Gd2O3:Yb3+,Er3+纳米粉体的水热合成及上转换发光研究

采用Gd₂O₃,Yb₂O₃,Er₂O₃,HNO₃,CO(NH₂)₂和C ₁₂H₂₅SO₄Na为实验原料,通过水热法合成了纳米Gd₂O₃:Yb³⁺,Er ³⁺上转换发光粉体。通过X射线衍射(XRD )、差示扫描量热 -热重分析(DSC-TGA )、傅里叶变换红外光谱(FT-IR ) 、透射电子显微镜(TEM )和 上转换发射光谱(UCL )等对样品进行表征。研究结果表明:CO(NH₂)₂与Gd ³⁺ 离子的摩尔比m影响前驱体的组成,当m=4时,前驱体是由晶态的 Gd₂(CO₃)₃·xH₂O构成。该 前驱体在空气气氛下800℃煅烧2h可获得单相的Gd₂O₃纳米粉体 ,粉体呈近球状,平均粒 径约为30～40nm。上转换发光光谱表明,在980nm波长红外光激发下,Gd₂O₃:Yb³⁺,Er³⁺的主发射峰 位于664nm波长处,呈红光发射,对应于Er³⁺的 ⁴F9/2→⁴I15/2跃迁。在波长为539 nm和562nm附近呈现绿光发射,分别对应于Er³⁺的²H11/2→⁴I15/2和⁴S3/2→⁴I15/2跃迁。Er³⁺的猝 灭浓度为1%。800℃煅烧合成的Gd₂O₃:Yb³⁺,Er³⁺ 纳米粉体的上转换发光机制为双光子模型, 而1200℃煅烧合成的Gd₂O₃:Yb³⁺,E r³⁺纳米粉体的上转换发光机制则为三光子模型。     

新型红色荧光粉Ca0.5Sr0.5MoO4:Sm3+的制备及光学性能

为了得到发光效率较好的长波长红色荧光粉,采用 高温固相法成功地合成了适合紫外激发的红色荧光粉 Ca0.5－xSr0.5MoO₄:xSm³⁺,研究了其晶体结构和发 光性质。X射线衍射(XRD)测量结果显示,制备的样品为纯相Ca0.5Sr0.5MoO₄晶体。其激发 光谱包括一个宽带峰和一系列尖峰,通过不同波长激发的发射谱和与Ca0. 5－xSr0.5MoO₄:xEu³⁺的发射 谱比较分析得出激 发宽带为最有效激发带,归属于Mo⁶⁺－O2－的电荷迁移跃迁。在275nm的激发 下,发射峰由峰值为564nm(⁴G5/2→⁶H 5/2)、 606nm(4G5/2→⁶H7/2) 、647nm (⁴G5/2→⁶H9/2)、707nm(4G5/2→⁶H11/2)的4个峰组成,最大发射 峰位于647nm处,呈现红光 发射。Sm³⁺掺杂高于6%时Ca0.5－xSr0.5Mo O₄:xSm³⁺出现浓度猝灭,分析表明,其猝灭机 理是最邻近离子间的能量传递。同时,添加电荷补偿剂可增强材料的发射强度,以添加Na +的效果最明显。     

热处理对掺Er3+碲酸盐玻璃近红外发光性能的影响

采用高温熔融冷却法和原位受控析晶法,制备了两 种Er³⁺掺杂碲酸盐玻璃及微晶玻璃。对比研究了其析晶 性能及近红外发光性能;计算了Er³⁺在玻璃与微晶玻璃中的J-O强度参数、自发辐射 概率、荧光分支比和 荧光辐射寿命;在980nm波长泵浦源下测量样品的荧光光谱,计算荧 光有效线宽、峰值受激发射截面。结果发现, 采用合理的析晶热处理制度,可以获得透明度高的Er³⁺掺杂碲酸盐微晶玻璃;析 晶热处理能够有效地提高 Er³⁺在近红外波段的发光效率和拓宽其有效发光带宽;Er³⁺掺杂85TeO₂- 10TiO₂-5La₂O₃(TTL)碲酸盐微晶玻璃较78TeO₂-17ZnF₂-5Bi₂O₃(TZBF)碲酸盐微晶玻璃在1.55μm波段增益性能更好,有望在光纤放 大器中得到应用。     

YPO4:Dy3+,Eu3+荧光粉的水热合成及白光发射

采用水热法,合成了YPO₄:xDy³⁺,0.06Eu³⁺系列荧光粉。通过X射线衍射(XRD )、扫 描电子显微镜(SEM)、电子散射能谱(EDS)、光致发光(PL)谱和长余辉光谱,分别对样品的物 相、结构和PL进行了表征。 XRD检测表明,合成的样品属四方晶系;荧光光谱测试表明,在234nm紫外光激发下, YPO₄:xDy³⁺,0.06Eu³⁺的 发射光谱呈现Eu3+ 的⁵D₀→⁷F₁(592nm,橙光)和 ⁵D₀→ ⁷F₂(618nm,红光) 的发光峰;而在354nm的激发波长下,YPO₄:0.06Dy³⁺,0.06Eu³⁺的发射光谱 呈现Dy³⁺的4F9/2→⁶H15/2(486nm、蓝 光)和⁴F9/2→⁶H13/2(575nm、黄光)的发光 峰,以及Eu³⁺的⁵D₀→⁷F₁(592nm、 橙光)和⁵D₀→⁷F₂(619nm、红光 )的发光峰。对荧光 衰减谱的双参数拟合证实了Dy³⁺→Eu³⁺能量 传递的存在。色坐标图显示,在234nm紫外光激发下,YPO₄:0.05Dy ³⁺,0.06Eu3+ 是很好的近紫外光激发下的白色荧光粉。     

W6+对钼酸锶钙红色荧光粉发光性能的影响

采用高温固相法,制备了一系列以Ca0.7Sr 0.3Mo O₄作为复合材料基质,以Eu³⁺为激活剂的混合钨钼酸盐红色荧光粉Ca0.7Sr 0.3Mo1－xWxO₄:Eu ³⁺,并通过测试荧光粉的激发光 谱,发射光谱和XRD对荧光粉的物相结构和发光性能进行了研究。实验结果表明, 掺杂W⁶⁺的Ca0.7Sr0.3Mo1－xWxO₄:Eu³⁺红色荧光粉的亮度得到提高,且其最佳掺杂浓度为 20%。 当W⁶⁺的掺杂浓度为20%时,Ca0.7Sr0.18Mo0.8W0.2O₄:0.08Eu³⁺样品的衍射峰与CaMoO₄(29-0351)标准卡片的衍射峰基本吻合。适当的加入电荷补偿剂Li ₂CO₃、Na₂CO₃、K₂CO₃可以提高Ca0.7Sr0.18Mo0.8W0.2O₄:0.08Eu³⁺荧光粉亮度,最终结果表明当Li⁺的掺杂浓度为2% 时荧光粉的发光效果最好。色坐标分析结果表明:所制备的荧光粉的色坐标达到了国家标准 , 比商用的Y₂O₃:Eu³⁺红色荧光材料更接近于标准红色色坐标,具备成为商业化红 色荧光粉的潜力。     

新型近红外超长余辉材料Zn3Ga4GexO9+2x:1%Cr3+的制备与发光性能研究

采用高温固相反应法制备了Zn₃Ga3.99Ge xO9+2x:1%Cr³⁺(x=1,2,3,4,5)新型近红外长余辉荧光粉, 利用X射线衍射(XRD)和荧光(PL)光谱分别对其晶体结构、PL性质和余辉性能进行了分析。结 果表明,Zn₃Ga3.99Cr0.01GexO9+2x实际上是Cr³⁺和Ge⁴⁺共同取代了ZnGa₂O₄尖晶石 结构中的部分Ga³⁺而形成的固溶体; 样品可以被近紫外光和蓝绿光有效地激发,发射出640nm波长范围的红光和近红外光,峰值位于695nm波长 附近,属于Cr³⁺的特征发射,对应于²E→⁴A₂的跃迁;余辉持续时间均超过300h。进一步分析了烧结温度对Zn₃Ga 3.99GexO9+2x:1%Cr³⁺(x =1,2,3,4,5)材料的发光和余辉性能影响,得到Zn₃Ga3.99Cr0.01Ge₁O₁₁ 的最佳烧结温度是1200℃,且随温度的升高, 样品的发光和余辉性能均得到提高。     

K2MgSiO4:Eu3+红色荧光粉的制备与发光性能

采用高温固相反应合成了适合近紫外光-蓝光激 发的K₂MgSiO₄:Eu³⁺红色荧光粉,并对其发光特性进行了研究。X射线衍 射(XRD)测试结果表明,合成样品为纯相晶体。样品激发光谱由O2-→Eu³⁺电 荷迁 移带波长为(200～350nm)和Eu³⁺的特征激发峰(波长为350～500nm) 组成,主峰位于396nm波长处,次级峰位于466nm波长处。在396nm和466nm波长分别激发 下,样品发射峰均由Eu³⁺的⁵D₀→⁷FJ(J=0,1,2,3,4)能级跃迁产生,其中619nm波长处发射强度最大。 随着Eu³⁺掺杂浓度的增加,荧光粉的发光强度增大。在实验测定的浓度范 围内,未出现浓度猝灭现象。样品的色坐标位于红光区,且非常接近NTSC标准。样品发光强 度随温度增加出现温度猝灭现象,发 射峰位置并未出现明显红移。样品中,Eu³⁺在⁵D₀能 级上的荧光寿命约为0.535ms。     

Eu3+-Bi3+共掺杂Ca0.7Sr0.3MoO4荧光粉发光性能的研究

采用高温固相法制备了Ca0.7Sr0.18M oO₄:0.08 Eu³⁺、Ca0.7Sr0.27MoO₄:0.02Bi³⁺和Ca0.7Sr0.18－1.5xMoO₄:0.08Eu³⁺,xBi³⁺红色 荧光粉,考察Bi³⁺浓度对荧光粉发光性能的影响以及Bi³⁺与Eu³⁺间的能 量传递。通过X射线衍射(XRD)以及荧光的激发、发射光谱 对荧光粉样品进行表征。结果表明,制备的Ca0.7Sr0.15MoO₄:0.08Eu3+ ,0.02Bi³⁺红色荧光粉属于白钨矿结构。在 Ca0.7Sr0.15MoO₄:0.08Eu³⁺,0.02Bi³⁺红色荧光粉中,由于Bi ³⁺的掺杂将吸收的能量传递给激活离子Eu³⁺,其发光强度得到 增强。当Bi³⁺掺杂量x=0.02时,在312 nm激发下,主发 射峰 在616 nm处的相对发光强度最大,属于Eu³⁺的⁵D₀→⁷F₂跃迁, 但掺杂浓度过高时会出现浓度猝灭现象,发光强度减弱。     

Eu3+掺杂Na2La2Ti3O10红色荧光粉的光谱性质

采用传统高温固相法制备了不同Eu³⁺浓 度掺杂的Na₂(La1－xEux) ₂Ti₃O10荧光粉,研究了Eu³⁺浓度 对样品结构及发光性质的影响。X射线衍射(XRD)结果表明Eu³⁺掺杂浓度不大于40%的 样品为四方相Na₂La₂Ti₃O10;当 Eu³⁺浓度达到60%时,出现了正交相NaEuTiO₄。对样品进行 激发、发射光谱的 测试发现,样品可被较 宽波段的紫外光有效激发,获得明亮的红橙色光发射,且Na₂La₂Ti₃O₁₀到Eu 3+存在有效的能量传递。利用 Van模型,证实了Eu³⁺间的交换相互作用是引发浓度猝灭的主要原因。利用Auzel模型 ,解释了Eu³⁺发光的自猝 灭行为。测试了样品在不同温度下的发射光谱和时间衰减曲线,确定样品发光产生 温度猝灭的主 要机理是Crossover过程。利用Arrhenius公式对实验数据进行拟合,确定激活能值约为0.26eV,说明Na₂(La1－xEux)₂Ti₃O₁₀荧光粉具有较好的发光热稳定性。     

Ca1－xZnxMoO4:Eu3+红色荧光粉的制备与表征

为研究新型的红色荧光粉并提高其发光强度,采 用高温固相法制备了 Ca0.88－xZnxMoO₄:0.08Eu3+ (x=0.0%,5%,10%,15%,20%,30%,40%,50%,60%,80%) 系列红色荧光粉,用X射线粉末衍射仪、荧光分光光度计对产物的晶体结构和发光性能进 行分析和表征。结果表明,当Zn的掺杂量达到20%时,钼酸钙晶体结构开始发生改变, 当Zn的掺杂量为15%时,红色荧光粉的发光强度最大。Ca0.88－xZnxMoO₄:0.08Eu³⁺的激 发光谱在200～350nm波长处出现宽带吸收,归属于Mo-O的电荷迁移 ,位于395nm和465nm波长左 右的吸收峰分别对应于Eu³⁺的⁷F₀→⁵L₆和⁷F₀→⁵D₂特 征吸收峰,能够很好地与近紫外和蓝光LED芯片相匹配。     

VOLTE容灾机制研究及优化方案

_{本文首先对VOLTE现网网络结构及容灾机制进行研究分析,发现现存容灾机制中存在的缺点和不确定性,针对其中的问题,针对性地进行了深入研究和分析,创新的提出了1种快速容灾抢通方案,以达到提升VOLTE业务运维能力和用户业务感知的目的。}     

Calculation of energy band gaps in quaternary iii/v alloys

The dielectric theory of electronegativity is applied to the calculation of the compositional dependence of the energy band gap for quaternary III/V alloys of type A_l-xB_xC_1-yD_y and A_1-x-yB_xC_yD. The departure from linearity of E_G versus x and y is taken to be the sum of two terms, the intrinsic or virtual crystal term and the extrinsic term due to effects of aperiodicity which for one type of alloy may occur on both sublattices. Rather than simply treating the quaternary as an average of the bounding ternary systems, as has been common in the past, the intrinsic departure from linearity is calculated by assuming E_h,i,C, and D_av to vary linearly with x and y. The result is a smaller intrinsic deviation from linearity and a much better fit to existing data in the system Ga_1-xIn_xAs_1-y P_y. The calculation is also applied to three systems where no data exist but which are of great interest because of their potential application for the fabrication of lattice matched tandem solar cells: Ga_l-xA1_xAs_l-ySb_y. Ga_1-x-yA1_xIn_yAs, and GaAs_1-x-yP_xSb_y.     

新形势下河北移动全业务支撑策略研究

随着铁塔公司的成立及国家在“宽带中国”“提速降费”等一系列通信领域的重大战略实施,全业务运营越来越成为河北移动保持领先,实现卓越的重要支点。基于此河北移动启动大规模综合业务区建设,由传统传输网围绕基站建设转向全业务支撑。河北移动将综合业务区建设与全业务机房的选取统筹安排,建设综合业务区与全业务机房的联络光缆,将综合业务区光缆网成为承载重要集客数据专线和4G拉远站的载体,合理、有序、迅速实现“一张光缆网”的建设,鼎力支撑全业务及4G的发展。     

Nickel silicidation techniques for strained Si1?xGex, Si1?x?yGexCy, and Si1?yCy alloys material-device applications

A nickel silicide process for Si_1-xGe_x, Si_1-x-yGe_xC_y, and Si_1-yC_y alloy materials compatible with Si technology has been developed. Low-resistivity-phase (12–20 μΘ cm) nickel silicides have been obtained for these alloys with different low sheet-resistance temperature windows. The study shows that thin (15–18 nm) silicide layers with high crystalline quality, smooth silicide surface, and smooth interface between silicide and the underlying material are achievable. The technique could be used to combine the benefits of Ni silicide and Si_1-xGe_x, Si_1-x-yGe_xC_y, and Si_1-yC_y alloys. The technique is promising for Si or Si_1-xGe_x, Si_1-x-yGe_xC_y, and Si_1-yC_y alloy-based metal-oxide semiconductor, field-effect transistors (MOSFETs) or other device applications.     

Low pressure metalorganic chemical vapor deposition of InP and related compounds

The low pressure metalorganic chemical vapor deposition epitaxial growth and characterization of InP, Ga_0.47In_0.53 As and Ga_xIn_1-xAs_yP_1-y, lattice-matched to InP substrate are described. The layers were found to have the same etch pit density (EPD) as the substrate. The best mobility obtained for InP was 5300 cm² V⁻¹S⁻¹ at 300 K and 58 900 cm² V⁻¹ S⁻¹ at 77₂K, and for GaInAs was 11900 cm² V⁻¹ S⁻¹ at 300 K, 54 600 cm² V⁻¹ S⁻¹ at 77 K and 90 000 cm V⁻¹S⁻¹ at 2°K. We report the first successful growth of a GaInAs-InP superlattice and the enhanced mobility of a two dimensional electron gas at a GaInAs -InP heterojunction grown by LP-MO CVD. LP MO CVD material has been used for GaInAsPInP, DH lasers emitting at 1.3 um and 1.5 um. These devices exhibit a low threshold current, a slightly higher than liquid phase epitaxy devices and a high differential quantum efficiency of 60%. Fundamental transverse mode oscillation has been achieved up to a power outpout of 10 mW. Threshold currents as low as 200 mA dc have been measured for devices with a stripe width of 9 um and a cavity length of 300 um for emission at 1.5 um. Values of T in the range 64–80 C have been obtained. Preliminary life testing has been carried out at room temperature on a few laser diodes (λ = 1.5μm). Operation at constant current for severalthousand hours has been achieved with no change in the threshold current.     

Transport properties of thermoelectric materials for coolers

The Seebeck coefficient, thermal conductivity, electrical conductivity and Hall coefficient of cooler grade, p-and n-type ternary alloys of Bi₂Te₃-Sb₂Te₃-Sb₂Se₃ were measured between 10 and 300 K. Between 300 K and about 150 K the temperature dependence of the transport properties can be explained by assuming nondegeneracy and a lattice scattering mechanism. The difference between the temperature dependence of the Hall effect in n-and p-type alloys can be explained by the presence of sub-bands of light and heavy holes in the valence band of p-type alloys.     

Characterization of a rapid thermal anneal TiNxOy/TiSi2 contact barrier

In this paper, the physical and electrical properties of a TiN_xO_y/TiSi₂ dual layer contact barrier are reported. The TiN_xO_y/TiSi₂ barrier was formed by rapidly annealing a Ti thin film on Si in an N₂ ambient. During this process, the Ti film surface reacts with N₂ to form a TiN_xO_y skin layer and the bulk of the Ti film reacts with Si to form an underlying TiSi₂ layer. The influences of rapid thermal anneal (RTA) conditions on the TiN_xO_y layer were investigated by varying the RTA temperature from 600 to 1100° C and cycle duration from 30 to 100 s. It is found that the resulting TiN_xO_y and TiSi₂ layer thicknesses are dependent on RTA temperature and the starting Ti thickness. For a starting Ti thickness of 500Å, 150Å thick TiN_xO_y and 800Å thick TiSi₂ are obtained after an RTA at 900° C for 30 s. The TiN_xO_y thickness is limited by a fast diffusion of Si into Ti to form TiSi₂. When a Ti film is deposited on SiO₂, Ti starts to react with SiO₂ from 600° C and a significant reduction of the SiO₂ thickness is observed after an RTA at 900° C. The resulting layer is composed of a surface TiN_xO_y layer followed by a complex layer of titanium oxide and titanium suicide. In addition, when Ti is depos-ited on TiSi₂, thicker TiN_xO_y and TiSi₂ layers are obtained after RTA. This is because the TiSi₂ layer retards the diffusion of Si from the underlying substrate into the Ti layer. NMOSFETs were fabricated using the TiN_xO_y/TiSi₂ as a contact barrier formed by RTA at 900° C for 30 s and a significant reduction of contact resistance was obtained. In addition, electromigration test at a high current density indicated that a significant improvement in mean time to failure (MTF) has been obtained with the barrier.     

Processing of large YBa2 Cu3Ox domains for levitation applications by a Nd1+x Ba2−x Cu3 Oy-Seeded melt-growth technique

YBa₂Cu₃O_x domains for levitation applications have been produced by a seeding technology that includes Nd_1+x Ba_2−x Cu₃O_y seeds and melt-processing technologies such as conventional melt-textured growth, melt-texturing with PtO₂ and Y₂BaCuO₅ additions, and the new solid-liquid-melt-growth technology. Large domains (∼20 mm) with high levitation forces (F₁ up to 8.2 N) have been produced. The reproducibility of the results is good, and the capability of producing a large number of pellets in a single batch indicates good potential for the production of large amounts of this material.     

基于InP衬底的晶格失配In0.68Ga0.32As的MOCVD生长及其特性研究

采用MOCVD生长技术在InP衬底上成功实现了晶格失配的3μm In0.68 Ga0.32As薄膜生长.通过As组分的改变,利用张应变和压应变交替补偿的InAsxP1-x应变缓冲层结构来释放由于晶格失配所产生的应力,在InP衬底上得到了与In0.68Ga0.32 As晶格匹配的InAsxP1-x“虚拟”衬底,通过对缓冲层厚度的优化,使应力能够在“虚拟”衬底上完全豫弛.通过原子力显微镜(AFM)、高分辨XRD、透射电镜(TEM)和光致发光(PL)等测试分析表明,这种释放应力的方法能够有效提高In0.68 Ga0.32 As外延层的晶体质量.     

The effect of Tl2Te3 on the properties of the solid solution (Sb2Te3)0.75.(Bi2Te3)0.25

The effect on transport properties of the addition of 0.5-5% Tl₂Te₃ to p-type solid solutions of antimony and bismuth tellurides was studied. It was found that the addition of Tl₂Te₃ caused a lessening of the increase of hole concentration as low temperatures were approached, resulting in a slower decrease of the Seebeck coefficient with a decrease in temperature. In partial fulfillment of M.Sc. degree, Hebrew University, Jerusalem. Permanent address, Dept. of Inorganic and Analytical Chemistry, Hebrew University, Jerusalem.