λ_max 624, 695 nm, HOMO 5.17 eV, η_PC 1.43%).     

Downscaling of n-channel organic field-effect transistors with inkjet-printed electrodes

In this contribution we demonstrate for the first time a downscaled n-channel organic field-effect transistors based on N,N′-dialkylsubstituted-(1,7&1,6)-dicyanoperylene-3,4:9,10-bis(dicarboximide) with inkjet printed electrodes. First we demonstrate that the use of a high boiling point solvent is critical to achieve extended crystalline domains in spin-coated thin films and thus high electron mobility >0.1 cm² V⁻¹ s⁻¹ in top-gate devices. Then inkjet-printing is employed to realize sub-micrometer scale channels by dewetting of silver nanoparticles off a first patterned gold contact. By employing a 50 nm crosslinked fluoropolymer gate dielectric, ∼200 nm long channel transistors can achieve good current saturation when operated <5 V with good bias stress stability.     

Improved property in organic light-emitting diode utilizing two Al/Alq3 layers

We reported on the fabrication of organic light-emitting devices (OLEDs) utilizing the two Al/Alq₃ layers and two electrodes. This novel green device with structure of Al(110 nm)/tris(8-hydroxyquinoline) aluminum (Alq₃)(65 nm)/Al(110 nm)/Alq₃(50 nm)/N,N′-dipheny1-N, N′-bis-(3-methy1phyeny1)-1, 1′-bipheny1-4, 4′-diamine (TPD)(60 nm)/ITO(60 nm)/Glass. TPD were used as holes transporting layer (HTL), and Alq₃ was used as electron transporting layer (ETL), at the same time, Alq₃ was also used as emitting layer (EL), Al and ITO were used as cathode and anode, respectively. The results showed that the device containing the two Al/Alq₃ layers and two electrodes had a higher brightness and electroluminescent efficiency than the device without this layer. At current density of 14 mA/cm², the brightness of the device with the two Al/Alq₃ layers reach 3693 cd/m², which is higher than the 2537 cd/m² of the Al/Alq₃/TPD:Alq₃/ITO/Glass device and the 1504.0 cd/m² of the Al/Alq₃/TPD/ITO/Glass. Turn-on voltage of the device with two Al/Alq₃ layers was 7 V, which is lower than the others.     

Influences of using a high mobility donor polymer on solar cell performance

We report a p-type polymer semiconductor, PDBFBT, which exhibits very high space charge limited current (SCLC) mobilities of up to 2.3 × 10⁻² cm² V⁻¹ s⁻¹, which are among the highest reported so far. When the polymer is employed as a donor material in solution coated bulk heterojunction organic solar cells (OSCs), with PC₆₁BM as the acceptor, an efficiency of 4.53% and very high fill factors (>70% in some cases) are achieved. Furthermore, in the inverted device configuration, consistent power conversion efficiencies are demonstrated throughout a wide range of active layer thicknesses (∼100 nm to ∼800 nm). Our results demonstrate the benefits of using very high mobility donor polymers in solar cell applications and will be very useful for the development of new semiconductor materials, as well as the design of device structures for more feasible manufacturing of high efficiency, large area photovoltaic devices via high speed roll-to-roll printing processes.     

Pentacene/n-Si heterojunction diodes and photovoltaic devices investigated by I-V and C-V measurements

The forward and reverse current density-voltage (J-V) and capacitance-voltage (C-V) characteristics of pentacene/n⁻-silicon heterojunction diodes were investigated to clarify the carrier conduction mechanism at the organic/inorganic heterojunction. Current rectification characteristics of the pentacene/n⁻-Si junctions can be explained by a Schottky diode model with an interfacial layer. The diode parameters such as Schottky barrier height and ideality factor were estimated to be 0.79-1.0 eV and 2.4-2.7, respectively. The C-V analysis suggests that the depletion layer appears selectively in the n⁻-Si layer with a thickness of 1.47 μm from the junction with zero bias and the diffusion potential was estimated at 0.30 eV at the open-circuit condition. The present heterojunction allows the photovoltaic operation with power conversion efficiencies up to 0.044% with a simulated solar light exposure of 100 mW/cm².     

Diketopyrrolopyrrole-based small molecules with simple structure for high VOC organic photovoltaics

A series of simple structured small molecules based on diketopyrrolopyrrole (DPP) are synthesized and their photovoltaic properties are investigated in terms of the type of electron donating unit. By introducing a donor unit with different electron-donating power such as thiophene (T) and phenylene (Ph), into A−D−A type small molecule, the frontier orbital energy levels of small molecules can effectively be tuned. The small molecule with a weak donor unit of Ph, Ph(TDPP)₂ exhibits a power conversion efficiency of 4.01% with a remarkably high open circuit voltage of 0.93 V when it is blended with [6,6]-phenyl-C₇₁-butyric acid methyl ester as an active layer material in bulk heterojunction solar cells.     

Synthesis and characterization of triphenylamine flanked thiazole-based small molecules for high performance solution processed organic solar cells

Two new small molecules, 5,5-bis(2-triphenylamino-3-decylthiophen-2-yl)-2,2-bithiazole (M1) and 2,5-bis(2-triphenylamino-3-decylthiophen-2-yl)thiazolo[5,4-d]thiazole (M2) based on an electron-donor triphenylamine unit and electron-acceptor thiophene-thiazolothiazole or thiophene-bithiazole units were synthesized by a palladium(0)-catalyzed Suzuki coupling reaction and examined as donor materials for application in organic solar cells. The small molecules had an absorption band in the range of 300-560 nm, with an optical band gap of 2.22 and 2.25 for M1 and M2, respectively_. As determined by cyclic voltammetry, the highest occupied molecular orbital and lowest unoccupied molecular orbital energy levels of M1 were −5.27 eV and −3.05 eV, respectively, which were 0.05 eV and 0.02 eV greater than that of M2. Photovoltaic properties of the small molecules were investigated by constructing bulk-heterojunction organic solar cell (OSC) devices using M1 and M2 as donors and fullerene derivatives, 6,6-phenyl-C61-butyric acid methyl ester (PC₆₁BM) and 6,6-phenyl-C71-butyric acid methyl ester (PC₇₁BM) as acceptors with the device architecture ITO/PEDOT:PSS/M1 or M2:PCBM/LiF/Al. The effect of the small molecule/fullerene weight ratio, active layer thickness, and processing solvent were carefully investigated to improve the performance of the OSCs. Under AM 1.5 G 100 mW/cm² illumination, the optimized OSC device with M1 and PC₇₁BM at a weight ratio of 1:3 delivered a power conversion efficiency (PCE) of 1.30%, with a short circuit current of 4.63 mA/cm², an open circuit voltage of 0.97 V, and a fill factor of 0.29. In contrast, M2 produced a better performance under identical device conditions. A PCE as high as 2.39% was recorded, with a short circuit current of 6.49 mA/cm², an open circuit voltage of 0.94 V, and a fill factor of 0.39.     

Low dark current and internal gain mechanism of GaN MSM photodetectors fabricated on bulk GaN substrate

Metal-semiconductor-metal ultraviolet photodetectors are fabricated on low-defect-density homoepitaxial GaN layer on bulk GaN substrate. The dislocation density of the homoepitaxial layer characterized by cathodoluminescence mapping technique is ∼5 × 10⁶ cm⁻². The photodetector with a high UV-to-visible rejection ratio of up to 1 × 10⁵ exhibits a low dark current of <2 pA at room temperature under 10 V bias. The photo-responsivity of the photodetector gradually increases as a function of applied bias, resulting in a photodetector quantum efficiency exceeding 100% at above medium bias. The photo-responsivity also shows a dependence on the incident optical power density and illumination conditions. The internal gain mechanism of the photodetector is attributed to photo-generated holes trapped at the semiconductor/metal interface as well as high-field-induced image-force lowering effect.     

Investigation of graded InxGa1−xP buffer by Raman scattering method

The compositional changes of In_xGa_1−xP graded buffer inserted between GaP substrate and subsequently grown In_0.36Ga_0.64P homojunction LED structure were investigated by Raman spectroscopy. The indium content of In_xGa_1−xP interlayers was increased in eight steps with thickness of 300 nm and constant compositional change Δx_In between the steps. The properties of In_xGa_1−xP graded buffer along the structure cross-section have been studied by Raman back scattering method and the changes in GaP LO and TO phonons were investigated. Raman shift of 13 cm⁻¹ in GaP-like LO₁ phonon was measured on beveled [100]surface for compositional change of In_xGa_1−xP layer in the range of 0<x_In<0.32. The measurements on the cleaved edge of the sample in [011] direction revealed a strong TO phonon at 366 cm⁻¹ and weak LO phonon peak at 405 cm⁻¹ in GaP substrate. By reaching the graded In_xGa_1−xP region the intensity of TO phonon decreases and appearance of considerable TO₁ phonon shift up to 350 cm⁻¹ for In content x_In=0.16 was observed. For upper graded layers with x_In from 0.16 to 0.24 the position of GaP-like TO₁ was constant and can be ascribed to relaxation of lattice mismatched thin In_xGa_1−xP graded upper layers in the structure.