Fin width and height dependence of bipolar amplification in bulk FinFETs submitted to heavy ion irradiation

Fin FET technologies are becoming the mainstream process as technology scales down. Based on a 28-nm bulk pFin FET device, we have investigated the fin width and height dependence of bipolar amplification for heavy-ion-irradiated Fin FETs by 3D TCAD numerical simulation. Simulation results show that due to a well bipolar conduction mechanism rather than a channel(fin) conduction path, the transistors with narrower fins exhibit a diminished bipolar amplification effect, while the fin height presents a trivial effect on the bipolar amplification and charge collection. The results also indicate that the single event transient(SET) pulse width can be mitigated about 35% at least by optimizing the ratio of fin width and height, which can provide guidance for radiation-hardened applications in bulk Fin FET technology.     

Mechanism of single-event transient pulse quenching between dummy gate isolated logic nodes

As integrated circuits scale down in size,a single high-energy ion strike often affects multiple adjacent logic nodes.The so-called single-event transient(SET)pulse quenching induced by single-event charge sharing collection has been widely studied.In this paper,SET pulse quenching enhancement is found in dummy gate isolated adjacent logic nodes compared with that isolated by the common shallow trench isolation(STI).The physical mechanism is studied in depth and this isolation technique is explored for SET mitigation in combinational standard cells.Three-dimensional(3D)technology computer-aided design simulation(TCAD)results show that this technique can achieve efficient SET mitigation.     

The dual role of multiple-transistor charge sharing collection in single-event transients

As technologies scale down in size, multiple-transistors being affected by a single ion has become a universal phenomenon, and some new effects are present in single event transients (SETs) due to the charge sharing collection of the adjacent multiple-transistors. In this paper, not only the off-state p-channel metal-oxide semiconductor field-effect transistor (PMOS FET), but also the on-state PMOS is struck by a heavy-ion in the two-transistor inverter chain, due to the charge sharing collection and the electrical interaction. The SET induced by striking the off-state PMOS is efficiently mitigated by the pulse quenching effect, but the SET induced by striking the on-state PMOS becomes dominant. It is indicated in this study that in the advanced technologies, the SET will no longer just be induced by an ion striking the off-state transistor, and the SET sensitive region will no longer just surround the off-state transistor either, as it is in the older technologies. We also discuss this issue in a three-transistor inverter in depth, and the study illustrates that the three-transistor inverter is still a better replacement for spaceborne integrated circuit design in advanced technologies.     

Temperature and drain bias dependence of single event transient in 25-nm FinFET technology

In this paper,we investigate the temperature and drain bias dependency of single event transient(SET) in 25-nm fin field-effect-transistor(FinFET) technology in a temperature range of 0-135°C and supply voltage range of 0.4 V-1.6 V.Technology computer-aided design(TCAD) three-dimensional simulation results show that the drain current pulse duration increases from 0.6 ns to 3.4 ns when the temperature increases from 0 to 135°C.The charge collected increases from 45.5 fC to 436.9 fC and the voltage pulse width decreases from 0.54 ns to 0.18 ns when supply voltage increases from 0.4 V to 1.6 V.Furthermore,simulation results and the mechanism of temperature and bias dependency are discussed.     

0.18 μm部分耗尽绝缘体上硅互补金属氧化物半导体电路单粒子瞬态特性研究

利用脉冲激光入射技术研究100级0.18 μm部分耗尽绝缘体上硅互补金属氧化物半导体反相器链的单粒子瞬态效应, 分析了激光入射器件类型及入射位置对单粒子瞬态脉冲传输特性的影响. 实验结果表明, 单粒子瞬态脉冲在反相器链中的传输与激光入射位置有关, 当激光入射第100级到第2级的n型金属-氧化物-半导体器件, 得到的脉冲宽度从287.4 ps增加到427.5 ps; 当激光入射第99级到第1级的p型金属-氧化物-半导体器件, 得到的脉冲宽度从150.5 ps增加到295.9 ps. 激光入射点靠近输出则得到的瞬态波形窄; 靠近输入则得到的瞬态波形较宽, 单粒子瞬态脉冲随着反相器链的传输而展宽. 入射器件的类型对单粒子瞬态脉冲展宽无影响. 通过理论分析得到, 部分耗尽绝缘体上硅器件浮体效应导致的阈值电压迟滞是反相器链单粒子瞬态脉冲展宽的主要原因. 而示波器观察到的与预期结果幅值相反的正输出脉冲, 是输出节点电容充放电的结果.     

用于高功率激光脉冲整形的可编程任意波形电脉冲发生器

研制了一种基于GaAs场效应管与超快脉冲信号微带传输的可编程任意波形发生器.它由计算机控制的多路高准确度偏置电压，多个级联的GaAs场效应管基元电路，以及微带脉冲传输线组成．输出电脉冲波形导入LiNbO3集成光波导调制器，经过电光调制获得相应的激光脉冲波形．通过计算机设置各基d元电路中GaAs场效应管栅极偏压，进而控制整形电脉冲的形状，使高功率激光装置前端时域脉冲整形实现远程控制．     

A single-event transient induced by a pulsed laser in a silicon-germanium heterojunction bipolar transistor

A study on the single event transient (SET) induced by a pulsed laser in a silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) is presented in this work. The impacts of laser energy and collector load resistance on the SET are investigated in detail. The waveform, amplitude, and width of the SET pulse as well as collected charge are used to characterize the SET response. The experimental results are discussed in detail and it is demonstrated that the laser energy and load resistance significantly affect the SET in the SiGe HBT. Furthermore, the underlying physical mechanisms are analyzed and investigated, and a near-ideal exponential model is proposed for the first time to describe the discharge of laser-induced electrons via collector resistance to collector supply when both base-collector and collector-substrate junctions are reverse biased or weakly forward biased. Besides, it is found that an additional multi-path discharge would play an important role in the SET once the base-collector and collector-substrate junctions get strongly forward biased due to a strong transient step charge by the laser pulse.     

An analytical model for nanowire junctionless SOI Fin FETs with considering three-dimensional coupling effect

In this paper, the three-dimensional(3D) coupling effect is discussed for nanowire junctionless silicon-on-insulator(SOI) Fin FETs. With fin width decreasing from 100 nm to 7 nm, the electric field induced by the lateral gates increases and therefore the influence of back gate on the threshold voltage weakens. For a narrow and tall fin, the lateral gates mainly control the channel and therefore the effect of back gate decreases. A simple two-dimensional(2D) potential model is proposed for the subthreshold region of junctionless SOI Fin FET. TCAD simulations validate our model. It can be used to extract the threshold voltage and doping concentration. In addition, the tuning of back gate on the threshold voltage can be predicted.     

Parasitic bipolar amplification in a single event transient and its temperature dependence

Using three-dimensional technology computer-aided design (TCAD) simulation, parasitic bipolar amplification in a single event transient (SET) current of a single transistor and its temperature dependence are studied. We quantify the contributions of different current components in a SET current pulse, and it is found that the proportion of parasitic bipolar amplification in total collected charge is about 30% in both 130-nm and 90-nm technologies. The temperature dependence of parasitic bipolar amplification and the mechanism of the SET pulse are also investigated and quantified. The results show that the proportion of charge induced by parasitic bipolar increases with rising temperature, which illustrates that the parasitic bipolar amplification plays an important role in the charge collection of a single transistor.     

Parasitic bipolar amplification in single event transient and its temperature dependence

Using three-dimensional technology computer-aided design (TCAD) simulation, parasitic bipolar amplification in single event transient (SET) current of single transistor and its temperature dependence are studied. We quantify the contributions of different current components in SET current pulse, and it is found that the proportion of parasitic bipolar amplification in total collected charge is about 30% in both 130-nm and 90-nm technologies. The temperature dependence of parasitic bipolar amplification and the mechanism of SET pulse are also investigated and quantified. The results show that the proportion of charge induced by parasitic bipolar increases with rising temperature, which illustrates that the parasitic bipolar amplification plays an important role in the charge collection of single transistor.     

爆炸驱动铁电体电源快脉冲产生技术

以发展轻小型高电压脉冲驱动源为出发点,提出采用爆炸驱动铁电体作为初级电源,通过电感储能与电爆炸丝断路开关进行脉冲压缩和功率放大,探索基于爆炸驱动铁电体电源的小型化高电压快脉冲产生技术。从爆炸驱动铁电体电源的全电路模型和铁电陶瓷材料特性出发,通过理论分析和仿真研究,分别对大电流模式和高电压模式的爆炸驱动铁电体电源的物理参数进行了设计,获得了铁电体电源工作模式和电路参数对产生高电压脉冲的影响规律,认为铁电体电源高电压模式更适合于与断路开关技术结合产生高电压快脉冲,并通过实验对该技术原理进行了验证。实验中铁电体电源输出电流约360 A、脉宽约3.8 μs,对17.5 nF电容器充电至75 kV,电容器放电后在电爆炸断路开关中产生峰值大于12 kA的脉冲电流,最终在X射线二极管负载上获得了电压峰值大于180 kV、前沿3 ns、脉宽30 ns、电流峰值3.4 kA的高电压快脉冲。     

基于分数比可饱和脉冲变压器的全固态脉冲驱动源初步研究

设计了一台基于分数比可饱和脉冲变压器的全固态脉冲驱动源,其核心部件为分数比可饱和脉冲变压器,用来实现固态磁开关、脉冲调制、电压升压等功能,再借助Marx技术、磁开关技术和反谐振网络调制技术建立全固态脉冲驱动源,初步实验结果表明当直流电源提供100 V的充电电压时,该全固态脉冲驱动源可输出14.4 kV左右的准方波信号,脉宽约194 ns,验证了该技术方案实现输出百纳秒准方波信号的可行性,为建立百MW长脉冲信号输出的全固态脉冲驱动源模块提供了设计思路。     

小型化电感隔离型Marx发生器的研制

随着脉冲功率技术的发展,纳秒脉冲电场被逐渐应用到等离子体水处理、不可逆电穿孔肿瘤消融等技术中。为了满足纳秒脉冲的应用需求,电源需要输出十几kV高压,拥有纳秒窄脉宽和快速的上升沿,同时尽量减小电源体积,降低成本。该纳秒脉冲电源采用电感隔离型Marx发生器结构,电路可以实现模块化叠加,电感隔离可以减少开关数量,抬升充电电压,以获得更高的电压输出。所设计的驱动电路仅需一路控制信号和一个直流供电模块,经功率放大和磁隔离后可同时控制所有放电管,该驱动电路结构简单、成本低、体积小,耐压水平高。所设计的24级电源样机,在50 kΩ阻性负载上,可输出0～14 kV电压,频率0.5～1 kHz,脉宽500 ns。该电源主电路的长宽高尺寸仅为23 cm×10 cm×12 cm。     

基于高温超导脉冲变压器的脉冲电源测控系统

为了监测脉冲电源的放电特性、控制脉冲电源的可靠工作,采用现代测试技术、虚拟仪器技术和数据库技术,设计了基于高温超导脉冲变压器的脉冲电源测控系统,硬件系统由计算机、单片机、数据采集卡、驱动电路板和电压电流传感器等组成,软件系统采用LabVIEW来进行设计.在脉冲电源的测量算法中,采用基于EEMD的消噪算法,消除了噪声,采用基于最小二乘法的数据拟合算法,准确的测量出脉冲电源电流的峰值、脉宽等参数.实验结果表明,该系统可以实时监测和控制脉冲电源的工作过程,实现了电参数的在线测量和整体系统的闭环控制.     

半浮栅晶体管Marx方波脉冲电源设计

为得到工业需要的大电流高重频方波脉冲,分析并改进了半导体全控型Marx发生器,在充电的同时实现了截尾功能。设计采用新型半浮栅结构晶体管 (SFGT)作为主开关,可产生kV高压、百A大电流、高重频的方波脉冲。优化了电路结构,解决直流充电源受脉冲电源放电电压冲击问题。研制得到电流100 A、频率4 kHz、脉宽4 s、负高压6 kV、上升沿下降沿均在80 ns内的方波脉冲发生器。研究了相应的SFGT磁芯隔离驱动电路,结合了SFGT栅极并联自主电容隔离驱动和IR2110的半桥驱动电路,并对半桥上的MOS管的栅极等效电路进行了理论分析,驱动电路具有抗干扰能力强且脉宽调节范围大的特点。     

整形高功率激光装置的任意电脉冲发生器设计(英文)

基于GaAs场效应管电压控制电流和开关的特性,设计了一种任意电脉冲发生器,并成功应用于激光脉冲整形装置。该电脉冲发生器利用超宽带窄脉冲触发多个GaAs场效应管,产生多路负脉冲,通过模拟延时线依次将各路负脉冲延迟一定时间后经微带线耦合输出多路负脉冲叠加的波形;通过多路不同幅度的脉冲堆积效应来获得形状任意可调的整形电脉冲。为了满足惯性约束聚变(ICF)实验中对电脉冲幅度不能过小的要求,在电路的输出端接入增益可调的超宽带电压放大器,使脉冲幅度达到实验要求。利用设计的任意电脉冲发生器实现了脉冲幅度0～5 V可调、脉宽0～10ns可调、时域调节精度为330 ps,整形方波脉冲下降沿为330 ps、上升沿为240 ps。实验结果表明,将产生的电脉冲注入光波导调制器,可获得理想形状的整形激光脉冲,提高激光脉冲的输出能量。     

Effect of body biasing on single-event induced charge collection in deep N-well technology

As the device size decreases, the soft error induced by space ions is becoming a great concern for the reliability of integrated circuits(ICs). At present, the body biasing technique is widely used in highly scaled technologies. In the paper, using the three-dimensional technology computer-aided design(TCAD) simulation, we analyze the effect of the body biasing on the single-event charge collection in deep N-well technology. Our simulation results show that the body biasing mainly affects the behavior of the source, and the effect of body biasing on the charge collection for the n MOSFET and p MOSFET is quite different. For the n MOSFET, the RBB will increase the charge collection, while the FBB will reduce the charge collection. For the p MOSFET, the effect of RBB on the SET pulse width is small, while the FBB has an adverse effect. Moreover, the differenceof the effect of body biasing on the charge collection is compared in deep N-well and twin well.     

基于磁隔离驱动的亚微秒高压脉冲电源

为满足不可逆电穿孔对高压纳秒脉冲电源的需求,并且突破电源模块耐压的限制,提出了一款以正极性Marx为主电路、具有ns级前沿的高重复频率的亚微秒高压脉冲电源。该脉冲电源使用光纤传输信号,经过驱动芯片放大信号后,利用磁芯变压器传递驱动信号给MOSFET。磁芯变压器给电路提供了磁隔离,使驱动电路不会受高压输出的影响,提高了电路的耐压水平。驱动电路设计简单,所需元器件较少,可提供负压偏置,使开关管可靠关断,提高电路的抗电磁干扰能力,保障电路稳定运行。此电源由16级电路构成,实验表明:在10 kΩ纯阻性负载上,当输入电压为630 V时,即可得到10 kV的高压输出。其最小脉宽为300 ns,频率1 Hz～10 kHz可调。该脉冲电源结构紧凑,能够做到输出电压、脉宽、频率可调。研究了磁芯材料和匝数对驱动脉宽的影响。结果表明:匝比的增加会影响信号脉宽,在一定的条件下,单匝电感量的差异和磁芯材料的不同对信号脉宽的影响较小。     

级联型高压重复频率微秒脉冲源的研制

针对等离子体的应用,基于级联型电压叠加技术研制了一种最高输出电压为20 kV的高压微秒脉冲源,该电源由40个相同的电源模块组成,其单个模块电压等级为500 V,降低了对器件的绝缘耐压要求。电源的输出电压值在0~20 kV之间可调;重复频率在0~10 kHz之间、脉宽在0~30 μs之间可调;该电源的上升沿和下降沿均在1 μs以内。模块化的设计提高了电源的冗余容错能力。将该电源作为产生等离子体的激励源时,其输出的高压脉冲波形稳定,且根据负载对输出高压波形的要求不同,该电源可以方便地进行调节。     

基于Boost闭环控制的恒峰值双极性脉冲发生器的研制北大核心CSCD

在肿瘤消融、污水处理等领域的脉冲功率技术应用中,研究发现双极性电脉冲往往比单极性电脉冲效果更佳,这极大地刺激了双极性高压脉冲电源的研发需求。设计了一台基于Boost闭环控制的恒峰值双极性脉冲发生器,该发生器结合boost电路与Marx发生器的特点,实现了具有升压功能的双极性脉冲的产生,且利用峰值检测电路对双极性脉冲发生器的输出峰值进行取样,并反馈到DSP处理器,实现峰值电压闭环控制,从而实现双极性脉冲恒定峰值的输出。为了验证提出的拓扑电路的可行性与稳定性,对5级恒峰值双极性脉冲发生器进行了仿真和实验研究。实验结果表明,当输入电压在100 V时,可产生重复频率5 kHz、脉冲宽度5~10μs、电压幅值为±2.0 kV的恒峰值双极性脉冲波形。该脉冲电源使用模块化设计,便于级联,结构紧凑,可灵活输出恒峰值的双极性或单极性正(负)脉冲。