Electroabsorption modulation at 1.3 /spl mu/m on GaAs substrates using a step-graded low temperature grown InAlAs buffer

We have achieved quantum confined Stark effects (QCSE) on In/sub 0.38/Ga/sub 0.62/As-In/sub 0.38/Al/sub 0.62/As multiple-quantum-well (MQW) structures, operating at 1.3 /spl mu/m grown on GaAs substrates. A quantum confined Stark shift of the exciton absorption peak of 47 meV was obtained with an applied electric field of 190 KV/cm, measured on surface normal PIN diodes. The structure is grown by MBE on a novel three-stage, compositionally step graded, In/sub x/Al/sub 1-x/As buffer, doped with Si to 5/spl middot/10/sup 17//cm/sup 3/, on an n-type GaAs substrate. The total thickness of the buffer is 0.3-0.6 mm, which is considerably smaller than that of linearly graded buffer layers. This structure can be used in both waveguide modulators and surface normal F-P type modulators on GaAs substrates.     

Low-threshold piezoelectric-strained InGaAs-GaAs QW lasers grown on (211)B oriented GaAs substrates

We report the operation of strained layer In/sub 0.20/Ga/sub 0.80/As quantum well lasers grown on (211)B GaAs substrates, thus incorporating a piezoelectric field. Growth was by atmospheric pressure metal-organic vapor phase epitaxy (MOVPE). The threshold current density of a 1000 /spl mu/m/spl times/75 /spl mu/m device is 91 A/spl middot/cm/sup -2/ and waveguide transparency is estimated at 32 A/spl middot/cm/sup -2/ for a simple separate confinement heterostructure (SCH) emitting at 982 nm.     

High-power (200 mW) singlemode operation of InGaAsN/GaAs ridge waveguide lasers with wavelength around 1.3 /spl mu/m

High-power narrow ridge waveguide lasers emitting with a wavelength around 1.3 /spl mu/m were realised with a single In/sub 0.36/GaAsN/sub 0.022/ quantum well with GaAs barriers. A narrow vertical far-field angle of 35/spl deg/ was obtained. Single lateral mode continuous-wave operation with slope efficiency of 0.57 W/A, series resistance of 2.6 /spl Omega/, and kink-free output power of 210 mW was achieved.     

Low photocurrent GaAs-Al/sub 0.3/Ga/sub 0.7/As multiple-quantum-well modulators with selective erbium doping

A new scheme of reducing the photocurrent of a quantum-confined Stark effect multiple-quantum-well modulator is demonstrated. The GaAs well regions of the 50-period GaAs-Al/sub 0.3/Ga/sub 0.7/As multiple-quantum-well are selectively doped with Er during molecular beam epitaxy to reduce the carrier lifetime to the order of picoseconds. 250-/spl mu/m diameter mesa-shaped devices have been characterized. The photocurrent responsivity is as low as 0.005 A/W and an extinction ratio greater than 1:8 is achieved at a bias voltage of 8 V.     

Ridged LiNbO/sub 3/ modulators fabricated by a novel oxygen-ion implant/wet-etch technique

This paper demonstrates a new ion implantation and wet-etch technique for fabricating high-quality ridged optical waveguides for high-speed LiNbO/sub 3/-based optical modulators. In addition, the paper demonstrates the fabrication of optical waveguide ridges >3 /spl mu/m in height with 90/spl deg/, and even re-entrant sidewall angles for the first time. The modeling used indicates that 90/spl deg/ (and re-entrant) sidewall ridges can reduce the required modulator drive voltage by 10-20% over modulators with conventional trapezoidal ridge profiles fabricated with reactive ion etching. A 40-Gb/s modulator with a 30-GHz bandwidth, 5.1-V switching voltage at 1 GHz, and a 4.8-dB optical insertion loss is fabricated using the ion implantation/wet-etch process. Fabricated devices showed good stability against accelerated aging, indicating that this process could be used for commercial purposes.     

15-GHz modulation performance of integrated DFB laser diode EA modulator with identical multiple-quantum-well double-stack active layer

Monolithically integrated InGaAsP 1.55-/spl mu/m ridge waveguide distributed feedback laser diodes with an electroabsorption modulator using an identical active multiquantum-well (MQW) layer structure with two different QW types exhibit low-threshold currents <18 mA. The 3-dBe cutoff frequency of 200-/spl mu/m-long modulators exceeds 15 GHz. 10-Gb/s transmission experiments with a voltage swing of 1.0 V/sub pp/ demonstrate the potential of this novel integration scheme.     

16 W continuous-wave output power from 100 /spl mu/m-aperture laser with quantum well asymmetric heterostructure

16 W continuous-wave room temperature front facet output optical power and 74% wallplug efficiency were attained in 100 /spl mu/m-aperture 1.06 /spl mu/m-emitting laser diodes with 2-3 mm cavity length. The lasers are based on AlGaAs/GaAs/InGaAs quantum well asymmetric heterostructures with 1.7 /spl mu/m-thick waveguide having 0.34 cm/sup -1/ internal optical loss.     

Low-Loss Two-Dimensional GaAs Epitaxial Waveguides at 10.6-/spl mu/m Wavelength

The successful fabrication of low-loss two-dimensional GaAs epitaxial waveguides by chemical etching for use in integrated optics at 10.6 /spl mu/m is reported. Selective excitation of specific E/sub pq//sup y/ modes was observed by placing the prism at specific angles in the horizontal plane. Loss measurements showed no increase in attenuationfor lower order E/sub pq//sup y/ modes (as compared to corresponding one-dimensional waveguide modes) when the guide width is 50 /spl mu/m. As the guide width is reduced, there is a significant increase in attenuation as p increases.     

Ultralow leakage In/sub 0.53/Ga/sub 0.47/As p-i-n photodetector grown on linearly graded metamorphic In/sub x/Ga/sub 1-x/P buffered GaAs substrate

A novel top-illuminated In/sub 0.53/Ga/sub 0.47/As p-i-n photodiodes (MM-PINPD) grown on GaAs substrate by using linearly graded metamorphic In/sub x/Ga/sub 1-x/P (x graded from 0.49 to 1) buffer layer is reported. The dark current, optical responsivities, noise equivalent power, and operational bandwidth of the MM-PINPD with aperture diameter of 60 /spl mu/m are 13 pA, 0.6 A/W, 3.4/spl times/10/sup -15/ W/Hz/sup 1/2/, and 7.5 GHz, respectively, at 1550 nm. The performances of the MM-PINPD on GaAs are demonstrated to be comparable to those of a similar device made on InGaAs-InP substrate.     

Room-temperature self-organised In/sub 0.5/Ga/sub 0.5/As quantum dot laser on silicon

The first room-temperature operation of In/sub 0.5/Ga/sub 0.5/As quantum dot lasers grown directly on Si substrates with a thin (/spl les/2 /spl mu/m) GaAs buffer layer is reported. The devices are characterised by J/sub th//spl sim/1500 A/cm/sup 2/, output power >50 mW, and large T/sub 0/ (244 K) and constant output slope efficiency (/spl ges/0.3 W/A) in the temperature range 5-95/spl deg/C.     

Bandpass traveling-wave Mach-Zehnder modulator in LiNbO/sub 3/ with domain reversal

A bandpass traveling-wave Mach-Zehnder modulator is demonstrated in a Z-cut LiNbO/sub 3/ substrate where quasi-phase-matching is achieved by using a crystal domain reversal and a simple uniform coplanar waveguide electrode structure. The domain reversal was created, by using electric-field poling, to implement the three-section alternating electrooptic interaction. At the operating wavelength /spl lambda/=1.32 /spl mu/m, the modulator has a 15 GHz-broad bandpass response centered at 25-GHz 3.6-dB fiber-to-fiber insertion loss, 12 V on-off voltage at the center frequency, and -33-dB extinction ratio.     

Electrically injected photonic crystal edge-emitting quantum-dot light source

An electrically injected photonic crystal (PC) edge-emitting light source with horizontally coupled waveguide, based on a GaAs heterostructure with self-organized InGaAs quantum dots emitting near 1 /spl mu/m, is demonstrated. The emission spectra and near-field images indicate that the spontaneous emission from the low-Q resonant PC cavity is coupled to an adjacent PC missing defect waveguide and guided over the 70-/spl mu/m waveguide length.     

A W-band InAs/AlSb low-noise/low-power amplifier

The first W-band antimonide based compound semiconductor low-noise amplifier has been demonstrated. The compact 1.4-mm/sup 2/ three-stage co-planar waveguide amplifier with 0.1-/spl mu/m InAs/AlSb high electron mobility transistor devices is fabricated on a 100-/spl mu/m GaAs substrate. Minimum noise-figure of 5.4dB with an associated gain of 11.1 dB is demonstrated at a total chip dissipation of 1.8 mW at 94 GHz. Biased for higher gain, 16/spl plusmn/1 dB is measured over a 77-103 GHz frequency band.     

1.3-/spl mu/m InAs quantum-dot laser with high dot density and high uniformity

We realized a triple-stacked 1.3-/spl mu/m InAs quantum dot (QD) with a high density of 2.4/spl times/10/sup 11/ cm/sup -2/ and a high uniformity of below 24 meV that employs an As/sub 2/ source and a gradient composition (GC) strain-reducing layer (SRL) grown on a GaAs substrate. We demonstrated the 1.3-/spl mu/m wavelength emission of this triple-stacked QD laser with a 0.92-mm cavity length and a cleaved facet at room temperature. In addition, we realized the highest maximum modal gain yet reported of 8.1 cm/sup -1/ per QD layer at beyond 1.28 /spl mu/m by using our high-density and high-uniformity QD.     

High-T/sub 0/ strain-compensated InGaAsSb-AlGaAsSb quantum-well lasers emitting at 2.43 /spl mu/m

Strain-compensated InGaAsSb-AlGaAsSb quantum-well (QW) lasers emitting near 2.5 /spl mu/m have been grown by solid-source molecular beam epitaxy. The relatively high arsenic composition causing a tensile strain in the Al/sub 0.25/GaAs/sub 0.08/Sb barriers lowers the valence band edge and the hole energy level, leading to an increased hole confinement and improved laser performance. A 60% external differential efficiency in pulsed mode was achieved for 1000-/spl mu/m-long lasers emitting at 2.43 /spl mu/m. A characteristic temperature T/sub 0/ as high as 163 K and a lasing-wavelength temperature dependence of 1.02 nm//spl deg/C were obtained at room temperature. For 2000 /spl times/ 200 /spl mu/m/sup 2/ broad-area three-QW lasers without lateral current confinement, a low pulsed threshold of 275 A/cm/sup 2/ was measured.     

High-performance 0.1-/spl mu/m In/sub 0.4/AlAs/In/sub 0.35/GaAs MHEMTs with Ar plasma treatment

High-performance 0.1-/spl mu/m In/sub 0.4/AlAs/In/sub 0.35/GaAs metamorphic high-electron mobility transistors (MHEMTs) on GaAs substrate have been successfully fabricated with Ar plasma treatment. Before the gate Schottky metallization, the devices were treated with Ar plasma, which might clean and improve the surface of exposed barrier layer. The devices fabricated with Ar plasma treatment exhibited the excellent characteristics such as 50% reduction of the reverse gate leakage currents, the improved Schottky ideality factor of 1.37, high extrinsic transconductance of 700 mS/mm, and high maximum drain current density of 780 mA/mm. And the cutoff frequency f/sub T/ as high as 210 GHz was achieved. To our knowledge, this is the best reported cutoff frequency for a 0.1-/spl mu/m MHEMT with an indium content of 35% in the channel.     

Single-port laser-amplifier modulators for local access

We describe a single-port, reflective, waveguide modulator based on semiconductor laser amplifier technology. The single-port geometry reduces the high packaging cost associated with two-port waveguide modulators, while the internal gain of the amplifier compensates for splitting and coupling losses. A modulator with a bulk active layer showed a reflection-mode chip gain of 17 dB at /spl lambda/=1.56 /spl mu/m. When driven with pseudorandom digital data at 100 Mb/s, extinction ratios of >12 dB were observed over the broad wavelength range (20 nm) needed for wavelength division multiplexed systems. Bit-error-rate tests confirmed that there was no distortion penalty, compared to a LiNbO/sub 3/ reference modulator.     

Reliability investigation of 0.07-/spl mu/m InGaAs-InAlAs-InP HEMT MMICs with pseudomorphic In/sub 0.75/Ga/sub 0.25/As channel

The authors have investigated the reliability performance of G-band (183 GHz) monolithic microwave integrated circuit (MMIC) amplifiers fabricated using 0.07-/spl mu/m T-gate InGaAs-InAlAs-InP HEMTs with pseudomorphic In/sub 0.75/Ga/sub 0.25/As channel on 3-in wafers. Life test was performed at two temperatures (T/sub 1/ = 200 /spl deg/C and T/sub 2/ = 215 /spl deg/C), and the amplifiers were stressed at V/sub ds/ of 1 V and I/sub ds/ of 250 mA/mm in a N/sub 2/ ambient. The activation energy is as high as 1.7 eV, achieving a projected median-time-to-failure (MTTF) /spl ap/ 2 /spl times/ 10/sup 6/ h at a junction temperature of 125 /spl deg/C. MTTF was determined by 2-temperature constant current stress using /spl Delta/G/sub mp/ = -20% as the failure criteria. The difference of reliability performance between 0.07-/spl mu/m InGaAs-InAlAs-InP HEMT MMICs with pseudomorphic In/sub 0.75/Ga/sub 0.25/As channel and 0.1-/spl mu/m InGaAs-InAlAs-InP HEMT MMICs with In/sub 0.6/Ga/sub 0.4/As channel is also discussed. The achieved high-reliability result demonstrates a robust 0.07-/spl mu/m pseudomorphic InGaAs-InAlAs-InP HEMT MMICs production technology for G-band applications.     

High-efficiency 1.3 /spl mu/m InAsP-GaInP MQW electroabsorption waveguide modulators for microwave fiber-optic links

High-efficiency electroabsorption waveguide modulators have been designed and fabricated using strain-compensated InAsP-GaInP multiple quantum wells at 1.32-/spl mu/m wavelength. A typical 200-/spl mu/m-long modulator exhibits a fiber-to-fiber optical insertion loss of 9 dB and an optical saturation intensity larger than 10 mW. The 3-dB electrical bandwidth is in excess of 20 GHz with a 50-/spl Omega/ load termination. When used in an analog microwave fiber-optic link without amplification, a RF link efficiency as high as -38 dB is achieved at 10 mW input optical carrier power. These analog link characteristics are the first reported using MQW electroabsorption waveguide modulators at 1.32 /spl mu/m.     

High-performance InGaP/GaAs HBTs with compositionally graded bases grown by solid-source MBE

N-p-n InGaP/GaAs heterojunction bipolar transistors (HBTs) with compositionally graded In/sub x/Ga/sub 1-x/As (Be doped) bases have been successfully grown by solid-source molecular beam Epitaxy (SSMBE) using a gallium phosphide (GaP) decomposition source. In this paper, the dc and RF characteristics of HBTs with different indium mole fractions in the graded In/sub x/Ga/sub 1-x/As base (x:0 /spl rarr/ ;0.1 and x:0 /spl rarr/ 0.05) are measured to investigate optimum-grading profiles. The measured average current gains, /spl beta/s of a control sample, a 10% graded-base sample and a 5% graded-base sample, are 162, 397 and 362, respectively. To our knowledge, these current gains are the highest values ever reported in compositionally graded-base InGaP/GaAs HBTs with a base sheet resistance R/sub sh/ of /spl sim/200 /spl Omega//sq establishing a new benchmark for InGaP/GaAs HBTs. Furthermore, these compositionally graded-base HBTs show higher unity current/gain cutoff frequency, f/sub T/ and maximum oscillation frequency, f/sub max/. Compared to the control sample with the same base thickness, the base transit time /spl tau//sub B/ of the graded sample is reduced by /spl sim/15% to /spl sim/20% by the induced built-in potential, resulting in an increase of f/sub max/ from 16 to 18.5 GHz in a device with an emitter size of 10/spl times/10 /spl mu/m/sup 2/. Additionally, for the 5% graded-base sample, with a 5/spl times/5 /spl mu/m/sup 2/ emitter region, f/sub T/ and f/sub max/ are 16.3 and 33.8 GHz, respectively, under low-level collector current. These results demonstrate that InGaP/GaAs HBTs with In/sub x/Ga/sub 1-x/As graded-base layers (x:0 /spl rarr/ 0.05) have the potential for high-speed analogue to digital converters.