High-voltage (900 V) 4 <Emphasis Type="Italic">H</Emphasis>-SiC Schottky diodes with a boron-implanted guard <Emphasis Type="Italic">p-n</Emphasis> junction

High-voltage (900 V) 4H-SiC Schottky diodes terminated with a guard p-n junction were fabricated and studied. The guard p-n junction was formed by room-temperature boron implantation with subsequent high-temperature annealing. Due to transient enhanced boron diffusion during annealing, the depth of the guard p-n junction was equal to about 1.7 μm, which is larger by approximately 1 μm than the projected range of 11 B ions in 4H-SiC. The maximum reverse voltage of fabricated 4H-SiC Schottky diodes is found to be limited by avalanche breakdown of the planar p-n junction; the value of the breakdown voltage (910 V) is close to theoretical estimate in the case of the impurity concentration N = 2.5 × 10¹⁵ cm^?3 in the n-type layer, thickness of the n-type layer d = 12.5 μm, and depth of the p-n junction r _j = 1.7 μm. The on-state diode resistance (3.7 mΩ cm²) is controlled by the resistance of the epitaxial n-type layer. The recovery charge of about 1.3 nC is equal to the charge of majority charge carriers that are swept out of an epitaxial n-type layer under the effect of a reverse voltage.     

A 4<Emphasis Type="Italic">H</Emphasis>-SiC<Emphasis Type="Italic">p-i-n</Emphasis> diode fabricated by a combination of sublimation epitaxy and CVD

The possibility of fabricating heavily doped (N _a ?N _d ≥ 1 × 10¹⁹ cm_?3) p⁺-4H-SiC layers on CVD-grown lightly doped n-4H-SiC layers by sublimation epitaxy has been demonstrated. It is shown that a Au/Pd/Ti/Pd contact, which combines a low specific contact resistance (～2 × 10^?5 Ω cm²) with high thermal stability (up to 700°C), is the optimal contact to p-4H-SiC. The p-n structures obtained are used to fabricate packaged diodes with a breakdown voltage of up to 1400 V.     

Electrical properties of <Emphasis Type="Italic">n-</Emphasis>GaN/<Emphasis Type="Italic">p</Emphasis>-SiC heterojunctions

Epitaxial GaN layers were grown by hydride vapor phase epitaxy (HVPE) on commercial (CREE Inc., USA) p⁺-6H-SiC substrates (Na ? Nd ≈ 7.8 × 10¹⁷ cm^s?3) and n⁺-6H-SiC Lely substrates with a predeposited p⁺-6H-SiC layer. A study of the electrical properties of the n-GaN/p-SiC heterostructures obtained confirmed their fairly good quality and demonstrated that the given combination of growth techniques is promising for fabrication of bipolar and FET transistors based on the n-GaN/p-SiC heterojunctions.     

High-temperature nuclear-detector arrays based on 4 <Emphasis Type="Italic">H</Emphasis>-SiC ion-implantation-doped <Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript>-<Emphasis Type="Italic">n</Emphasis> junctions

Results obtained in a study of spectrometric characteristics of arrays of four detectors based on 4H-SiC ion-implantation-doped p ⁺-n junctions in the temperature range 25–140 °C are reported for the first time. The junctions were fabricated by ion implantation of aluminum into epitaxial 4H-SiC layers of thickness ≤45 μm, grown by chemical vapor deposition with uncompensated donor concentration N _d ? N _a = (4–6) × 10¹⁴ cm^?3. The structural features of the ion-implantation-doped p ⁺-layers were studied by secondary-ion mass spectrometry, transmission electron microscopy, and Rutherford backscattering spectroscopy in the channeling mode. Parameters of the diode arrays were determined by testing in air with natural-decay alpha particles with an energy of 3.76 MeV. The previously obtained data for similar single detectors were experimentally confirmed: the basic characteristics of the detector arrays, the charge collection efficiency and energy resolution, are improved as the working temperature increases.     

On the theory of the two-photon linear photovoltaic effect in <Emphasis Type="Italic">n</Emphasis>-GaP

A quantitative theory of the diagonal (ballistic) and nondiagonal (shift) band index contributions to the two-photon current of the linear photovoltaic effect in a semiconductor with a complex band due to the asymmetry of events of electron scattering at phonons and photons is developed. It is shown that processes caused by the simultaneous absorption of two photons do not contribute to the ballistic photocurrent in n-GaP. This is due to the fact that, in this case, there is no asymmetric distribution of the momentum of electrons excited with photons; this distribution arises upon the sequential absorption of two photons with the involvement of LO phonons. It is demonstrated that the temperature dependence of the shift contribution to the two-photon photocurrent in n-GaP is determined by the temperature dependence of the light-absorption coefficient caused by direct optical transitions of electrons between subbands X₁ and X₃. It is shown that the spectral dependence of the photocurrent has a feature in the light frequency range ω → Δ/2?, which is related to the hump-like shape of subband X₁ in n-GaP¹ and the root-type singularity of the state density determined as k_ω^-1= (2?ω–Δ)^–1/2, where Δ is the energy gap between subbands X₁ and X₃. The spectral and temperature dependences of the coefficient of absorption of linearly polarized light in n-GaP are obtained with regard to the cone-shaped lower subband of the conduction band.     

3<Emphasis Type="Italic">C</Emphasis>-SiC <Emphasis Type="Italic">p-n</Emphasis> structures grown by sublimation on 6<Emphasis Type="Italic">H</Emphasis>-SiC substrates

Sublimation epitaxy in a vacuum has been employed to grow n-and p-type 3C-SiC layers on 6H-SiC substrates. Diodes have been fabricated on the basis of the p-n structure obtained, and their parameters have been studied by measuring their current-voltage and capacitance-voltage characteristics and by applying the DLTS and electroluminescence methods. It is shown that the characteristics of the diodes studied are close to those of diodes based on bulk 3C-SiC. A conclusion is made that sublimation epitaxy can be used to fabricate 3C-SiC p-n structures on substrates of other silicon carbide polytypes.     

A Quasi-Classical Model of the Hubbard Gap in Lightly Compensated Semiconductors

A quasi-classical method for calculating the narrowing of the Hubbard gap between the A⁰ and A⁺ acceptor bands in a hole semiconductor or the D⁰ and D^– donor bands in an electron semiconductor is suggested. This narrowing gives rise to the phenomenon of a semiconductor transition from the insulator to metal state with an increase in doping level. The major (doping) impurity can be in one of three charge states (–1, 0, or +1), while the compensating impurity can be in states (+1) or (–1). The impurity distribution over the crystal is assumed to be random and the width of Hubbard bands (levels), to be much smaller than the gap between them. It is shown that narrowing of the Hubbard gap is due to the formation of electrically neutral acceptor (donor) states of the quasicontinuous band of allowed energies for holes (electrons) from excited states. This quasicontinuous band merges with the top of the valence band (v band) for acceptors or with the bottom of the conduction band (c band) for donors. In other words, the top of the v band for a p-type semiconductor or the bottom of the c band for an n-type semiconductor is shifted into the band gap. The value of this shift is determined by the maximum radius of the Bohr orbit of the excited state of an electrically neutral major impurity atom, which is no larger than half the average distance between nearest impurity atoms. As a result of the increasing dopant concentration, the both Hubbard energy levels become shallower and the gap between them narrows. Analytical formulas are derived to describe the thermally activated hopping transition of holes (electrons) between Hubbard bands. The calculated gap narrowing with increasing doping level, which manifests itself in a reduction in the activation energy ε₂ is consistent with available experimental data for lightly compensated p-Si crystals doped with boron and n-Ge crystals doped with antimony.     

Relaxation of excitons in semimagnetic asymmetric double quantum wells

The steady-state circular-polarized photoluminescence in semimagnetic asymmetric double quantum wells based on Cd(Mn,Mg)Te is studied thoroughly in relation to the polarization of intrawell nonresonance photoexcitation in magnetic fields Bup to 9 T. In low fields B, in which the exciton in the magnetic well is higher in energy than the exciton in the nonmagnetic well, the complete interwell relaxation of excitons is observed. In fields higher than B _c = 3–6 T, at which the exciton level in the magnetic well crosses the field-independent exciton level in the nonmagnetic well, the magnetic-field-induced red shift of the exciton in the magnetic well is accompanied by the establishment of a nonequilibrium distribution of excitons. This suggests that spin relaxation plays an important part in the interwell separation of excitons in the spin-dependent potential of the heterostructure. The efficiency of spin relaxation is controlled by mixing of valence band states in the nonmagnetic well and by splitting of heavy and light holes Δ _hh-lh . Different modes of interwell tunneling are observed in different field regions separated by the field B _c ^* > B _c corresponding to the crossing of the localized excitons in the nonmagnetic well and free excitons in the magnetic well. Possible mechanisms of interwell tunnel relaxation are discussed.     

Role of spontaneous polarization in the formation of <Emphasis Type="Italic">NH</Emphasis>-SiC/3<Emphasis Type="Italic">C</Emphasis>-SiC/<Emphasis Type="Italic">NH</Emphasis>-SiC structures based on silicon carbide polytypes

The effect of the electrostatic field caused by spontaneous polarization in hexagonal plates of a heterostructure based on NH-SiC/3C-SiC/NH-SiC silicon carbide polytypes on relative positions of energy bands is considered. It was shown that the asymmetry arising in the system is associated with the superposition of polarization and contact fields.     

Specific features of electron spin resonance in 4<Emphasis Type="Italic">H</Emphasis>-SiC in the vicinity of the insulator-metal phase transition: II. Analysis of the width and shape of lines

The variation in the width and shape of the ESR line of nitrogen in 4H-SiC in the concentration range corresponding to the insulator-metal phase transition was investigated. It is shown that the spin relaxation in the region of hopping and metal conduction occurs at electrical multipoles (clusters) whose sizes decrease from rather large to small (characteristic of interimpurity distances) as the concentration of impurity centers increases. Analysis of the temperature dependences of the resistance made it possible to estimate the critical concentration for the insulator-metal phase transition (N _D -N _A )_c≈1.5×10¹⁹ cm^?3. The values of other characteristic concentrations that determine the effects of electron-electron interaction in the system under study were also found.     

Field dependence of the electron drift velocity along the hexagonal axis of 4<Emphasis Type="Italic">H</Emphasis>-SiC

The forward current–voltage characteristics of mesa-epitaxial 4H-SiC Schottky diodes are measured in high electric fields (up to 4 × 10⁵ V/cm) in the n-type base region. A semi-empirical formula for the field dependence of the electron drift velocity in 4H-SiC along the hexagonal axis of the crystal is derived. It is shown that the saturated drift velocity is (1.55 ± 0.05) × 10⁷ cm/s in electric fields higher than 2 × 10⁵ V/cm.     

<Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript>-Si-<Emphasis Type="Italic">n</Emphasis>-CdF<Subscript>2</Subscript> heterojunctions

Boron diffusion and the vapor-phase deposition of silicon layers are used to prepare ultrashallow p⁺-n junctions and p⁺-Si-n-CdF₂ heterostructures on an n-CdF₂ crystal surface. Forward portions of the I–V characteristics of the p⁺-n junctions and p⁺-Si-n-CdF₂ heterojunctions reveal the CdF₂ band gap (7.8 eV), as well as allow the identification of the valence-band structure of cadmium fluoride crystals. Under conditions in which forward bias is applied to the p⁺-Si-n-CdF₂ heterojunctions, electroluminescence spectra are measured for the first time in the visible spectral region.     

Photoluminescence Studies of Si-Doped Epitaxial GaAs Films Grown on (100)- and (111)A-Oriented GaAs Substrates at Lowered Temperatures

The electrical properties and photoluminescence features of uniformly Si-doped GaAs layers grown on GaAs substrates with the (100) and (111)A crystallographic orientations of the surface are studied. The samples are grown at the same As₄ pressure in the growth temperature range from 350 to 510°C. The samples grown on GaAs(100) substrates possess n-type conductivity in the entire growth temperature range, and the samples grown on GaAs(111)A substrates possess p-type conductivity in the growth temperature range from 430 to 510°C. The photoluminescence spectra of the samples exhibit an edge band and an impurity band. The edge photoluminescence band corresponds to the photoluminescence of degenerate GaAs with n- and p-type conductivity. The impurity photoluminescence band for samples on GaAs(100) substrates in the range 1.30–1.45 eV is attributed to V_As defects and Si_As–V_As defect complexes, whose concentration varies with sample growth temperature. Transformation of the impurity photoluminescence spectra of the samples on GaAs(111)A substrates is interpreted as being a result of changes in the V_As and V_Ga defect concentrations under variations in the growth temperature of the samples.     

Energy spectrum of charge carriers in Ag<Subscript>2</Subscript>Te

On the basis of investigations of the temperature and concentration dependences of kinetic coefficients (the Hall coefficientR, the electrical conductivity σ, and thermopower α₀) in n-type Ag₂Te, it is established that Ag atoms in Ag₂Te create the shallow donor levels located at a distance of (0.002?7 × 10^?5 T) eV from the bottom of the conduction band. It is shown that silver telluride has n-type conductivity starting with the deficiency of Ag ≥ 0.01 at % in the stoichiometric composition, and it is practically impossible to achieve the stoichiometric composition in Ag₂Te.     

Role of spontaneous polarization in formation of heterojunctions from silicon carbide polytypes

Solution of the Poisson equation is analyzed in terms of the model of a completely depleted contact layer for a heterojunction having as one of its components a noncubic silicon carbide polytype that exhibits a spontaneous polarization P _sp. It is shown that consideration of P _sp leads to broadening of the space charge regions. It is demonstrated that an isotype p-p junction with a quantum well in the valence band of the 3C polytype at the interface with the H-SiC polytype can serve as a model object for studies of the effect exerted by the spontaneous polarization on the properties of SiC heterojunctions. The possibility of a noticeable effect of P _sp on the ground-state energy of an electron in the well is demonstrated for the model with a triangular potential well.     

Electron mobility in the inversion layers of fully depleted SOI films

The dependences of the electron mobility μ_eff in the inversion layers of fully depleted double–gate silicon-on-insulator (SOI) metal–oxide–semiconductor (MOS) transistors on the density N _e of induced charge carriers and temperature T are investigated at different states of the SOI film (inversion–accumulation) from the side of one of the gates. It is shown that at a high density of induced charge carriers of N _e > 6 × 10¹² cm^–2 the μeff(T) dependences allow the components of mobility μ_eff that are related to scattering at surface phonons and from the film/insulator surface roughness to be distinguished. The μ_eff(N _e ) dependences can be approximated by the power functions μ_eff(N _e) ∝ N _e ^?n . The exponents n in the dependences and the dominant mechanisms of scattering of electrons induced near the interface between the SOI film and buried oxide are determined for different N _e ranges and film states from the surface side.     

Interphase interactions and features of structural relaxation in TiB<Subscript>x</Subscript>-<Emphasis Type="Italic">n</Emphasis>-GaAs (InP,GaP, 6<Emphasis Type="Italic">H</Emphasis>-SiC) contacts subjected to active treatment

The results of experimental studies of interphase interactions in TiB_x-n-GaAs (GaP, InP, 6H-SiC) contacts stimulated by external effects are described. These effects are rapid thermal annealing at temperatures as high as 1000°C, microwave treatment at f=2.5 GHz, and ⁶⁰Co γ radiation in the range of doses 10⁵–10⁷ rad. Possible thermal and athermal relaxation mechanisms of internal stresses are considered. It is shown that thermally stable TiB_x-n-GaAs (GaP, InP, 6H-SiC) interfaces can be formed.     

Structural and Electrical Properties of Ag/<Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-Si/Al Heterostructure Fabricated by Pulsed Laser Deposition Technique

We have investigated the structural and electrical characteristics of the Ag/n-TiO₂/p-Si/Al heterostructure. Thin films of pure TiO₂ were deposited on p-type silicon (100) by optimized pulsed laser ablation with a KrF-excimer laser in an oxygen-controlled environment. X-ray diffraction analysis showed the formation of crystalline TiO₂ film having a tetragonal texture with a strong (210) plane as the preferred direction. High purity aluminium and silver metals were deposited to obtain ohmic contacts on p-Si and n-TiO₂, respectively. The current–voltage (I–V) characteristics of the fabricated heterostructure were studied by using thermionic emission diffusion mechanism over the temperature range of 80–300 K. Parameters such as barrier height and ideality factor were derived from the measured I–V data of the heterostructure. The detailed analysis of I–V measurements revealed good rectifying behavior in the inhomogeneous Ag/n-TiO₂/p-Si(100)/Al heterostructure. The variations of barrier height and ideality factor with temperature and the non-linearity of the activation energy plot confirmed that barrier heights at the interface follow Gaussian distributions. The value of Richardson’s constant was found to be 6.73 × 10⁵ Am^?2 K^?2, which is of the order of the theoretical value 3.2 × 10⁵ Am^?2 K^?2. The capacitance–voltage (C–V) measurements of the heterostructure were investigated as a function of temperature. The frequency dependence (Mott–Schottky plot) of the C–V characteristics was also studied. These measurements indicate the occurrence of a built-in barrier and impurity concentration in TiO₂ film. The optical studies were also performed using a UV–Vis spectrophotometer. The optical band gap energy of TiO₂ films was found to be 3.60 eV.     

Spin transistor based on cadmium fluoride nanostructures

A study of CdB _x F_{2 ? x} /p-CdF₂/CdB _x F_{2 ? x} planar sandwich structures fabricated on n-CdF₂ crystal surface was carried out in order to obtain the spin-transistor effect at room temperature. Features related to the band gap of CdF₂ (7.8 eV) along with those related to the spectrum for two-dimensional (2D) hole subbands in p-CdF₂ quantum well (QW) were observed in the current-voltage characteristics for ultrashallow p ⁺-n junctions. The results obtained demonstrate the important role for 2D hole subbands in the mechanism of the “proximity effect” that appears due to Andreev’s reflection in sandwich structures consisting of a narrow QW confined between superconducting barriers. Resonance behavior for the longitudinal voltage in a weak magnetic field normal to the plane of the p-CdF₂ QW gives evidence for high degree of spin polarization for 2D holes. Analysis of the dependences for the 2D-hole-gas conductance on the magnitude and direction of the magnetic field normal to the plane of the p-CdF₂ QW reveals anti-crossings for Zeeman sublevels in the singlet ground state and triplet excited state of boron dipole centers, responsible for the spin polarization of 2D holes in edge channels in the p-CdF₂ QW. The high degree of spin polarization for 2D holes in edge channels in the p-CdF₂ QW identifies the mechanism underlying spin-transistor I-V characteristics observed upon the variation of the gate voltage, which controls the magnitude of Bychkov-Rashba’s spin-orbit coupling.     

Carrier Lifetimes in Lightly-Doped <Emphasis Type="Italic">p</Emphasis>-Type 4H-SiC Epitaxial Layers Enhanced by Post-growth Processes and Surface Passivation

We investigated limiting factors of carrier lifetimes and their enhancement by post-growth processes in lightly-doped p-type 4H-SiC epitaxial layers (N _A ～ 2 × 10¹⁴ cm^?3). We focused on bulk recombination, surface recombination, and interface recombination at the epilayer/substrate, respectively. The carrier lifetime of 2.8 μs in an as-grown epilayer was improved to 10 μs by the combination of V_C-elimination processes and hydrogen annealing. By employing surface passivation with deposited SiO₂ followed by POCl₃ annealing, a long carrier lifetime of 16 μs was obtained in an oxidized epilayer. By investigating carrier lifetimes in a self-standing p-type epilayer, it was revealed that the interface recombination at the epilayer/substrate was smaller than the surface recombination on a bare surface. We found that the V_C-elimination process, hydrogen annealing, and surface passivation are all important for improving carrier lifetimes in lightly-doped p-type epilayers.