Photocatalytic oxidation of 2-propanol under visible light irradiation on TiO<Subscript>2</Subscript> thin films prepared by an RF magnetron sputtering deposition method

Visible light-responsive TiO₂ (Vis-TiO₂) thin films able to absorb UV and visible light in wavelength regions of 250–600 nm were successfully developed by applying a radio-frequency magnetron sputtering deposition method. These Vis-TiO₂ thin films exhibited high activity for the photocatalytic oxidation of 2-propanol diluted in water even under visible light irradiation (λ ≥ 450 nm). The photocatalytic activity of Vis-TiO₂ thin films was dramatically enhanced by the deposition of Pt particles on the surface. Secondary ion mass spectrometry measurements revealed that Pt particles are distributed from the top surface to the deep bulk of Vis-TiO₂ thin films with a columnar structure. The unique columnar structure of Vis-TiO₂ thin films plays an important role in the high photocatalytic performance.     

Preparation of the visible light responsive TiO2 thin film photocatalysts by the RF magnetron sputtering deposition method

TiO₂ thin film photocatalysts which could induce photoreactions under visible light irradiation were successfully developed in a single process by applying an ion engineering technique, i.e., the radio frequency (RF) magnetron sputtering deposition method. The TiO₂ thin films prepared at temperatures greater than 773 K showed the efficient absorption of visible light; on the other hand, the TiO₂ thin films prepared at around 573 K were highly transparent. This clearly means that the optical properties of TiO₂ thin films, which absorb not only UV but also visible light, can be controlled by the preparation temperatures of the RF magnetron sputtering deposition method. These visible light responsive TiO₂ thin films were found to exhibit effective photocatalytic reactivity under visible light irradiation (λ > 450 nm) at 275 K for the reductive decomposition of NO into N₂ and N₂O. From various characterizations, the orderly aligned columnar TiO₂ crystals could be observed only for the visible light responsive TiO₂ thin films. This unique structural factor is expected to modify the electronic properties of a TiO₂ semiconductor, enabling the efficient absorption of visible light.     

低温静电自组装法制备贵金属修饰TiO_2纳米结构薄膜及其增强的光催化性能(英文)

以碱-水热法在金属Ti片上原位生长了TiO2纳米结构(纳米花和纳米线)薄膜,并采用低温静电自组装方法将超细贵金属(金、铂、钯)纳米颗粒均匀沉积于多孔TiO2薄膜上.负载于Ti片上的贵金属/TiO2纳米结构薄膜具有一体化结构、多孔架构和高光催化活性.超高分辨率场发射扫描电子显微镜(FESEM)直接观察表明贵金属纳米颗粒在TiO2表面分布均匀,且颗粒之间相互分离,金、铂、钯纳米颗粒的平均粒径分别约为4.0、2.0和10.0nm.俄歇电子能谱(AES)纵深成分分析表明贵金属不仅沉积于薄膜表面,且大量分布于TiO2纳米结构薄膜内部,其深度超过580 nm.X射线光电子能谱(XPS)分析表明,经300°C下在空气中热处理后,纳米金仍保持金属态,纳米铂部分被氧化成PtOabs,而钯粒子则完全被氧化成氧化钯(PdO).以低温静电自组装法沉积贵金属,贵金属负载量可通过调节组装时间与溶胶pH值来控制.光催化降解甲基橙的结果表明,沉积的纳米金和铂能显著增加TiO2纳米结构薄膜的光催化活性,说明金和铂粒子可促进光生载流子的分离;但负载的PdO对TiO2薄膜的光催化性能增强几乎无作用.     

Influence of High-energy electron-beam on photocatalytic activity of TiO2 films on carbon-fiber deposited by atomic layer deposition

High-energy electron-beam with energy of 1 MeV was used for modifying surface structure of TiO₂ thin films on carbon fiber prepared by using atomic layer deposition under atmospheric pressure. TiO₂ nanoparticles (∼20 nm) on carbon fiber underwent structural modification of the surface upon electron-beam treatment, resulting in enhanced photocatalytic activity. In contrast, a thicker film of TiO₂ did not show such changes in surface structure and photocatalytic activity by electron-beam treatment. We demonstrate that electron-beam can be used for modifying surface structure of photocatalysts consisting of nanoparticles for improvement of their activity.     

Superior Photostability and Photocatalytic Activity of ZnO Nanoparticles Coated with Ultrathin TiO2 Layers through Atomic‐Layer Deposition

Atomic‐layer deposition (ALD) is a thin‐film growth technology that allows for conformal growth of thin films with atomic‐level control over their thickness. Although ALD is successful in the semiconductor manufacturing industry, its feasibility for nanoparticle coating has been less explored. Herein, the ALD coating of TiO₂ layers on ZnO nanoparticles by employing a specialized rotary reactor is demonstrated. The photocatalytic activity and photostability of ZnO nanoparticles coated with TiO₂ layers by ALD and chemical methods were examined by the photodegradation of Rhodamine B dye under UV irradiation. Even though the photocatalytic activity of the presynthesized ZnO nanoparticles is higher than that of commercial P25 TiO₂ nanoparticles, their activity tends to decline due to severe photocorrosion. The chemically synthesized TiO₂ coating layer on ZnO resulted in severely declined photoactivity despite the improved photostability. However, ultrathin and conformal ALD TiO₂ coatings (≈0.75–1.5 nm) on ZnO improved its photostability without degradation of photocatalytic activity. Surprisingly, the photostability is comparable to that of pure TiO₂, and the photocatalytic activity to that of pure ZnO.     

Preparation of TiO2 Thin Film Photocatalysts by Dip Coating Using a Highly Viscous Solvent

TiO₂ thin film photocatalysts coated onto soda lime glass were prepared by a dip coating process using a highly viscous solvent. The source of the TiO₂ was tetraisopropyl orthotitanate, and -terpineol was used as the solvent. Two types of thin film preparation procedures based on dip coating (a sol-gel system and thermal decomposition system) were used to prepare the samples. TiO₂ thin films were obtained after calcination at 450°C for 1 hour. The film thickness obtained with a single dipping was proportional to the viscosity of the dip coating solutions. The obtained thin films were transparent with a thickness of 1 m. The crystal form of the obtained photocatalyst films was anatase alone. The thin films were formed with aggregated nano-sized TiO₂ single crystals (7–15 nm). The photocatalytic activity of the TiO₂ thin films, as evaluated by the photooxidation of NO (1 ppm) in dry air, was as high as our previous TiO₂ thin films prepared by the sol-gel method.     

Ion engineering techniques for the preparation of the highly effective TiO<Subscript>2</Subscript> photocatalysts operating under visible light irradiation

The successful application of ion engineering techniques for the development of TiO₂ photocatalysts operating under visible and/or solar light irradiations has been summarized in this review article. First, we have physically doped various transition metal ions within a TiO₂ lattice on an atomic level by using an advanced metal ion implantation method. The metal ion implanted TiO₂ could efficiently work as a photocatalyst under visible light irradiation. Some field tests under solar light irradiation clearly revealed that the Cr or V ions implanted TiO₂ samples showed 2–3 times higher photocatalytic reactivity than the un-implanted TiO₂. Second, we have developed the visible light responsive TiO₂ thin film photocatalyst by a single process using an RF-magnetron sputtering (RF-MS) deposition method. The vis-type TiO₂ thin films showed high photocatalytic reactivity for various reactions such as reduction of NOx, degradation of organic compounds, and splitting of H₂O under visible and/or solar light irradiations.     

总气压与Ar/O2流量比对直流对向靶磁控溅射TiO2薄膜光催化性能的影响

采用对向靶磁控溅射法在不同气压和Ar/O₂流量比条件下, 以氟化SnO₂ (FTO)导电玻璃为基底制备了多晶TiO₂薄膜. 台阶仪测量结果显示所制备TiO₂薄膜的平均厚度约为200 nm. 随着溅射气压的升高, TiO₂薄膜由锐钛矿与金红石混晶结构转变为纯锐钛矿结构. 分别采用场发射扫描电镜(FESEM)和原子力显微镜(AFM)分析了不同气压和Ar/O₂流量比对TiO₂薄膜表面形貌的影响, 结果显示TiO₂薄膜的表面粗糙度随溅射总气压和Ar/O₂流量比的增加而增大. 以初始浓度为100×10^-6 (体积分数)的异丙醇(IPA)气体为目标物检测所制备TiO₂薄膜的光催化性能, 并分析该气相光催化反应的机理, 在紫外照射条件下异丙醇先氧化为丙酮再被氧化为CO₂.当总溅射气压为2.0 Pa、Ar/O₂流量比为1:1时, 溅射所得TiO₂薄膜具备最优光催化活性并可在IPA降解反应中保持较高的催化活性和稳定性.     

Effect of dopant concentration on photocatalytic activity of TiO2 film doped by Mn non-uniformly

The thin films of TiO₂ doped by Mn non-uniformly were prepared by sol-gel method under process control. In our preceding study, we investigated in detail, the effect of doping mode on the photocatalytic activity of TiO₂ films showing that Mn non-uniform doping can greatly enhance the activity. In this study we looked at the effect of doping concentration on the photocatalytic activity of the TiO₂ films. In this paper, the thin films were characterized by UV-vis spectrophotometer and electrochemical workstation. The activity of the photocatalyst was also evaluated by photocatalytic degradation rate of aqueous methyl orange under UV radiation. The results illustrate that the TiO₂ thin film doped by Mn non-uniformly at the optimal dopant concentration (0.7 at %) is of the highest activity, and on the contrary, the activity of those doped uniformly is decreased. As a comparison, in 80 min, the degradation rate of methyl orange is 62 %, 12 % and 34 % for Mn non-uniform doping film (0.7 at %), the uniform doping film (0.7 at %) and pure titanium dioxide film, respectively. We have seen that, for the doping and the pure TiO₂ films, the stronger signals of open circuit potential and transient photocurrent, the better photocatalytic activity. We also discusse the effect of dopant concentration on the photocatalytic activity of the TiO₂ films in terms of effective separation of the photon-generated carriers in the semiconductor.     

Modification of photocatalytic TiO2 thin films by electron beam irradiation

Noble metal-modified TiO₂ films were prepared by electron beam deposition of Pt, Pd, Au and Ag on the surface of TiO₂ films with diameters ranging from <1 nm to 500 nm. The morphology of the films was characterized by X-ray diffractometry (XRD), field emission scanning electron microscope (FMSEM) and transmission electron microscope (TEM). The photocatalytic capability of the films were tested and compared by degradation of methyl orange (MO) in aqueous solutions under both UV and visible light illumination.     

Photocatalytic activity of visible light-responsive TiO<Subscript>2</Subscript> thin films deposited on various anodized Ti-metal substrates by a RF magnetron sputtering method

Visible light-responsive TiO₂ (Vis-TiO₂) thin film has been deposited on two different kinds of anodized Ti-metal substrates, i.e., plate-type Titanystar (P-Titanystar) or non-woven fabric Titanystar (N-Titanystar) by a radio-frequency magnetron sputtering (RF-MS) method. These Vis-TiO₂ thin film photocatalysts (Vis-TiO₂/P-Titanystar and Vis-TiO₂/N-Titanystar) showed high activity for the oxidation of 2-propanol in water under UV light irradiation while Vis-TiO₂/N-Titanystar showed higher activity than Vis-TiO₂/P-Titanystar. Furthermore, photocatalytic activity of Vis-TiO₂/N-Titanystar was enhanced by the Pt deposition by an RF-MS deposition method. Pt loaded Vis-TiO₂/N-Titanystar (Pt-Vis-TiO₂/N-Titanystar) acted as an efficient photocatalyst for the oxidation of methanol vapor under UV light irradiation even in a flow system. Moreover, it was found that Pt-Vis-TiO₂/N-Titanystar is an effective photocatalyst for the oxidation of various organic compounds in gas phase or ammonia gas even under visible light irradiation (λ > 420 nm) at 293 K.     

Studies on photocatalytic activity of Ag/TiO2 films

Ag/TiO₂ photocatalytic films were produced by hybrid sol-gel method. The photocatalytic degradation of methyl orange (MO) in aqueous solution under 365 nm irradiation on TiO₂ and Ag/TiO₂ thin films was investigated. The state and amount of Ag species within the film and the enhancement mechanism of photocatalytic activity of Ag/TiO₂ were discussed. With a loading molar ratio of Ag/Ti = 0.135 in TiO₂ film, the maximum catalytic efficiency was observed. __________ Translated from Journal of Beijing Normal University (Natural Sciences), 2005, 41(6) (in Chinese)     

TiO2纳米管阵列覆盖Si薄膜光催化还原CO2性能的研究

本工作采用CVD法在阳极氧化TiO2纳米管阵列膜表面沉积一层非晶Si膜,通过退火后得到晶化了的Si膜/TiO2纳米管阵列的复合结构,并初步就其光催化还原CO2制备碳氢化合物的活性进行研究。拉曼光谱(Raman)、X射线衍射(XRD)、场发射扫描电镜(FE-SEM)、高分辨透射电子显微镜(TEM)等微结构表征结果表明所制备的TiO2纳米管阵列的厚度为270 nm左右,管直径约为70 nm,管壁厚度约为16 nm。覆盖的Si膜已晶化,其厚度约为300 nm。通过高效液相色谱(HPLC)及总有机碳(TOC)来检测光催化还原液相产物中的甲酸及总有机碳含量,发现负载Si膜后的TiO2纳米管阵列光催化性能有所提高,在装有400cut滤光片氙灯照射2 h下TOC含量从21.2 mg.L-1增长到29.5 mg.L-1,表明Si与TiO2的复合可有效的提高光催化还原CO2的活性,这可能与该异质结结构可增加对光的吸收并且可降低光生空穴-电子对复合有关。光催化循环实验表明所制得的催化剂在循环5次后仍可保持91.6%的催化活性。     

A Dewetted‐Dealloyed Nanoporous Pt Co‐Catalyst Formed on TiO2 Nanotube Arrays Leads to Strongly Enhanced Photocatalytic H2 Production

Pt nanoparticles are typically decorated as co‐catalyst on semiconductors to enhance the photocatalytic performance. Due to the low abundance and high cost of Pt, reaching a high activity with minimized co‐catalyst loadings is a key challenge in the field. We explore a dewetting‐dealloying strategy to fabricate on TiO₂ nanotubes nanoporous Pt nanoparticles, aiming at improving the co‐catalyst mass activity for H₂ generation. For this, we sputter first Pt‐Ni bi‐layers of controllable thickness (nm range) on highly ordered TiO₂ nanotube arrays, and then induce dewetting‐alloying of the Pt‐Ni bi‐layers by a suitable annealing step in a reducing atmosphere: the thermal treatment causes the Pt and Ni films to agglomerate and at the same time mix with each other, forming on the TiO₂ nanotube surface metal islands of a mixed PtNi composition. In a subsequent step we perform chemical dealloying of Ni that is selectively etched out from the bimetallic dewetted islands, leaving behind nanoporous Pt decorations. Under optimized conditions, the nanoporous Pt‐decorated TiO₂ structures show a>6 times higher photocatalytic H₂ generation activity compared to structures modified with a comparable loading of dewetted, non‐porous Pt. We ascribe this beneficial effect to the nanoporous nature of the dealloyed Pt co‐catalyst, which provides an increased surface‐to‐volume ratio and thus a more efficient electron transfer and a higher density of active sites at the co‐catalyst surface for H₂ evolution.     

Surface properties and photocatalytic activity of nanocrystalline titania films

In this work the efficiency and physicochemical details of a thin film produced by help of a microwave assisted sol gel technique is compared to different commercial powders (Degussa P25 and Hombikat UV100) deposited on glass substrates. Furthermore, a supercritical produced TiO₂ powder (SC 134) was included in the comparison.The prepared TiO₂ films were characterized using XRD, XPS, AFM, DSC and DLS. The photocatalytic activity was determined using stearic acid as a model compound. Investigation of the prepared films showed that the Degussa P25 film and the sol–gel film were the most photocatalytic active films. The activity of the films was found to be related to the crystallinity of the TiO₂ film and the amount of surface area and surface hydroxyl groups. Based on the XPS investigation of the films before and after UV irradiation it was suggested that the photocatalytic destruction of organic matter on TiO₂ films proceeds partly through formation of hydroxyl radicals which are formed from surface hydroxyl groups created by interactions between adsorbed water and vacancies on the TiO₂ surface. Furthermore a correlation between the amount of OH groups on the surface of the different TiO₂ films and the photocatalytic activity was found.     

The influence of film thickness and process temperature on <Emphasis Type="Italic">c</Emphasis>-axis orientation of Bi<Subscript>3</Subscript>TiTaO<Subscript>9</Subscript> thin films

Bi-layered ferroelectric Bi₃TiTaO₉ (BTT) thin films with different thickness (ranging from 100 to 400 nm) were successfully fabricated on Pt(111)/TiO₂/SiO₂/(100)Si substrates using chemical solution deposition (CSD) technique at different annealing temperatures. The c-axis orientation of the films was affected by film thickness and process temperature. The thinner the film and the higher the process temperature, the higher the c-axis orientation. With the increase of film thickness, the stress decreased but the film roughness increased, which led to the decrease of c-axis orientation of films. BTT films annealed at 800°C were found to have much improved remament polarization (P _r ) than that of films annealed at 650 and 750°C. The P _r and coercive field (E _c ) values were measured to be 2 μC/cm² and 100 kV/cm, respectively. BTT films showed well-defined ferroelectric properties with grain size larger than 100 nm.     

Synthesis and Photocatalytic Property of ZnO/TiO2 Inverse Opals Films with Controllable Composition and Topology

A novel method to fabricate composition- and topology-controlled ZnO/TiO₂ inverse opals (IO) films using a positive sacrificial ZnO IO template has been developed. This method includes a two-step process, preparation of ZnO IO by a simple electrochemical deposition using a self-assembly polystyrene colloidal crystal template and preparation of ZnO/TiO₂ IO by a liquid phase deposition (LPD) process at room temperature. The composition and topology of ZnO/TiO₂ IO can be easily controlled by changing the duration of the LPD. After 20 min LPD process, a ZnO/TiO2 composite IO with non-close-packed face-centered cubic air sphere array was obtained. Prolonging the duration to 60 min, a pure TiO₂ IO (TIO-LPD60) with obviously thickened walls was formed. The formation mechanism for the compositional and topological variation was discussed. A preliminary study on UV photocatalytic property of the samples for degradation of methylene blue reveals that the composition and topology significantly influenced the photocatalytic activity of the IO film. The ZnO/TiO₂ composite IO demonstrates a higher degree of activity than both pure ZnO and pure TiO₂ IO, although they have a similar IO wall thickness. Moreover, with increasing IO wall thickness from ～52 nm to ～90 nm, TIO-LPD60 exhibits the highest level of photocatalytic performance.     

Effect of substrate on phase formation and surface morphology of sol-gel lead-free KNbO3, NaNbO3, and K0.5Na0.5NbO3 thin films

Environmentally acceptable lead-free ferroelectric KNbO₃ (KN) or NaNbO₃ (NN) and K_0.5Na_0.5NbO₃ (KNN) thin films were prepared using a modified sol-gel method by mixing potassium acetate or sodium acetate or both with the Nb-tartrate complex, deposited on the Pt/Al₂O₃ and Pt/SiO₂/Si substrates by a spin-coating method and sintered at 650°C. X-ray diffraction (XRD) analysis indicated that the NN and KNN films on the Pt/SiO₂/Si substrate possessed a single perovskite phase, while NN and KNN films on the Pt/Al₂O₃ substrate contained a small amount of secondary pyrochlore phase, as did KN films on both substrates. Scanning electron microscopic (SEM) and atomic force microscopic (AFM) analyses confirmed that roughness R _q of the thin KNN/Pt/SiO₂/Si film (?? 7.4 nm) was significantly lower than that of the KNN/Pt/Al₂O₃ film (?? 15 nm). The heterogeneous microstructure composed of small spherical and larger needle-like or cuboidal particles were observed in the KN and NN films on both substrates. The homogeneous microstructure of the KNN thin film on the Pt/SiO₂/Si substrate was smoother and contained finer spherical particles (?? 50 nm) than on Pt/Al₂O₃ substrates (?? 100 nm). The effect of different substrates on the surface morphology of thin films was confirmed.     

Ni控制掺杂TiO2薄膜的光电化学及光催化活性

采用溶胶-凝胶法通过分步控制工艺制备了镍离子不同掺杂方式的TiO₂薄膜。通过甲基橙的光催化降解动力学来表征其光催化活性。结果表明：镍离子非均匀掺杂在掺杂量0.5%时可以明显增强TiO₂的光催化活性，而均匀掺杂提高TiO₂的光催化活性较小。光电化学表征结果显示：镍离子非均匀掺杂TiO₂薄膜的瞬时光电流信号较强，说明其光生载流子易于生成且分离效果较好；循环伏安曲线表明，光照时Ni非均匀掺杂的TiO₂薄膜改变了体系的氧化还原电位，说明了薄膜内建电场的建立。基于半导体的P-N结原理探讨了镍离子非均匀掺杂TiO₂薄膜的光催化活性机理。     

Degradation of C<Emphasis Type="Italic">andida albicans</Emphasis> on TiO<Subscript>2</Subscript> and Ag-TiO<Subscript>2</Subscript> thin films prepared by sol–gel and nanosuspensions

In this study, both suspensions and thin films of TiO₂ and silver loaded TiO₂ (Ag-TiO₂) were used in the photocatalytic degradation/disinfection of C. albicans. In the case of thin films coated materials, both microscope slides and steel pieces of similar dimensions were dip coated using sol–gel solutions prepared from titanium isopropoxide. Surface analysis of the materials confirmed that thin film formation had been succesful. After set periods of irradiation in the presence of suspension or thin film coated material, 10 μL aliquots of the solution were withdrawn and directly cultivated on sabouraud dextrose agar for 24 h at 37 °C. The number of living colonies was counted. The results show that both the suspensions and the thin films displayed superior antimicrobial properties towards C. albicans. In particular the Ag-TiO₂ catalyst was extremely active even in the dark, for disinfection of C. albicans. The degradation percentage over TiO₂ and Ag-TiO₂ thin films coated on the steel substrate was higher than those coated on glass achieving 80 and 97.9%, respectively, using the 365 nm, near visible region light source.