X射线衍射仪故障与维修实例

本文研究了X射线衍射仪的样品台的驱动原理与机械结构设计。通过对设备构造的分析,成功的更换了X射线衍射仪的主机电源,更换了L6202电机驱动模块,修复了控制样品台Y轴电机的驱动电路。最后排除了导致设备短路的故障点。此次维修为大型仪器设备的维护积累了宝贵的经验。     

X射线衍射仪高压系统故障维修

高压故障是×射线衍射仪的常见故障之一。本文结合我们对帕纳科×’Pert Pro MPD衍射仪高压故障维修中的一些体会,介绍了X射线衍射仪高压系统的基本组成,分析了高压系统的工作原理。提出了×射线衍射仪高压系统常见故障的检修方法和步骤。利用仪器自带的“测试和诊断软件”对高压故障进行检测,根据故障信息提示确定故障范围,通过断开高压电缆的方法可进一步确定故障部件。     

D/MAX-RB X射线衍射仪维修一例

本文介绍日本理学公司生产D/MAX-RB X射线衍射仪维修一例。通过逐步分析检查,排除该仪器加高压不动作的故障,并介绍了有关电路故障的分析及排除方法。     

德国布鲁克D4 X-射线衍射仪维修案例

以布鲁克D4 X-射线衍射仪为例，介绍了其机械手在设备正常情况下，分析样品时不能抓取样品，及仪器报错，通过对机械手抓样的原理进行研究。最终解决机械手故障，样品准备开关的维修过程，帮助企业快速恢复生产，降低维修成本。     

理学D/max-rC型X射线衍射仪一例故障分析

本文介绍一例理学D/max-rC型X射线衍射仪真空规老化引起的故障,根据其工作原理进行故障分析,总结在无备件替换的情况下进行仪器维修的方法。     

X射线衍射仪的维护与使用

X射线衍射仪广泛应用于化学、化工、材料、冶金,石油、物理等领域,一旦出现故障,通常维修费用比较昂贵。因此,细致维护、科学使用,对于确保仪器性能和使用质量、降低维护成本等非常重要。本文根据作者近5年来在D8ADVANCE型X射线衍射仪的管理使用和维护工作中的实际经验,对其在维护与使用方面需要注意的关键问题进行探讨。     

X射线衍射仪自控单元常见故障的维修

介绍了X射线衍射仪自动控制单元常见故障的检测与维修。     

多晶X射线衍射仪的技术进展

简要介绍了近几年来多晶X射线衍射仪的光源、测角仪、样品台、光学系统、附件、检测器和应用软件方面的技术进展和用途扩展情况。     

用离子束溅射法制备X射线多层膜的实验和工艺

叙述了用离子束溅射镀膜机进行X射线波段多层膜镀膜实验及制备X射线多层膜光学元件方面的工作,简述离子束溅射镀膜机的工作原理,X射线多层膜的制备过程,主要工艺参数及注意事项,以及用X射线小角衍射仪对制备样品进行检测的部分结果。     

用离子束溅射法制备X射线多层膜的实验和工艺

叙述了用离子束溅射镀膜机进行X射线波段多层膜镀膜实验及制备X射线多层膜光学元件方面的工作，简述离子束溅射镀膜机的工作原理，X射线多层膜的制备过程，主要工艺参数及注意事项，以及用X射线小角衍射仪对制备样品进行检测的部分结果。     

多孔生物镁的制备及其表面改性

采用粉末冶金方法制备多孔镁，其孔隙率为20％～55％。通过碱热处理法对孔隙率为35％的多孔镁进行表面改性，以提高多孔镁在仿生体液中的耐腐蚀能力，并对碱处理和碱热处理后试样表面的沉积成分进行了测定。结果表明：多孔镁的孔隙率和孔径可以通过造孔剂的颗粒和含量来控制；通过碱热处理对多孔镁进行表面改性，未处理的多孔镁试样在仿生体液中浸泡7天后完全腐蚀，碱处理后的试样在仿生体液中浸泡10天后完全腐蚀，而经过碱热处理后的试样在仿生体液中浸泡14天后仍然保持原状，证明碱热处理可以显著提高多孔镁表面在仿生环境下的耐腐蚀性能。     

Refinements in the collection of energy filtered diffraction patterns from disordered materials

In this paper a method for collecting electron diffraction patterns using a Gatan imaging filter is presented. The method enables high-quality diffraction data to be measured at scattering angles comparable to those that can be obtained using X-ray and neutron diffraction. In addition, the method offers the capability for examining small regions of sample in, for example, thin films and nano-structures. Using X-ray, neutron and electron diffraction data collected from the same sample, we demonstrate quantitative agreement between all three. We also present a novel method for obtaining the single scattering contribution to the total diffracted intensity by collecting data at various electron wavelengths. This approach allows pair distribution functions to be determined from electron diffraction in cases where there exists significant multiple scattering.     

利用广角衍射仪对软X射线超薄膜的测量

利用X射线衍射,是目前国际上对超薄多层膜进行检测常用的方法之一,但只局限于双晶或小角衍射仪。本文利用的方法解决了广角衍射仪在低角区测量时由于样品放置误差所造成的衍射峰偏移和得不到衍射曲线的问题,从而使广角衍射仪得以应用在小角区测量。文中重点对测量曲线进行了分析,准确计算了多层膜的周期和单层膜厚度,并与测量值进行了比较,结果表明利用广角衍射仪测量膜厚是切实可行的。在目前我国X射线波段反射率测量装置还没有完善的条件下,利用X射线衍射仪对超薄膜的检测更显得格外重要。     

Non-destructive and quantitative imaging of a nano-structured microchip by ptychographic hard X-ray scanning microscopy

We used hard X-ray scanning microscopy with ptychographic coherent diffraction contrast to image a front-end processed passivated microchip fabricated in 80 nm technology. No sample preparation was needed to image buried interconnects and contact layers with a spatial resolution of slightly better than 40 nm. The phase shift in the sample is obtained quantitatively. With the additional knowledge of the elemental composition determined in parallel by X-ray fluorescence mapping, quantitative information about specific nanostructures is obtained. A significant enhancement in signal-to-noise ratio and spatial resolution is achieved compared to conventional hard X-ray scanning microscopy.     

Transmission electron microscopy applied to the study of works of art: sample preparation methodology and possible techniques

Technical examination of a work of art is a necessary preliminary stage both for proper conservation/restoration of the work and for purposes of dating and/or authentication. There is a wide variety of methods and procedures, and of these a particularly valuable technique is stratigraphic analysis in view of the data that it furnishes on the composition of the pictorial layers of which a painting is composed. The techniques utilized in this type of analysis to date have been essentially light microscopy and scanning electron microscopy. Transmission electron microscopy can provide new data for characterization of pictorial layers, thanks to the possibility of individually using ultrathin sections of paint sample. This study provides morphological analysis and microanalysis by X-ray energy dispersion, with determination of the crystalline structure of each particle by electron diffraction. The sample preparation method for producing thin sections from the pictorial layers for examination in the TEM is described. This allows the stratigraphic section to be preserved exactly as applied by the artist. The first results from the examination of three microsamples from actual old works of art are presented. The individual components of each strata were successfully identified in all cases.     

Calibration of instrument and sample parameters for small angle X-ray scattering

A method for calibrating the parameters of a small angle X-ray scattering instrument using the diffraction ring of a standard sample is presented. A generalized geometric model for small angle X-ray scattering was constructed and detailed mathematical derivations presented to solve for the relevant instrument parameters, which were then used to convert two-dimensional small angle X-ray scattering data to standard curves. The method is valid regardless whether the detector photosensitive plane is perpendicular or tilted with respect to the beam. Small angle X-ray scattering was performed using standard calibration samples to validate the methodology.     

面向驱动桥壳再制造的塑性损伤研究

为研究废旧驱动桥壳局部区域的塑性损伤,定量评估驱动桥壳的塑性变形率,以驱动桥壳本体材料510L钢板制备拉伸试样,分别将试样拉伸到不同的塑性变形率,用X射线衍射技术、金属智能磁记忆分析技术、扫描式电子显微镜综合评价了材料的塑性变形率与X射线信号和磁信号的关系,观测不同塑性变形率下的晶体结构变化特征。结果显示：在强化阶段,X射线衍射峰宽可定量计算材料的塑性变形率,磁场法向分量Hp(y)较小。      

一种新的无损测定金属表层应力随层深分布方法的探讨

本文提出了一种无损测定金属表层应力随层深分布的试验方法,此法主要在不同波长的X－射线辐照下选用一系列不同的衍射晶面来进行测定。从而获得不同有效穿透深度内的平均残余应力值,由于X-射线强度随层深增加是按指数e{sup}(-ux)衰减的,因此用X－射线测得的应力值是一个加权平均值,由它再来计算试样不同层深的实际应力值,并绘出金属部件随层深分布的应力曲线。在普通的衍射仪上,此法最大探测深度为40～50u,它取决于被选用的靶和衍射晶面,所以对研究各种经过表面处理和磨削后的金属部件的表面质量仍然是有效的。曾对经过磨削的炭钢试样,WC刀具,氮化处理的试样等进行了一系列的测定,并绘制了相应的应力分布曲线。本试验必须在附有试样侧倾装置的衍射仪上进行。     

X射线衍射技术在材料分析中的应用

X射线衍射分析技术是一种十分有效的材料分析方法,在众多领域的研究和生产中被广泛应用。介绍了X射线衍射的基本原理,从物相鉴定、点阵参数测定、微观应力测定等几方面概述了X射线衍射技术在材料分析中的应用进展。     

Phase identification of individual crystalline particles by electron backscatter diffraction

Recently, an electron backscatter diffraction (EBSD) system was developed that uses a 1024 × 1024 CCD camera coupled to a thin phosphor. This camera has been shown to produce excellent EBSD patterns. In this system, crystallographic information is determined from the EBSD pattern and coupled with the elemental information from energy or wavelength dispersive X-ray spectrometry. Identification of the crystalline phase of a sample is then made through a link to a commercial diffraction database. To date, this system has been applied almost exclusively to conventional, bulk samples that have been polished to a flat surface. In this investigation, we report on the application of the EBSD system to the phase identification analysis of individual micrometre and submicrometre particles rather than flat surfaces.