水性除锈防锈涂料的研制

研制了一种以聚醋酸乙烯－丙烯酸共聚物乳胶为胶料，磷酸与复合缓蚀剂为锈转化剂的水性除防锈涂料。该涂料生产工艺简单，成本低廉，除锈防锈效果好，低毒无气味，无有机溶剂污染，施工简单。     

多功能含氟涂料

随着科学技术的高速发展,为满足人们高水准生活要求的多功能含氟涂料应运而生。它具有防粘、防腐蚀、耐热、耐候等特性,可在现代工业和高技术产业、乃至生活用品等领域发挥重要作用。氟涂料起源于50年代,60年代形成工业装置,国内于70年代问世。世界总产量达万吨级以上,而国内到目前为止,尚未达到千吨级,是门新型的多功能产品。氟涂料按涂料形态划分,有分散液涂料、瓷漆和粉体涂料等。分散液涂料是以少     

2013年中国国际涂料博览会

由中国涂料工业协会主办、北京涂博国际展览有限公司承办的"2013年中国国际涂料博览会"将于2013年8月15～17日在上海新国际博览中心举行,主要面向建筑、装饰、家具、家电、汽车、船舶、轻工等行业,重点展出:(1)涂料建筑涂料、防水涂料、防火涂料、地坪涂料、木器涂料、交通道路涂料、卷材涂料、汽车涂料、防腐蚀涂料、高铁桥梁涂料、风电涂料、轻工涂料、塑胶涂料、金属涂料、光固化涂料、     

发展迅速的特种功能涂料

综述了特种功能涂料的类型和作用机理,并对近年在各个领域获得重要应用和极具开发潜力的新型特种功能涂料进行了介绍,指出特种功能涂料必将获得更大的发展。     

阻燃《万彩壁》的研制

介绍了一种阻燃内墙装饰纤维涂料《万彩壁》的制备、优点及其使用方法。     

不粘涂料在电饭煲上的应用

不粘涂料在电饭煲上的应用广东容声电器股份有限公司（顺德５２８３０３）冯维光聚四氯乙烯涂料由于具有不粘性，附着力特强，耐腐蚀．耐磨损，耐高温，润滑及柔韧性好等特点，除广泛应用于印刷、纺织、造纸等工业机械滚筒外，还大量用于抽油烟机、电熨斗及电饭堡等家电行...     

环氧改性有机硅树脂的合成及在涂料中的应用

1　前　言有机硅涂料是 70年代发展起来的一类耐高温涂料 ,一般耐温区间为 2 0 0～ 4 0 0℃ ,国外国类产品可长期耐 50 0～ 70 0℃。由纯有机硅树脂制备的此类涂料虽然耐热性优良 ,但常温干燥性能、耐溶剂性能、附着力等不理想。用环氧将有机硅树脂加以改性 ,所得树脂既耐高温 ,又耐腐蚀 ,从而获得广泛的应用。2　实　验2 .1　有机硅中间体的合成有机硅树脂是由不同官能度的单体按一定的配比制得。三官能团单体能提高交联度 ,二官能团单体能增进柔韧性 ,四官能团单能改善常温干燥性能。有机硅树脂的性能与Ｒ/Ｓｉ和ＣＨ3/Ｃ6Ｈ5值密切相关 ,…     

Optical black coatings for space applications

The durability properties of PTX-205 optical black coatings deposited on metallic and non-metallic substrates are studied. The coatings are stable against adverse environmental requirements for space applications. Typically, coatings with 8–11 μ thickness are opaque and have an average reflectance loss (<5%) in the spectral range of 200–1500 nm. The absorption to emission ratio is 1·01.     

The production of porous and chemically reactive coatings by magnetron sputtering

High surface area materials can have a number of applications including use as pyrophoric devices, sensors, laser mirrors, filters, thermal barriers and catalysts. The aim of this work was to deposit highly porous thin films capable of undergoing a spontaneous pyrophoric reaction and igniting a suitable substrate material. Magnetron sputtering was the chosen deposition technique as it enables reproducible deposition of coatings, with closely controlled, almost uniform, thickness and morphologies over extended surfaces.A number of magnetron magnetic configurations were investigated and deposition conditions were varied in order to control the surface area of the films and, thereby, optimise the pyrophoric behaviour. As a consequence, pyrophoric coatings were produced with ignition temperatures dependent on the deposition conditions and substrate material/topography. When deposited on combustible substrates, these coating/substrate systems formed simple pyrotechnic devices in a one-stage process. The main thermal signal emitted by these devices was dependent on the substrate material only.     

Deposition of photocatalytic titania coatings on polymeric substrates by HiPIMS

Titania coatings have been deposited onto PET substrates by reactive magnetron sputtering in the HiPIMS (high power impulse magnetron sputtering) mode and for comparison, pulsed DC mode. In the latter case, the substrate showed evidence of melting, but the HiPIMS results were dependent on the characteristics of the power supply when operating under nominally identical conditions. A coating deposited by one of the HiPIMS supplies was found to have a mixed phase structure and to demonstrate a level of photocatalytic activity comparable to conventional coatings which had been post-deposition annealed.     

低温PVD法制备多组分超硬薄膜相组成研究

回顾了多组分硬质薄膜的发展，指出了多组分薄膜低温淀积时相组成研究与预测存在的问题。对多组分硬质薄膜，包括类质同晶体系与多组分共熔体，低共熔体系、转熔体系、亚稳定固熔体与非晶固熔体，化合物，梯度薄膜，多相薄膜材料，多层薄膜和超晶格薄膜等可能的相组成与相关性质进行了讨论。对淀积速率与薄膜厚度，相组成与薄膜均质性，超晶格薄膜硬度与超晶格周期等的计算模型进行了评述。     

Photocatalytic activity of reactively sputtered and directly sputtered titania coatings

It is well known that, depending on deposition conditions, the structure of titania coatings may be amorphous, anatase or rutile, or a mixture of phases, and that the anatase phase is the most promising photocatalyst for the degradation of organic pollutants. The formation of anatase depends on the energy delivered to the growing film, which in turn depends on the operating parameters chosen. In this study, titania coatings have been deposited onto glass substrates by pulsed magnetron sputtering both from metallic targets in reactive mode and directly from oxide powder targets. The as-deposited coatings were analysed by scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX) and micro-Raman spectroscopy. Selected coatings were then annealed at temperatures in the range of 400–700 °C and re-analysed. The photocatalytic activity of the coatings has been investigated through measurements of the degradation of organic dyes, such as methyl orange, under the influence of UV and fluorescent light sources. Further sets of coatings have been produced both from metallic and powder targets in which the titania is doped with tungsten. These coatings have also been analysed and the influence of the dopant element on photocatalytic activity has been investigated. It has been found that, after annealing, both sputtering processes produced photo-active surfaces and that activity increased with increasing tungsten content over the range tested. Furthermore, the activity of these coatings under exposure to fluorescent lamps was some 50–60% of that observed under exposure to UV lamps.     

冷气动力喷涂技术研究进展

作为一种新的涂层方法－冷气动力喷涂因能在较低的温度下喷涂金属、合金以及复合涂层而受到人们的关注。综述了国内外冷气动力喷涂技术领域的最新研究进展，主要包括冷气动力喷涂技术研究、冷喷涂涂层的结构性能和涂层特点及其应用。     

Characterization of Zinc-phthalocyanine-CdS composite thin films for photovoltaic applications

The optical properties of ZnPc-CdS composite thin films have been measured. The composite layers were prepared by vacuum evaporation. The electrical conduction mechanism prevailing in these junctions was of Poole-Frenkel type and the activation energy was found to have a linear dependence with applied field. The maximum photoconductivity occurred at an energy gap around 1.5 to 1.7 eV. The photosensitivity is found to increase with increase in applied voltage.     

Influence of the aluminum incorporation on the structure of sputtered ZrNx films deposited at low temperatures

We have studied the influence of the Al incorporation in the crystalline structure of ZrN thin films deposited by dc magnetron sputtering processes at low temperature. The incorporation of the aluminum in the films depends directly on the Ar/N₂ ratio in the gas mixture and the power applied to the aluminum cathode during the deposition. The chemical composition and the crystalline structure of the films were analyzed by Energy Dispersive X-ray (EDX) spectroscopy and X-ray Diffraction (XRD), respectively. When Al atoms are incorporated into the ZrN coatings, the strong ZrN (200) preferred orientation is modified to a combination of phases related to (111) ZrN with a contribution of cubic (111) AlN and possibly (211) Zr₃N_4, which are detected by XRD for high aluminum concentrations. Fourier Transform Infrared (FTIR)spectroscopy allowed us to complete the identification of the nitrides and oxides incorporated into the deposited films. The effect of a bias voltage applied to the substrate has also been investigated and related to the changes in the microstructure and in the nanohardness values of the ZrAlN films.     

Physical and mechanical properties of reactively sputtered chromium boron nitride thin films

This paper reports on the first study of physical and mechanical properties of reactively sputtered chromium boron nitride coatings as a function of chemical composition, bias voltage and substrate temperature. Several sets of coatings were deposited by reactive unbalanced magnetron sputtering on Si(100) substrates. The chemical composition was deduced from X-ray photoelectron spectroscopy and Auger electron spectroscopy measurements, and was found to be influenced primarily by nitrogen flow rate. The phase composition was determined using X-ray diffraction in conjunction with spectroscopic ellipsometry. Atomic force microscopy was utilized to determine surface roughness and average surface grain size. Both surface roughness and surface grain size were largely independent of the nitrogen concentration and decreased with increasing bias voltage. The nanohardness and elastic modulus of each sample were measured by nanoindentation. The hardest films were produced using −150 V bias voltage and either very low (0.5-1 sccm) or very high (12-15 sccm) nitrogen flow rates.