工艺参数对非平衡磁控溅射Ti/TiN/Ti(C,N)薄膜硬度的影响

 采用中频非平衡磁控溅射工艺，在316L不锈钢、高速钢和硬质合金3种基体材料上制备Ti/TiN/Ti(C,N)膜系的硬质薄膜。通过改变工作气氛、基体负偏压等工艺参数，对制备薄膜的硬度进行检测分析，结果表明：在Ti(C,N)薄膜的制备中，工作气氛和基体负偏压是影响薄膜硬度的主要因素。当工作气体的通入比例C2H2/(N2+Ar)＜1/9时，薄膜硬度较高。当通入的乙炔(C2H2)流量增加时，会明显降低薄膜硬度。当基体负偏压在一定范围内增加时，薄膜硬度随之逐渐提高；当负偏压增加到200 V时，薄膜硬度最大；负偏压超过200 V，薄膜硬度明显下降。基体材料对薄膜硬度的影响较大，在不同基体材料上镀制同一种硬质薄膜时，薄膜硬度不同；3种基体材料上沉积薄膜的硬度数316L不锈钢基体上的薄膜硬度最低。     

多弧离子镀TiN涂层的N_2/Ar流量参数研究

利用多弧离子镀在硬质合金基体上制备TiN涂层,研究了N_2/Ar流量比对TiN涂层表面大颗粒分布与力学性能的影响。通过扫描电镜观察TiN涂层的表面形貌,并利用Image J图像处理软件对大颗粒的数量和尺寸进行了分析,通过自动划痕仪和纳米压痕仪对涂层的力学性能进行表征。结果表明:随着N2流量的增加,涂层表面沉积颗粒的最大直径和平均直径逐渐减小,涂层的附着力整体呈现增加趋势,显微硬度则先增大后减小。     

偏压参数对多弧离子镀 CrN 薄膜力学性能的影响

利用研发的多弧离子镀设备在高速钢基材上制备 CrN 薄膜,研究偏压参数对 CrN 薄膜表面形貌和力学性 能的影响。结果表明,在偏压参数幅值增加的过程中,薄膜表面大颗粒的数量和尺寸呈现先减小后增大的变化趋 势,薄膜硬度和结合力均呈现先增大后减小的变化趋势。残余应力随着偏压参数幅值的增加而逐渐增大。     

钛合金表面硬化与固体润滑处理层的电化学腐蚀行为研究

分别利用等离子氮化技术和离子束增强沉积(IBED)技术使钛合金表面获得硬质抗磨层和MoS2，MoS2-Ti固体润滑膜层。通过电化学测试技术研究了膜层和钛合金基材在含Cl^-介质中的抗蚀性能和接触腐蚀敏感性：研究结果表明：Ti与MoS2的复合改善了MoS2膜的环境适应性，MoS2—17Ti复合膜层与钛合会接触相容；IBED TiN较钛合金电化学活性低，阳极极化行为与Ti6Al4V合金相近，与钛合金基体间电偶腐蚀敏感性低；钛合金等离子氮化处理层在NaCl水溶液中无论处于自然腐蚀电位还上弱阳极极化状态，均较钛合金电化学活性低，且与钛合金基体间电偶腐蚀敏感性低。     

N2 流量对磁控溅射 TiAlN 薄膜耐腐蚀性能的影响

采用非平衡磁控溅射技术在Q235钢和单晶硅基片上制备了TiAlN薄膜,并利用场发射扫描电镜(FESEM)、纳米力学探针、划痕测试仪对薄膜的微观组织结构和力学性性能进行研究;采用盐雾试验和电化学极化测试技术研究了薄膜在含Cl-环境中的腐蚀行为与电化学特性。结果表明,随着N_2流量的升高,TiAlN薄膜的硬度和弹性模量先升高后迅速降低,当N2流量为10sccm时,薄膜具有最高的硬度和结合力,分别为30.7GPa和44.2N。盐雾试验240h后,N_2流量为10sccm时的TiAlN薄膜表面腐蚀最轻微,表现出了良好的抗盐雾腐蚀性能;电化学测试结果表明,在3.5%NaCl溶液中,N2流量为10sccm时Ti Al N薄膜腐蚀电流密度最小,仅为1.38×10~(-4)m Acm·~(-2),,约为N2流量为16sccm时薄膜的1/4,表现出优异的耐腐蚀性能。     

Formation of Nanocrystalline Structure of TaSi2 Films on Silicon

The nanocrystalline structure and mechanical properties of TaSi₂ films deposited by sputtering of TaSi₂ target have been investigated by x-ray diffraction, cross-sectional transmission electron microscopy (TEM), four-point electrical resistance measurement, and cyclic depth-sensitive nanoindentation. The purpose of this work is to study the formation of nanocrystalline structure in TaSi₂ films on a silicon substrate. As revealed, a decrease in the deposition rate leads to an increase in the O and C impurity content in the films. Contamination of the film by O and C atoms during a low-rate deposition causes the formation of an amorphous phase in the deposited films. Upon annealing, the amorphous structures crystallize into mixtures of disilicide and a small amount of polysilicide, i.e. TaSi₂ and Ta₅Si₃, respectively. After annealing at 970 K, the formation of a nanocrystalline structure with a grain size about 10 nm takes place in the film produced at a deposition rate of 0.2 nm/sec. The formation of a nanocrystalline structure changes drastically the mechanical properties of the film. The nanohardness and elastic modulus increase significantly, and the film becomes brittle and overstressed. After deposition in the film produced at the 1 nm/sec deposition rate mainly Ta disilicide and the amorphous phase are observed. After annealing, the amorphous phase near the Si substrate coexists with column-shape grains of Ta disilicide of size 150 × 500 nm. The annealed thin film becomes nonuniform in thickness. The nanohardness and elastic modulus increase.     

Electrochemical Corrosion Behavior of TiN-Coated Biomedical Ti-Cu Alloy Foam in Fluoride Containing Artificial Saliva

Highly porous Ti-Cu alloy foams were produced by powder metallurgy method for implant applications. Ti-Cu alloys were prepared with 3, 5, 7, and 10 wt pct Cu contents in order to determine optimum Cu addition. Cu addition enhances sinterability, and the Ti-Cu compacts were sintered at lower temperatures and times than pure Ti. Specimens were coated with a TiN film to enhance wear and corrosion resistance. Sintered specimens were precipitation hardened (aged) in order to increase mechanical properties. Corrosion properties of foams were examined by electrochemical techniques, such as potentiodynamic polarization, cyclic polarization, Tafel extrapolation, linear polarization resistance, and open-circuit potential measurement. Effect of Cu content, TiN coating, pH, and fluoride content of artificial saliva on electrochemical corrosion behavior of specimens was investigated.     

靶材热处理温度对磁控溅射Mo薄膜组织和性能的影响

采用磁控溅射设备和经过不同温度热处理的Mo靶材,以相同的溅射工艺参数,在Si基片上制备了Mo金属薄膜,研究了靶材的热处理温度对Mo薄膜组织和性能的影响。研究结果发现,所制备Mo薄膜均呈现（110）晶面择优取向,而靶材热处理温度的升高能够提高（110）晶面的择优取向程度。所有薄膜均为T型低温抑制生长。比较结果表明：经1 200℃热处理的Mo靶材溅射率最高（18.5 nm/min）,且其溅射膜具有较小的方阻值和较好的厚度均匀性,综合性能最优。     

氮气流量对TiN 薄膜组织结构及力学性能的影响

采用磁控溅射方法在不锈钢表面沉积TiN薄膜,通过扫描电子显微镜、显微硬度计、CSPM5500扫描探针显微镜、X射线衍射仪、往复式摩擦磨损仪等分析测试手段,研究氮气流量对薄膜形貌、成分、结构、硬度、表面粗糙度、耐磨损等性能的影响.结果表明,随着氮气流量的增加,薄膜的显微硬度、膜厚都逐渐降低,膜基结合力逐渐增加,膜基结合力在16 mL/min时达到最大67.2 N;表面粗糙度和平均摩擦系数均在8 mL/min时最低.随着氮气流量增加,薄膜主要生长取向由(200)晶面转向(111)晶面生长;TiN薄膜的颜色也随氮气流量增大而加深,8 mL/min和12 mL/min时为金黄色,4 mL/min和16 mL/min时颜色较差.      

Mechanical Properties of TiTaHfNbZr High-Entropy Alloy Coatings Deposited on NiTi Shape Memory Alloy Substrates

TiTaHfNbZr high-entropy alloy (HEA) thin films with thicknesses of about 750 and 1500 nm were deposited on NiTi substrates by RF magnetron sputtering using TiTaHfNbZr equimolar targets. The thorough experimental analysis on microstructure and mechanical properties of deposited films revealed that the TiTaHfNbZr films exhibited amorphous and cauliflower-like structure, where grain size and surface roughness increased concomitant with film thickness. More importantly, the current findings demonstrate that the TiTaHfNbZr HEA films with mechanical properties of the same order as those of the NiTi substrate constitute promising biomedical coatings effective in preventing Ni release.     

Effects of Alloy Element and Microstructure on Corrosion Resistant Property of Deposited Metals of Weathering Steel

Alloy element and microstructure are key factors that dominate mechanical and corrosion resistant properties of weathering steel.The effect of Mo on microstructure,mechanical properties and corrosion resistant property of depos-ited metal was investigated.Experimental results show that with the increase of Mo content in deposited metals,the phase transformation temperature decreases,and the ferrite zone in CCT diagram moves rightward,resulting in en-larged bainite zone and reduced ferrite and pearlite zone.The addition of 0?24 mass% Mo in deposited metal results in the increase of tensile strength,more M-A constituent and less high angle grain which reduce the low temperature toughness.It is found that Mo can raise the weathering resistance of deposited metal in industrial atmosphere.Analy-sis indicates that Mo may enrich in the inner rust layer,produce MoO3 ,enhance the formation of compact rust film and impede the anode dissolution reaction.Granular bainite in deposited metals displays better corrosion resistance than acicular ferrite during the initial corrosion stage,but its long-term influence on the corrosion resistance is limited.     

Zr-Cu薄膜生长及力学性能的分子动力学模拟

根据磁控溅射实验条件, 采用分子动力学方法, 在Si(100)面上模拟沉积了三种Zr_xCu_100-x(x=50, 70和90)合金薄膜.通过计算径向分布函数(RDF)及X射线衍射(XRD)分析了沉积薄膜的形貌结构, 并探讨了玻璃形成能力和五重局部对称性之间的关系.最后研究了沉积薄膜的力学性能, 及薄膜厚度对拉伸过程的影响.研究结果表明: Zr-Cu合金玻璃形成能力与五重局部对称性之间存在一定的相关性, 沉积玻璃薄膜比晶体薄膜表现出更好的延展性, 其中Zr₅₀Cu₅₀沉积玻璃薄膜比近共晶成分玻璃薄膜(Zr₇₀Cu₃₀)具有更大的拉伸强度; 沉积薄膜存在一定的尺寸效应, 薄膜相对厚度越小, 其拉伸强度越大.      

Magnetron Sputtered TiN Coatings Modified by Chromium,Nickel and Electroless Nickel (EN) Interlayers on Mild Steel

TiN films were deposited by reactive d.c. magnetron sputtering on mild steel substrate. Because of presence of inherent porosity and internal stresses, TiN coatings cannot be relied to give corrosion protection; also TiN coatings need a good load support. Electroplated chromium and nickel and electroless nickel (EN) were deposited by plating as interlayers below the TiN coatings to study comparatively the effect of these interlayers. Chromium was electrodeposited from conventional sulfate catalysed chromic acid bath and nickel using Watt's bath while EN by electroless deposition process using acidic hypophosphite bath. Three different thicknesses viz. 2, 4 and 10 μm of interlayers were employed to study their influence on TiN coatings. The corrosion behaviour of TiN coated mild steel samples with and without the interlayers was studied using potentiodynamic measurement technique in deaerated IN H₂SO₄ electrolyte. It was observed that TiN coatings on mild steel without any interlayer almost mimic the behaviour of the substrate, while the presence of any of the three interlayers showed a considerable improvement in the corrosion resistance.     

Y2O3对NiCr-Cr3C2金属陶瓷涂层热腐蚀性能影响行为研究

本文利用超音速火焰喷涂技术(HVOF),在20G钢表面制备了掺杂1wt.%、3wt.%、5wt.%三种不同含量Y2O3的NiCr-Cr3C2金属陶瓷复合涂层,并探究了其在650℃,Na2SO4/K2SO4熔盐环境中的热腐蚀性能。利用扫描电镜(SEM)、显微硬度计、拉伸试验机等对涂层的微观结构和力学性能进行了表征,利用X射线衍射仪(XRD)、拉曼光谱、X射线能谱仪(EDS)对复合涂层热腐蚀产物形貌、物相进行分析。结果表明掺杂1wt.%Y2O3的NiCr-Cr3C2复合涂层结构致密、孔隙率低、结合强度高,显微硬度达到801HV。热腐蚀过程中掺杂Y2O3的NiCr-Cr3C2复合涂层表面均生成耐蚀性良好且致密的Cr2O3膜。随着Y2O3掺杂量的增加,涂层的耐热腐蚀性能先升高后下降,当Y2O3掺杂量为1wt.%时,复合涂层表现出最佳的耐热腐蚀性能。     

Effect of novel surface treatment on corrosion behavior and mechanical properties of a titanium alloy

A new surface treatment process is presented that improves the properties of Ti-6 Al-4 V alloy.This process is based on thermal oxidation, in which the surface properties of the titanium alloy are improved via simultaneous nitriding and oxidation.The test results indicate that the resulting surface layer consists of TiO_2 and TiN.The sample with the best mechanical properties and corrosion resistance was sintered at a temperature of 800 ℃.     

316L不锈钢表面沉积CrCN薄膜的结构及性能研究

利用多弧离子镀技术在316L不锈钢和单晶硅上沉积CrCN薄膜,通过X射线衍射仪(XRD)、扫描电镜(SEM)、X射线光电子能谱仪(XPS)、纳米压痕仪、273A电化学工作站和多功能摩擦磨损试验机等对316L不锈钢及CrCN薄膜的微观结构、力学性能、耐腐蚀性能和摩擦学性能进行表征.结果表明:在316L不锈钢上沉积CrCN薄膜后,硬度从4 GPa提高到22 GPa,H/E和H3/E2分别从0.022和0.002 GPa提高到0.071和0.11 GPa;阳极腐蚀电位从-0.21 V上升到-0.19 V;在大气,去离子水,海水环境下的摩擦系数及磨损率均显著降低,表现出较优异的综合性能.     

Ultraviolet-shielding and conductive double functional films coated on glass substrates by sol-gel process

Ultraviolet-shielding and conductive double functional films were composed of CeO2-TiO2 film and SnO2:Sb film deposited on glass substrates using sol-gel process.Ce(NO3)3·6H2O and Ti(C4H9O4),SnCl4 and SbCl3 were used as precursors of the two different functional films respectively.The CeO2-TiO2 films were deposited on glass substrates by sol-gel dip coating method,and then the SnO2:Sb films with different thickness were deposited on the pre-coated CeO2-TiO2 thin film glass substrates,finally,the substrates coated with double functional films were annealed at different temperatures.The optical and electrical properties of the CeO2-TiO2 films and the double films were measured by UV-Vis spectrometer and four probe resistance measuring instrument.The crystal structures and surface morphology of the films were characterized using XRD and optical microscope,respectively.The obtained results show that the ultraviolet-shielding rate of the glass substrates with CeO2-TiO2 films is not less than 90%,and transmittance in visible lights can reach 65%.With the thickness of the SnO2:Sb film increasing,its conductivity became better,and the surface resistance is about 260 Ω/ when the SnO2:Sb films were deposited 11 cycles of the dip on the pre-coated CeO2-TiO2 glass.The ultraviolet-shielding rate of the glass substrates with double functional films is higher than 97%,and the peak transmittance in the visible lights is 72%.Additionally,with increasing the heat treatment time,the Na+ of the glass substrates diffuses into the films,resulting in the particle size of SnO2 crystal smaller.     

FeCrVTa0.4W0.4高熵合金氮化物薄膜的微观结构与性能

实验利用单靶射频磁控溅射技术,在单晶硅基底上,制备了两个系列FeCrVTa_0.4W_0.4高熵合金氮化物薄膜,即FeCrVTa_0.4W_0.4氮化物成分梯度多层薄膜和(FeCrVTa_0.4W_0.4)N_x单层薄膜,其中,多层薄膜用于太阳光谱选择性吸收薄膜。通过扫描电子显微镜(SEM)、X射线衍射仪(XRD)、纳米力学探针、原子力显微镜(AFM)、紫外?可见分光光度计、接触角测量仪和四探针测试台对FeCrVTa_0.4W_0.4高熵合金氮化物薄膜进行微观结构分析以及性能表征。结果表明:在不通入氮气时,薄膜为非晶结构,当氮气含量升高后,转变为面心立方固溶体结构;当表层氮气流量为15 mL·min?1时,FeCrVTa_0.4W_0.4氮化物多层薄膜及单层薄膜均具有最佳的力学性能,其中,多层薄膜的硬度为22.05 GPa,模量为287.4 GPa,单层薄膜的硬度为22.8 GPa,模量为280.7 GPa,随着表层氮气含量的继续增加,力学性能下降;FeCrVTa_0.4W_0.4氮化物成分梯度多层薄膜在300～800 nm波长范围内均具有太阳光谱选择吸收性,当氮化物薄膜层数较少时具有较好的疏水性;(FeCrVTa_0.4W_0.4)N_x单层薄膜随着氮气含量的增加,薄膜方块电阻增加。      

Si含量对316H钢耐铅铋腐蚀性能的影响

316H钢具有较好的高温力学性能和耐腐蚀性能,是铅铋快堆主要候选结构材料.Si元素的加入会提升材料在铅铋中的耐蚀性,同时也会对组织产生影响.通过向316H钢中加入不同含量的Si元素,采用OM、SEM、XRD进行组织分析,对不同Si含量试验钢在550℃氧控的铅铋环境下进行动态腐蚀性能研究.结果表明,Si元素可有效提升31...     

Magnetron Sputtered TiN Coatings Modified by Chromium,Nickel and Electroless Nickel (EN) Interlayers on Mild Steel

Abstract

TiN films were deposited by reactive d.c. magnetron sputtering on mild steel substrate. Because of presence of inherent porosity and internal stresses, TiN coatings cannot be relied to give corrosion protection; also TiN coatings need a good load support. Electroplated chromium and nickel and electroless nickel (EN) were deposited by plating as interlayers below the TiN coatings to study comparatively the effect of these interlayers. Chromium was electrodeposited from conventional sulfate catalysed chromic acid bath and nickel using Watt's bath while EN by electroless deposition process using acidic hypophosphite bath. Three different thicknesses viz. 2. 4 and 10 μm of interlayers were employed to study their influence on TiN coatings. The corrosion behaviour of TiN coated mild steel samples with and without the interlayers was studied using potemiodynamic measurement technique in deaerated IN H₂SO₄ electrolyte. It was observed that TiN coatings on mild steel without any interlayer almost mimic the behaviour of the substrate, while the presence of any of the three interlayers showed a considerable improvement in the corrosion resistance.

Microhardness measurements have shown that the surface hardness values of TiN coatings on mild steel increased to 1907 HK₂₅ from about 1000 HK₂₅ when employed with chromium interlayer. and to 1484 HK₂₅ with EN interlayer, while electroplated nickel as an interlayer increased the hardness to a lesser extent (1289 HK₂₅).

X-ray diffraction analysis has shown that the phases present in the TiN coatings were mainly TiN (200) and TiN (111). Chromium coated samples were found to show the broadening of Fe (110) peak, which also corresponds to Cr (110) peak. Interlayer nickel showed the presence of mainly Ni (200) and Ni (111) phases while EN was amorphous in structure. The crystalline phases Ni₃P and Ni were evident when TiN top-coat was given by d.c. magnetron sputtering on EN plated mild steel samples.