原子力显微镜(AFM)力传感器及其固有频率的测试

由悬臂梁与探针集成件(Cantilever stylus)组成的力传感器是原子力显微镜的一个关键部件,固有频率(resonant frequency)是悬臂梁与探针集成件的一个重要技术指标,本文介绍了对力传感器的要求、力传感器的设计、检测力传感器的方法,着重介绍了一种采用光学象散原理组成的传感器的固有频率测试系统与方法。     

三维微力探针传感器技术研究

结合光纤探针与四悬臂梁支撑结构的特点,研制了一种基于微探针形式,具有μN级三维微力测量和传感能力的压阻式三维微力探针传感器.通过ANSYS数值仿真的方法研究了传感器结构之间的应力特点.并且通过实验验证了所研制的传感器的综合精度可达到0.2%FS,干扰误差≤0.3%FS.     

用象散法测试原子力显微镜力传感器的固有频率

原子力显微镜已成为人们观测和研究物体微观世界的强有力的工具.由悬臂梁与探针集成的力传感器是原子力显微镜的一个关键部件,而固有频率是其一个主要技术参数.本文介绍了一种采用光学象散原理测试原子力显微镜的力传感器固有频率测试系统的原理、组成和测试方法.     

深水监测用光纤光栅内封式悬臂梁力传感器

针对深水恶劣环境中对耐压性和抗海水腐蚀能力的需求,提出一种新型的可用于深水力载荷监测、具有悬臂梁结构的光纤传感器。该传感器将光纤布拉格光栅封装于悬臂梁元件内部,利用悬臂梁材料的抗压和抗海水腐蚀能力对光纤形成保护,既保持了此类传感器结构简单、力学性能优异的特点,又具备了耐压抗腐蚀能力。实验研究表明:该传感器能在30 MPa(3 000 m水深)的水压环境中正常工作,水压灵敏度为-3.79 pm/MPa,力载荷灵敏度为2.79 pm/N,温度灵敏度为30.93 pm/℃。传感器对温度和水压环境因素的响应线性良好,相关系数均在0.99以上,便于补偿。此外,通过对照仿真计算与实验结果,分析了封装工艺和实验条件对传感器误差的影响。     

悬臂式光纤探针

悬臂式探针的研制是 SNOM- AFM的重要技术之一。用熔拉—腐蚀相结合的方法 ,将普通单模石英光纤制成直锥型探针。再利用自制的工具在 CO2 激光束下将针尖打弯 ,制成悬臂式探针样品。简单地讨论了此种探针的弹性常数     

原子力显微镜探针表征烷烃及正烷类有机化合物的研究

原子力显微镜(AFM)作为一种重要的科研、生产工具被广泛使用,其测量精度很大程度上决定于所使用的探针针尖的尖锐度。本研究使用标准微机械加工工艺在低应力氮化硅悬臂上通过各向异性湿法刻蚀形成硅针尖。通过对三十六烷烃和正六十烷的表征测量,验证了探针针尖的纳米尺度尖锐度。     

微悬臂梁的平衡和稳定性研究

对原子力显微镜(AFM)在接触和非接触工作模式下的平衡状态和稳定性进行了研究,分析研究了微悬臂梁的长度以及探针与被测样品表面之间的距离对平衡位置的影响,获得了平衡位置与悬臂梁的长度以及与被测表面之间的规律,该结论为微悬臂的设计和改进提供了理论指导。     

多次掩模湿法腐蚀硅微加工过程的蒙特卡罗仿真

探讨利用蒙特卡罗 (Monte Carlo, MC) 法模拟硅微加工各向异性湿法腐蚀的仿真,实现连续多次掩模,多步硅微加工工艺过程的仿真.介绍MC法的使用特点及其在湿法腐蚀硅微加工中的应用,仿真使用腐蚀概率方程确定表面原子适当的MC转移概率,模拟方法支持氧化硅和氮化硅掩模层作用下的各向异性腐蚀加工和多次掩模的传递过程.编制的仿真程序通过模拟一个原子力显微镜探针阵列多掩模连续6步工艺的硅微加工过程验证了MC法的正确性.     

集成铜金属压阻层的SU-8胶悬臂梁微力传感器的制作

由于SU-8胶的弹性模量比硅的低,在SU-8胶悬臂梁上集成金属压阻可获得很高的力灵敏度系数,因此本文基于SU-8胶设计并制作了一种集成蛇形结构铜金属压阻层的SU-8胶悬臂梁微力传感器。介绍了制作微力传感器的新型工艺,并进行了传感器性能测试。实验结果表明:设计的SU-8胶微力传感器在0～350μN具有较好的线性度,力灵敏度为0.24mV/μN,测量误差为4.06%。该微力传感器可以满足对微小力的测量,相对于硅材料的微力传感器,其制作工艺更加简单,周期更短。由于SU-8胶的生物兼容性好,该传感器在生物医学研究领域有着很好的应用前景。     

一种基于MEMS技术的新型谐振式微流量传感器

提出了一种新颖的微机械谐振式微流量传感器.该传感器采用电磁激励方式.传感器主要由1个3 μm 厚H型谐振器、1个40 μm厚的悬臂梁平板(2 000 μm×5 000 μm)以及连接平板和框架的2根40 μm厚的支撑梁组成.谐振器采用低应力富硅氮化硅SiN制作,可以方便地使用湿法腐蚀释放谐振器,从而简化工艺流程,提高成品率.文中分析了理论模型、有限元仿真(FEA)、工艺制造和测试结果.测试结果显示,传感器在1 SLM(标准L/min)流量下,频率漂移为500 Hz,分辨率达到5/1 000.但在输出(谐振器频率漂移)和输入(气体流量)间存在二次曲线关系.     

碳纳米管原子力显微镜针尖的制作研究

研究在光学显微镜下，运用两个独立的三维工作台分别控制针尖和碳纳米管的位置，将碳纳米管吸附在传统的原子力显微镜针尖上。首先将碳纳米管粘附在导电的胶带上，然后用涂胶的针尖与其接触将碳纳米管粘附到针尖上，最后运用电蚀的方法优化碳纳米管针尖的长度，以达到高分辨率的要求。运用制作的碳纳米管针尖对硅表面的深槽进行成像，获得了传统针尖无法得到的信息。     

基于原子力显微镜的线宽粗糙度测量

给出采用原子力显微镜(Atomic force microscope,AFM)测量线宽粗糙度(Line width roughness,LWR)的分析步骤。分析线宽和LWR及其偏差随刻线横截面位置的高度变化的关系,线宽及其偏差和LWR及其偏差随刻线横截面位置的高度值增加而减小。分别采用四种边缘提取算子提取了碳纳米管针尖AFM测量的刻线顶部线宽边缘,计算了刻线顶部线宽和LWR,顶部线宽和LWR测量结果对边缘提取算子不敏感。结合被测单晶硅台阶的顶表面和底表面加工方法,提出采用各扫描线轮廓高度相等的方法校正AFM压电驱动器的z向非线性。比较了采用普通氮化硅探针针尖、超尖针尖以及碳纳米管针尖AFM测量名义线宽为1 000 nm刻线LWR的结果,显示采用三种针尖的LWR测量结果存在差异,但考虑到AFM分辨率,可认为测量结果基本相同。因此,为更精确描述刻线边缘,必须提高AFM分辨率。     

硅基MEMS技术

结合MEMS技术的发展历史,概括了当今硅基MEMS加工技术的发展方向。指出表面牺牲层技术和体硅加工技术是硅基MEMS加工技术的两条发展主线;表面牺牲层技术向多层、集成化方向发展;体硅工艺主要表现为键合与深刻蚀技术的组合,追求大质量块和低应力以及三维加工。SOI技术是新一代的体硅工艺方向;标准化加工是MEMS研究的重要手段。     

Effects of Atomic Force Microscope Silicon Tip Geometry on Large-Scale Nanomechanical Modification of the Polymer Surface

The shape of an atomic force microscope (AFM) silicon tip has a significant effect on the mechanical modification of the polymer surface, especially for a longer sliding distance of from several to several hundreds of millimeters. In this work, a pyramidal silicon tip was used to cut into the polymethyl methacrylate (PMMA) surface, forming nanogrooves with a linear sliding distance of about 80 mm and wear box structures with a total tip sliding distance of 1,024 mm. The effects of the tip edges and the tip radius on the form of the wear debris chips, wear depth, and debris transferred to the tip were investigated. The experimental results showed that four sides of the tip influenced the morphology of the removed material. Adhesion appeared to play a role in the tip wear mechanism by successive removal of SiO₂ layers during transfer of adhered PMMA from the tip to the surface. The tip radius generally increased with sliding distance. Simultaneously, adhesion of the removed materials to the tip induced a larger tip radius and a sharper tip was revealed as dropping off of the materials during the test from time to time. Thus, with the same normal load the worn tip may induce failure of the machining process. The results presented in this study provide insight into long-term nanoscratch/wear and nanomechanical machining of glassy polymer surfaces with a silicon AFM tip.     

基于感应耦合等离子刻蚀技术的三维微拉伸梁制作工艺

根据感应耦合等离子(Inductively coupled plasma,ICP)刻蚀的机理,针对热氧化硅薄膜微拉伸梁的结构特点,研究ICP刻蚀制作3D微拉伸梁结构的工艺并解决其中的难点问题。介绍ICP刻蚀工艺参数对刻蚀质量的影响,包括存在的微负载效应和深宽比效应。详细介绍热氧化硅薄膜微拉伸梁的制作,其关键步骤是双掩膜两次ICP刻蚀形成阶梯状窗口结构,并在硅衬底表面形成释放了的热氧化硅薄膜梁。利用ICP刻蚀对单晶硅的高选择性,此制作工艺适用于各种薄膜的微拉伸梁制作。     

微细加工与装备技术进展

讨论微细加工与装备技术现状,介绍刻蚀技术、LIGA技术和准LIGA技术、微细特种加工等典型的微细加工工艺原理与技术特点,并指出各种加工方法的优缺点,分析微细加工技术的发展走向及装备技术的发展趋势。     

Imaging and Measuring the Molecular Force of Lymphoma Pathological Cells Using Atomic Force Microscopy

Atomic force microscopy (AFM) provides a new technology to visualize the cellular topography and quantify the molecular interactions at nanometer spatial resolution. In this work, AFM was used to image the cellular topography and measure the molecular force of pathological cells from B‐cell lymphoma patients. After the fluorescence staining, cancer cells were recognized by their special morphological features and then the detailed topography was visualized by AFM imaging. The AFM images showed that cancer cells were much rougher than healthy cells. CD20 is a surface marker of B cells and rituximab is a monoclonal antibody against CD20. To measure the CD20‐rituximab interaction forces, the polyethylene glycol (PEG) linker was used to link rituximab onto the AFM tip and the verification experiments of the functionalized probe indicated that rituximab molecules were successfully linked onto the AFM tip. The CD20‐rituximab interaction forces were measured on about 20 pathological cells and the force measurement results indicated the CD20‐rituximab binding forces were mainly in the range of 110–120 pN and 130–140 pN. These results can improve our understanding of the topography and molecular force of lymphoma pathological cells. SCANNING 35:40‐46, 2013. © 2012 Wiley Periodicals, Inc.     

Imaging tip formation in single-mode optical fibres

The formation of probe tips is a crucial step in all forms of scanning probe microscopy (SPM). In this work single-mode optical fibres are chemically etched in a variable temperature bath of etchant solution (HF acid buffered with ammonium fluoride) to produce tips for optical SPM. Tip evolution is monitored by prematurely truncating the etching process and imaging the tip end-structure using atomic force microscopy (AFM). In the case of a visible regime single-mode fibre the AFM images show a remarkable ring structure in the central cladding region and a tip structure in the core with a central depression; this serves to demonstrate the efficacy of chemical etching for converting compositional variation to three-dimensional topography. In the case of a standard, single-mode optical communications fibre the (projected) tip cone angle is assessed from AFM images in the early stages of tip formation. Values of the cone angle thus determined, for different etch conditions, are compared to those predicted by a model in which the independently determined core and cladding etch rates, and core diameter are the sole determinants of the final tip geometry. The model was devised in the context of etching multi-mode fibres and is shown to be valid here for single-mode fibres within the range of experimental accuracy and etch conditions examined.     

微流控分析芯片的加工技术

综述了微流控分析芯片和加工技术和材质性能,光刻和蚀刻技术常用于加工硅,玻璃和石英芯片。有机聚合物由于品种多,易加工,是代替玻璃和石英的芯片材料。本文总结和讨论了各种芯片材料和它们的加工方法,如光刻,湿法刻蚀,干法刻蚀,模塑法,软刻蚀,热压法,激光切蚀法,LIGA技术和键合技术,引用文献36篇。     

Characteristics of fracture during the approach process and wear mechanism of a silicon AFM tip

The wear of an atomic force microscope (AFM) tip is one of the crucial issues in AFM as well as in other probe-based applications. In this work, wear tests under extremely low normal load using an AFM were conducted. Also, in order to understand the nature of silicon tip wear, the wear characteristics of crystal silicon and amorphous silicon oxide layer were investigated by a high-resolution transmission electron microscope (HRTEM). It was found that fracture of the tip readily occurred due to impact during the approach process. Experimental results showed that the impact should be below 0.1 nNs to avoid significant fracture of the tip. Also, it was observed that wear of the amorphous layer, formed at the end of the tip, occurred at the initial stage of the silicon tip damage process. Based on Archard's wear law, the wear coefficient of the amorphous layer was in the range of 0.009-0.014. As for the wear characteristics of the silicon tip, it was shown that wear occurred gradually under light normal load and the wear rate decreased with increase in the sliding distance. As for the wear mechanism of the silicon tip, oxidation wear was identified to be the most significant. It was shown that the degree of oxidation was higher under high normal load and in a nitrogen environment, oxidation of the silicon tip was reduced.