入射质子能量对银膜反射镜光学性能的影响

为探讨空间高能质子模拟试验方法,用基于蒙特卡罗方法的SRIM程序计算了质子在石英玻璃基银膜反射镜中的射程和能量损失分布,试验研究了不同能量质子辐照对反射镜光学性能的影响.能量低于160keV时,50%以上的质子能量损失在表面膜中,随着能量的增大,质子在膜系中的能量损失逐渐减小;在1016/cm2注量条件下,100keV质子辐照引起350～500nm波段反射率明显下降,而0.5MeV和1MeV质子辐照对光谱的影响很小;计算与试验结果表明,低能质子辐照对反射镜的膜系损伤起主要作用,在进行空间质子辐照模拟试验时,能量选取应低于200keV.     

铝膜反射镜空间环境适应性研究

铝膜反射镜是反射式空间聚光太阳电池阵的重要组成部分。通过对铝膜反射镜电子、质子、紫外、原子氧环境等一系列辐照及环境试验,研究和考察了铝膜反射镜反射率的变化和空间环境适应性。研究结果表明,铝膜反射镜适应地球同步轨道环境条件下,反射镜平均反射率在15年寿命末期大于75%;在低地球轨道环境中有必要对铝膜反射镜进行抗原子氧侵蚀防护。     

玻璃型镀铝二次表面镜的模拟空间环境辐照试验研究

主要通过对镀铝二次表面镜先后进行紫外辐照以及电子、质子的综合辐照,并结合太阳吸收率和半球发射率测试,研究了低能电子、质子以及紫外辐照对镀铝二次表面镜热控性能的影响。结果表明,镀铝OSR具有良好的抗紫外辐照以及抗低能电子、质子辐照能力。     

真空蒸镀铝及保护膜的表面形貌和光学性能研究

采用工业化生产流水线的真空蒸发镀膜工艺制备一系列太阳能利用铝反射镜,研究了基底材料对铝反射镜反射率的影响,利用理论分析结合试验,探讨了基底材料表面面型及微观粗糙度对真空蒸镀铝膜反射的影响。光学反射率测量显示不同基底材料的平面铝反射镜的反射率存在较大的差异,其中在ABS工程塑料上制备的铝反射膜的光学均匀性较理想,研究成果为实现低成本轻型铝太阳能反射镜的大规模生产提供了借鉴。     

φ200mm轻型石英反射镜的研制

本文报导了φ200mm轻型石英反射镜研制结果。研究分析了轻型反射镜对材料的要求,选择了石英做主反射镜材料;研究了具有高结合强度的封接材料及封接技术;研究了环辐型、多环型、井字型及六角型轻型结构,选择了多环型及六角型结构制成了φ150及φ200mm轻型石英反射镜;进行了高温、低温、一年时效、高能电子辐照、高能质子辐照及振动对轻型石英反射镜光学质量影响的研究,研究结果表明具有稳定的光学质量。可做为天文望远镜、卫星及激光系统主反射镜以及高稳定性的台基。     

镀膜角反射器空间辐照环境效应研究

角反射器作为激光测距的合作目标,早已得到广泛地研究和应用,但对镀反射膜角反射器的相关研究,文献显示却比较少。通过对镀制了金属反射膜的角反射器进行空间环境模拟试验,结合激光反射率测试,研究了空间辐照环境对镀膜角反射器光学性能的影响。在经过电子、质子辐照以及紫外辐照试验后,镀膜角反射器表现出良好的空间辐照环境稳定性。     

ZnO白漆的质子辐照损伤与光学性能退化机理

为进一步阐明ZnO白漆的辐照损伤与光学性能退化机理,在模拟的空间环境下对S781白漆进行了150keV质子辐照实验。质子辐照后,在原位条件下测试了光谱反射系数和太阳吸收比的退化规律,并利用模拟仿真和光致荧光光谱研究了ZnO白漆与质子间的微观交互作用和辐照诱发缺陷。结果表明,质子辐照下ZnO颜料发生电离生成-1价锌空位,是S781白漆出现b带吸收和光学性能退化的主要原因。此外,本工作支持了ZnO绿带荧光源于锌空位的第一原理计算结果。     

低能电子束辐射交联改性PP/LLDPE五层共挤POF热收缩膜的性能EI北大核心CSCD

通过低能电子束辐射改性聚丙烯(PP)/线型低密度聚乙烯(LLDPE)五层共挤聚烯烃(POF)热收缩膜,制备耐温性强、收缩温度窗口宽的POF交联热收缩膜。文中研究了辐照气氛和吸收剂量对POF热收缩膜结构、力学性能和热收缩性能的影响。结果表明,在氮气和空气气氛辐照后,POF热收缩膜的结构、力学性能和热收缩性能未有明显差别。POF热收缩膜交联度和耐温性均随着吸收剂量增加而增加。POF热收缩膜的断裂伸长率随吸收剂量增加无明显变化;拉伸强度随吸收剂量增加先增加再降低。低能电子束辐照交联改善了POF热收缩膜低温收缩性能,增宽了热收缩温度窗口。     

低能电子束辐射交联改性PP/LLDPE五层共挤POF热收缩膜的性能

通过低能电子束辐射改性聚丙烯(PP)/线型低密度聚乙烯(LLDPE)五层共挤聚烯烃(POF)热收缩膜,制备耐温性强、收缩温度窗口宽的POF交联热收缩膜。文中研究了辐照气氛和吸收剂量对POF热收缩膜结构、力学性能和热收缩性能的影响。结果表明,在氮气和空气气氛辐照后,POF热收缩膜的结构、力学性能和热收缩性能未有明显差别。POF热收缩膜交联度和耐温性均随着吸收剂量增加而增加。POF热收缩膜的断裂伸长率随吸收剂量增加无明显变化;拉伸强度随吸收剂量增加先增加再降低。低能电子束辐照交联改善了POF热收缩膜低温收缩性能,增宽了热收缩温度窗口。     

质子、电子综合辐照作用下Teflon FEP/Al辐照损伤效应研究

在地面模拟研究了能量为30keV的质子与电子辐照对Teflon FEP/Al的光学性能退化的综合影响。结果表明,质子辐照引起Teflon FEP/Al在可见光区反射性能退化,而电子引起其在可见光与近红外区反射性能的全面下降。电子辐照更多的是使材料的大分子形成激发态进而轰击出主链上的F原子,形成自由基以及游离态的C。质子辐照时,除产生上述的辐照缺陷外,H~*的离子注入还使材料中形成各种新的官能团。质子与电子辐照的顺序不同,Teflon FEP/Al的C_(1s)谱也明显不同。     

Degradation in optical reflectance of Al film mirror induced by proton irradiation

Mirror made of Al films can yield high reflectance over a broad wavelength range, and have been widely used in spacecraft optical instruments for high quality optical applications. However, such mirrors might be deteriorated under the irradiation of charged particles in the Earth radiation belt. In order to reveal the deterioration mechanism, the change in optical properties of Al film mirrors induced by proton irradiation with less than 200 keV was studied in a vacuum environment with a heat sink. Experimental results showed that the proton irradiation led to an obvious degradation of spectral reflectance of the Al film mirror within the wavelength range from 250 to 800 nm. The threshold fluence 1 × 10¹⁶ cm⁻² was found, above which the reflectance decreased greatly with increasing proton fluence when the radiation damage primarily occurred in the Al film. According to the experimental results, a formula for the performance evolution of Al film optical mirrors irradiated with protons is proposed.     

Effect of surface roughness and subsurface damage on grazing-incidence x-ray scattering and specular reflectance

Grazing-incidence specular reflectance and near-specular scattering were measured at Al-K(alpha) (1.486-keV, 8.34-?) radiation on uncoated dielectric substrates whose surface topography had been measured with a scanning probe microscope and a mechanical profiler. Grazing-incidence specular reflectance was also measured on selected substrates at the Cu-K(alpha) (8.047-keV, 1.54-?) wavelength. Substrates included superpolished and conventionally polished fused silica; SiO(2) wafers; superpolished and precision-ground Zerodur; conventionally polished, float-polished, and precision-ground BK-7 glass; and superpolished and precision-ground silicon carbide. Roughnesses derived from x-ray specular reflectance and scattering measurements were in good agreement with topographic roughness values measured with a scanning probe microscope (atomic force microscope) and a mechanical profiler that included similar ranges of surface spatial wavelengths. The specular reflectance was also found to be sensitive to the density of polished surface layers and subsurface damage down to the penetration depth of the x rays. Density gradients and subsurface damage were found in the superpolished fused-silica and precision-ground Zerodur samples. These results suggest that one can nondestructively evaluate subsurface damage in transparent materials using grazing-incidence x-ray specular reflectance in the 1.5-8-keV range.     

Magnetic Field Dependence of Penetration Depth in Kinetic Energy Driven Cuprate Superconductors

Within the kinetic energy driven superconductivity, the magnetic field dependent penetration depth in cuprate superconductors is studied in the linear response approach. The electromagnetic response kernel is evaluated by considering both couplings of the electron charge and electron magnetic momentum with a weak magnetic field and employed to calculate the penetration depth based on the specular reflection model, then the main features of the magnetic field dependent penetration depth are well reproduced.     

Polarization-dependent angular-optical reflectance in solar-selective SnOx:F/Al2O3/Al reflector surfaces

Polarization-dependent angular-optical properties of spectrally selective reflector surfaces of fluorine-doped tin oxide (SnOx:F) deposited pyrolytically on anodized aluminum are reported. The angular-reflectance measurements, for which both s- and p-polarized light are used in the solar wavelength range 0.3-2.5 microm, reveal strong spectral selectivity, and the angular behavior is highly dependent on the polarizing component of the incident beam, the total film thickness, and the individual thickness of the Al2O3 and the SnO2:F layers. The anodic A12O3 layers were produced electrochemically and varied between 100 and 205 nm in thickness. The SnOx:F films were grown pyrolytically at a temperature of 400 degrees C with film thicknesses varying in the range 180-320 nm. The reflectors were aimed at silicon solar cells, and good spectrally selective reflector characteristics were achieved with these thinly preanodized, SnOx:F/Al samples; that is, high cell reflectance was obtained for wavelengths below 1.1 microm and low thermal reflectance for wavelengths above 1.1 microm, with the best samples having values of 0.80 and 0.42, respectively, at near-normal angles of incidence. This corresponds to an anodic layer thickness of 155 nm. Both the angular calculations and the experimental measurements show that the cell reflectance is relatively insensitive to the incidence angle, and a low thermal reflectance is maintained up to an angle of approximately 60 degrees.     

玻璃空间电离辐照着色损伤动力学研究

空间电离辐照主要由能量连续变化的粒子组成, 绝大多数粒子穿透能力小, 因此, 空间电离辐照对玻璃的着色损伤必然随深度而呈现一种复杂的变化, 针对这一现象, 并且考虑到玻璃中色心的弛豫消失, 本工作建立了一种适用于玻璃空间电离辐照着色损伤动力学研究的方法. 以K9-HL玻璃为研究对象, 利用空间电离辐照作用在玻璃中随深度变化的Monte Carlo模拟结果, 研究了该玻璃在轨(近地点350 km, 远地点425 km, 轨道倾角51.6°)电离辐照着色损伤过程, 讨论了航天器用玻璃抗辐照性能考核方法, 分析了玻璃空间电离辐照着色损伤的深度分布, 提出了航天器用玻璃材料抗电离辐照损伤加固的关键点. 此外, 对不同石英玻璃防电离辐照层保护的K9-HL玻璃在轨光学性能做了研究.     

Film Flip and Transfer Process to Enhance Light Harvesting in Ultrathin Absorber Films on Specular Back‐Reflectors

Optical interference is used to enhance light–matter interaction and harvest broadband light in ultrathin semiconductor absorber films on specular back‐reflectors. However, the high‐temperature processing in oxygen atmosphere required for oxide absorbers often degrades metallic back‐reflectors and their specular reflectance. In order to overcome this problem, a newly developed film flip and transfer process is presented that enables high‐temperature processing without degradation of the metallic back‐reflector and without the need of passivation interlayers. The film flip and transfer process improves the performance of photoanodes for photoelectrochemical water splitting comprising ultrathin (<20 nm) hematite (α‐Fe₂O₃) films on silver–gold alloy (90 at% Ag–10 at% Au) back‐reflectors. Specular back‐reflectors are obtained with high reflectance below hematite films, which is necessary for maximizing the productive light absorption in the hematite film and minimizing nonproductive absorption in the back‐reflector. Furthermore, the film flip and transfer process opens up a new route to attach thin film stacks onto a wide range of substrates including flexible or temperature sensitive materials.     

Penetration of light into multiple scattering media: model calculations and reflectance experiments. Part I: the axial transfer

The article presents two general equations of radiation penetration into layers of diffuse reflectors. One of the equations describes the depth origins of reflection, the other the depth profiles of absorption. The equations are evaluated within the theory of radiative transfer applying various degrees of analytical approximations and Monte Carlo simulations. The data are presented for different scattering and absorption coefficients, arbitrary layer thicknesses, collimated and diffused irradiation, and anisotropic forward scattering. The calculated mean depths of reflection are always lower than the mean depths of absorption. For nearly non-absorbing layers, the mean depths of absorption are about one third of the physical layer thickness. In contrast, penetration saturates for strong absorbers at very low depth levels. From the simulated data, methods are derived for the determination of the penetration depth from reflectance and transmittance data of thin layers or from radially diffused reflectance profiles upon spot irradiation. The methods are experimentally verified for a series of metal oxide powders with particle sizes ranging from much smaller to much larger than the wavelength of irradiation and for microcrystalline cellulose stained with different concentrations of an organic dye.     

ZnO nanostructure thin films by continuous spray pyrolysis using doped precursor for Si solar cell application

This work presents deposition of Zn solution seed layer assisted growth of zinc oxide (ZnO) nanostructure layers by continuous spray pyrolysis reactor using lanthanides (Er and Eu) and metal (Al) influenced zinc acetate precursor solution. Dopants in precursors have influenced structural property, surface morphology and optical reflectance of resulting ZnO thin films which are supported by X-ray diffractometer, scanning electron microscope and reflectance measurements. Enhanced dispersion amongst nanorods is observed under the influence of Er and Al dopant in ZnO thin film. The change of precursor from Zinc acetate to Titanium tetraisopropoxide for Er doped precursor is helping to achieve better crystalline ZnO nanorods arrangement with increased homogenous growth, which results into improved light reflectance reduction of thin film. The experimental evidences of light reflectance from ZnO nanorods on Si surface is studied with the help of FDTD based Lumerical software package which can be a useful study for designing ZnO nanorods thin film in device purposes. The utility of ZnO layer by this reactor on low efficiency Si solar cell is also explored in improving device efficiency via increase of photocurrent.