模具钢表面连续激光沉积TiN类薄膜的研究

利用波长为10.6mm的CO2连续激光诱导化学气相沉积的方法,在模具钢基体上沉积TiN类薄膜。采用XRD、OM、SEM、EDS等手段分析薄膜的组织和相结构。结果表明,当激光功率为600W,扫描速度为2mm/s,通过H2、N2和TiCl4之间的化学反应,在模具钢表面获得了均匀致密的枝晶组织,其显微硬度最高可达2500HV。     

模具钢表面连续激光沉积TiN类薄膜的研究

利用波长为10．6mm的CO2连续激光诱导化学气相沉积的方法，在模具钢基体上沉积TiN类薄膜。采用XRD、OM、SEM、EDS等手段分析薄膜的组织和相结构。结果表明，当激光功率为600W，扫描速度为2mlrffs。通过H2、N2和TiCl4之间的化学反应，在模具钢表面获得了均匀致密的枝晶组织，其显微硬度最高可达2500HV。     

模具钢表面连续激光沉积TiN类薄膜的研究

利用波长为10．6gm的CO2连续激光诱导化学气相沉积的方法，在模具钢基体上沉积TiN类薄膜。采用XRD、OM、SEM、EDS等手段分析薄膜的组织和相结构。实验表明，当激光功率为600W，扫描速度为2mm／s，通过H2、N2和TiCl4之间的化学反应，在模具钢表面获得了均匀致密的枝晶组织，其显微硬度最高可达2500HV。     

脉冲激光沉积技术制备IrO2薄膜的研究

利用脉冲激光沉积(PLD)技术,在Si(100)衬底上制得了导电氧化铱(IrO2)薄膜.讨论了沉积参数(O2分压、衬底温度)对IrO2薄膜的结构、表面形貌和导电性的影响.结果表明20 Pa为最佳O2分压、400℃～500℃为适宜的沉积温度,此条件下制得的IrO2薄膜结晶完整,组织均匀、形状一致,排列致密,其最低电阻率约为42μΩ·cm.     

ZnO薄膜的脉冲激光沉积及性能研究

利用脉冲激光沉积技术在氧的活性气氛下烧蚀锌靶,在石英玻璃衬底上沉积获得ZnO薄膜,分析并研究了薄膜的微观组织及表面形态及激光能量密度、基体温度、氧压等工艺参数对沉积ZnO膜的影响.结果表明,在基体温度为450～550 ℃、氧压为31 Pa、激光能量密度为31 J/cm2条件下,膜表面完全氧化,ZnO沿(002)晶面生长;当基体温度为500 ℃时,ZnO薄膜光学性能优异.     

工模具钢表面化学气相沉积法强化技术应用研究

在实验和理论分析的基础上,利用化学气相沉积技术在工具钢和模具钢基体表面沉积TiN薄膜,以提高模具表面强度和耐磨性.     

激光化学气相沉积(LCVD)制取TiN薄膜

研究了在W18Cr4V高速钢基体上，用CO2连续激光诱导化学气相沉积TiN薄膜的工艺方法。激光功能600W，在H2、N2、TiCl4反应系统中沉积出TiN薄膜，薄膜的颜色呈金黄色，显微硬度为2500HV。     

脉冲激光沉积技术制备Li2O-V2O5-SiO2薄膜

采用355nm脉冲激光沉积(PLD)技术,以Li6.16V0.61Si0.39O5.36为靶材制备Li2O-V2O5-SiO2薄膜,考察了反应气氛压强、激光能量密度、基片温度等对薄膜结构和性质的影响.结果表明,随着基片温度升高及激光能量密度增大Li2O-V2O5-SiO2薄膜更致密,且室温离子电导率随之增大.在O2压强6.7Pa、激光能量密度12J/cm2和基片温度300℃条件下制备了室温离子电导率为4×10-7S/cm、离子迁移数接近1.O(tion＞99.99%)、厚度均匀、无针孔和裂缝的非晶态Li2O-V2O5-SiO3薄膜.     

热作模具钢激光表面改性研究现状

综述了激光表面改性技术在热作模具钢表面改性中的应用现状;介绍了激光相变硬化、激光熔凝、激光合金化及激光熔覆对热作模具钢表面组织结构和性能的影响,并对热作模具钢激光表面改性技术进行了展望。     

P20汽车模具钢表面激光淬火对其组织与性能的影响

采用激光淬火技术对P20模具钢进行表面热处理，对淬火层的微观组织和摩擦磨损性能进行了研究，并就激光淬火技术对模具钢的强化机理做出阐释。结果表明：基体为已经分解的珠光体组织，P20模具钢淬火区域的组织为针状马氏体和板条状马氏体，并且随着激光功率的增大，马氏体组织出现粗化现象；淬火后主要形成了(Cr, Fe)、(Mn, Fe)固溶体，产生了固溶强化；经过激光淬火后的P20模具钢的硬度得到很大提升，最大硬度值为520 HV,测得淬硬层的深度约为0.93 mm;激光功率为1800 W时，淬火层的磨损率仅为0.36%,摩擦因数为0.2013。P20模具钢激光淬火的摩擦磨损机理为磨粒磨损+氧化磨损，同时伴随少量的剥落现象。     

Deposition of TiN thin films on Si(100) by HCD ion plating

Titanium nitride (TiN) films were deposited on Si(100) substrates using a hollow cathode discharge ion plating (HCD-IP) technique. Based on previous experimental results, the optimum deposition conditions were chosen. The thickness of the TiN film and the angle between the specimen surface and the evaporating source (coating angle) were selected as the variable parameters. The purpose of this study is to investigate the effect of these two processing parameters on the properties of TiN films. After deposition, the thin film structure was characterized by X-ray diffraction (XRD), cross-sectional transmission electron microscopy (XTEM), and field-emission-gun scanning electron microscopy (FEG-SEM). N/Ti ratios of the thin films were determined using both X-ray photoelectron spectrometer (XPS) and Rutherford backscattering spectrometer (RBS). The resistivity of the TiN films was measured by a four-point probe. The hardness of the thin films was obtained from nanoindentation tests. An atomic force microscope (AFM) was used to measure the roughness of the thin films. The results showed that (111) was the dominant preferred orientation in the TiN films for most of the deposition conditions and for all coating angles, especially for film thicknesses greater than 1 μm. Hardness values of TiN films were approximately 28 GPa for film thicknesses close to 0.5 μm and above, and did not vary with the coating angle. The hardness can be correlated to the (111) preferred orientation of the TiN film. The hardness increased with the (111) texture coefficient and leveled off as the texture coefficient approached 1. The packing factor had a linear relationship with the film thickness. Resistivity decreased with increasing thickness and increasing packing factor for all coating angles. At a similar thickness or packing factor, specimens coated at angles different from 0° had a much higher resistivity than those coated at 0°.     

Corrosion Resistance of PAPVD TiN Coating on AISI 304 Stainless Steel

In this work the corrosion resistance of PAPVD TiN hard coatings on AISI 304 stainless steel with a titanium interlayer has been addressed. Cyclic voltammetry corrosion tests in NaCl 3.5% solutions were performed for samples prepared by depositing TiN/Ti onto steel using different deposition parameters. The surface morphology of the samples was examined by using a scanning electron microscope (SEM) and phase analysis was performed by X-ray diffraction (XRD). The cyclic voltammetry curves showed two distinct behaviours. Firstly, a reduction in corrosion resistance was observed when current density was increased for the whole potential range studied. The second observation, no less important, was the increase in corrosion resistance compared to the uncoated steel. The TiN films deposited showing (III) preferred orientation showed better corrosion resistance than films presenting other orientations.     

具有TiN过渡层的BCN薄膜制备与力学性能

用电弧增强磁控溅射(AEMS)装置在高速钢(W18Cr4V)和Si(100)基体上制备了具有TiN过渡层的BCN薄膜,用X射线衍射(XRD)仪和傅里叶红外光谱(FTIR)分析了薄膜的微观结构,用划痕仪测试了薄膜的结合力,用显微硬度计和销盘式摩擦磨损实验仪测试了薄膜的硬度和摩擦学性能。结果表明:本实验条件下制备的具有Ti N过渡层的BCN薄膜的硬度为23 GPa,薄膜与GCr15钢球对磨的摩擦系数为0.3,具有TiN过渡层的BCN薄膜的结合力和摩擦学性能较BCN单层薄膜有明显提高。     

钛合金表面非平衡磁控溅射制备TiN薄膜的冲击磨损性能

文中利用非平衡磁控溅射技术在Ti6Al4V合金表面沉积TiN薄膜.固定冲击频率、改变冲击载荷,在小载荷冲击磨损试验机上进行了系列周次的冲击磨损试验,用台阶仪、扫描电子显微镜、X射线衍射仪分析磨痕深度、形貌及相结构,并探讨了TiN薄膜的磨损机理.试验表明:TiN薄膜的冲击磨损机理主要为塑性变形和疲劳剥落,与基体材料作比较,TiN薄膜破坏的临界冲击周次比基体材料Ti6Al4V合金明显提高.     

不锈钢根管锉镀覆TiN、ZrN膜的沉积工艺与性能研究

目的通过在不锈钢根管锉表面镀覆Ti N、Zr N薄膜,以提高其切削性能。方法采用磁控溅射技术,调整沉积时间、基片偏压、占空比等工艺参数在不锈钢根管锉上分别沉积Ti N、Zr N薄膜。对Ti N、Zr N膜层进行SEM断面分析、XRD相组成分析、表面硬度测试、膜层附着力测试,考查了Ti N、Zr N薄膜的厚度、相组成、硬度以及附着力。通过对镀膜后的根管锉进行电化学腐蚀试验、模拟临床切削试验,分析了镀膜后根管锉的耐蚀性和切削性能。结果随着工艺参数的变化,Ti N、ZrN薄膜的厚度、相结构以及硬度均显示了规律性的变化。镀覆Ti N、Zr N薄膜的不锈钢根管锉的自腐蚀电流密度相对于未镀膜的根管锉均明显降低。确定了Ti N膜层和Zr N膜层的优化沉积工艺分别为沉积时间1 h、负偏压100 V、占空比60%和沉积时间1h、负偏压150V、占空比60%。优化工艺下镀膜的不锈钢根管锉的切削数量和切削效率显著提高。结论和未镀膜不锈钢根管锉相比,镀覆Ti N、ZrN薄膜的不锈钢根管锉的表面硬度、耐蚀性能均有显著提高。最优工艺下制备的镀覆Ti N、Zr N薄膜的不锈钢根管锉兼具切削数量、切削效率以及切削稳定性等方面的综合优势,和未镀膜不锈钢根管锉相比,切削效率提高60%～75%,切削树脂模拟根管数量达到1.7～2倍,实现了切削性能的显著提升。     

Room-temperature growth of high-purity titanium nitride by laser ablation of titanium in a nitrogen atmosphere

Thin films of titanium nitride (TiN) were deposited on glass substrates by KrF excimer laser ablation of titanium over a very broad nitrogen pressure range with different target–substrate distances at room temperature. The as-deposited TiN thin films were analyzed by X-ray diffraction and transmission electron microscopy. It was found that the as-deposited thin films are normally a mixture of TiN and metallic titanium, and the TiN-to-Ti ratio of the as-deposited thin film depends on both the nitrogen pressure and the target–substrate distance. High-purity TiN thin films can be obtained only in a very narrow deposition parameter range. A compound parameter (the product of the nitrogen pressure and the target–substrate distance) is proposed to optimize the deposition of high-purity TiN thin films, and the possible mechanism is also discussed. It was also revealed that the as-deposited TiN thin films are polycrystalline with an average grain size of about 20 nm.     

调制周期对TiN/Ti多层膜组织结构和结合力的影响

为了阐明调制周期对薄膜微观组织及薄膜与基体结合力的影响,采用反应磁控溅射在Ti6Al4V基板上交替沉积了Ti层及TiN层制备了TiN/Ti多层膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、显微硬度仪和划痕仪测量分析了薄膜的晶体结构、微观组织、硬度以及薄膜与基体之间的结合力。研究结果表明:TiN/Ti多层膜中均存在TiN,Ti和Ti2N 3种相。TiN/Ti多层膜均以柱状晶方式生长,在调制周期较大(5层)时,TiN和Ti层的界面清晰;随着调制周期的减小(层数增加),TiN和Ti层的界面逐渐消失。与单层TiN薄膜相比,多层TiN/Ti薄膜的硬度显著提高;但随着薄膜层数的增加,多层TiN/Ti薄膜硬度略微降低。当调制周期为80nm(30层)时,薄膜与基体的结合力明显提高,达到73N。     

新型热冲压模具钢的组织与性能

采用SEM、TEM、LF457型激光导热仪,DSC404型差示扫描量热仪和UMT-3型高温摩擦磨损试验机对高强钢板热冲压用新型模具钢的组织和热稳定性能、热物理性能及高温耐磨性能进行研究。试验结果表明:该模具钢具有良好的抗回火软化性能、热稳定性、高热导率和高温耐磨性,能更好地适应高强钢板热冲压工况。新型模具钢的碳化物以Mo₂C和VC为主,使得该钢有更好的抗回火软化和热稳定性。新型钢具有高热导率,在室温下是H13钢的1.4倍。其低Si、Mn、Cr和高Mo的合金化特征是其高热导率的原因。该钢较H13钢有更好的高温耐磨性能,尤其是温度高于600 ℃后耐磨性要远远优于H13钢。新型模具钢良好的耐磨性能有益于减少模具修理频次,提高模具寿命。     

基体负偏压对TiAlN/TiN膜层组织成分及硬度的影响

采用多弧离子镀技术在40Cr基体上制备TiAlN/TiN复合膜层;利用金相显微镜、扫描电子显微镜和显微硬度仪研究基体负偏压对膜层硬度的影响.结果表明:基体负偏压对膜层性能有显著影响,过高或过低的基体偏压会使得膜层表面不平整,表面显微硬度降低.基体负偏压越高,膜层中Ti、Al原子的含量就越低.