Influence of the cap layer thickness on photoluminescence properties in strained InGaAs/GaAs single quantum wells

The influence of the GaAs cap layer thickness on the luminescence properties in strained In_0.20Ga_0.80As/GaAs single quantum well (SQW) structures has been investigated using temperature-dependent photoluminescence (PL) spectroscopy. The luminescence peak is shifted to lower energy as the GaAs cap layer thickness decreases, which demonstrates the effect of the GaAs cap layer thickness on the strain of InGaAs/GaAs single quantum wells (SQW). We find the PL quenching mechanism is the thermal activation of electron hole pairs from the wells into the GaAs cap layer for the samples with thicker GaAs cap layer, while in sample with thinner GaAs cap layer exciton trapping on misfit dislocations is dominated.     

具有部分本征GaN帽层新型AlGaN/GaN高电子迁移率晶体管特性分析

为了优化传统Al GaN/GaN高电子迁移率晶体管(high electron mobility transistors,HEMTs)器件的表面电场,提高击穿电压,本文提出了一种具有部分本征GaN帽层的新型Al GaN/GaN HEMTs器件结构.新型结构通过在Al GaN势垒层顶部、栅电极到漏电极的漂移区之间引入部分本征GaN帽层,由于本征GaN帽层和Al GaN势垒层界面处的极化效应,降低了沟道二维电子气(two dimensional electron gas,2DEG)的浓度,形成了栅边缘低浓度2DEG区域,使得沟道2DEG浓度分区,由均匀分布变为阶梯分布.通过调制沟道2DEG的浓度分布,从而调制了Al GaN/GaN HEMTs器件的表面电场.利用电场调制效应,产生了新的电场峰,且有效降低了栅边缘的高峰电场,Al GaN/GaN HEMTs器件的表面电场分布更加均匀.利用ISE-TCAD软件仿真分析得出:通过设计一定厚度和长度的本征GaN帽层,Al GaN/GaN HEMTs器件的击穿电压从传统结构的427 V提高到新型结构的960 V.由于沟道2DEG浓度减小,沟道电阻增加,使得新型Al GaN/GaN HEMTs器件的最大输出电流减小了9.2%,截止频率几乎保持不变,而最大振荡频率提高了12%.     

GaAs间隔层厚度对InAs/GaAs量子点分子光学性质的影响

采用光致荧光发射谱(PL)和时间分辨荧光发射谱(TRPL)研究了GaAs间隔层厚度对自组装生长的双层InAs/GaAs量子点分子光学性质的影响.首先,测量低温下改变激发强度的PL谱,底层量子点和顶层量子点的PL强度比值随激发强度发生变化,表明两层量子点之间的耦合作用和层间载流子的转移随着间隔层厚度变大而变弱.接着测量改变温度的PL谱,量子点荧光光谱峰值位置(Emax)、半峰全宽及积分强度随温度发生变化,表明GaAs间隔层厚度直接影响到量子点内载流子的动力学过程和量子点发光的热淬灭过程.最后,TRPL测量发现60mL比40mL间隔层厚度样品的载流子隧穿时间有明显延长.     

Effects of transverse mode coupling and optical confinement factor on gallium-nitride based laser diode

We have investigated the transverse mode pattern and the optical field confinement factor of gallium nitride （GaN） laser diodes （LDs） theoretically. For the particular LD structure, composed of approximate 4 μm thick n-GaN substrate layer, the maximum optical confinement factor was found to be corresponding to the 5^th order transverse mode, the so-called lasing mode. Moreover, the value of the maximum confinement factor varies periodically when increasing the n-side GaN layer thickness, which simultaneously changes and increases the oscillation mode order of the GaN LD caused by the effects of mode coupling. The effects of the thickness and the average composition of Al in the AlGaN/GaN superlat.tice on the optical confinement factor are also presented. Finally, the mode coupling and optimization of the layers in the GaN-based LD are discussed.     

Exciton–phonon interaction in Al_(0.4)Ga_(0.6)N/Al_(0.53)Ga_(0.47)N multiple quantum wells

The exciton-phonon interaction in Al_(0.4)Ga_(0.6)N/Al_(0.53)Ga_(0.47)N multiple quantum wells(MQWs) is studied by deepultraviolet time-integrated and time-resolved photoluminescence(PL).Up to four longitudinal-optical(LO) phonon replicas of exciton recombination are observed,indicating the strong coupling of excitons with LO phonons in the MQWs.Moreover,the exciton-phonon coupling strength in the MQWs is quantified by the Huang-Rhys factor,and it keeps almost constant in a temperature range from 10 K to 120 K.This result can be explained in terms of effects of fluctuations in the well thickness in the MQWs and the temperature on the exciton-phonon interaction.     

Photoluminescence and lasing properties of InAs/GaAs quantum dots grown by metal-organic chemical vapour deposition

Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low growth rate QD sample has a larger PL intensity and a narrower PL line width than the high growth rate sample. During rapid thermal annealing, however, the low growth rate sample shows a greater blueshift of PL peak wavelength. This is caused by the larger InAs layer thickness which results from the larger 2-3 dimensional transition critical layer thickness for the QDs in the low-growth-rate sample. A growth technique including growth interruption and in-situ annealing, named indium flush method, is used during the growth of GaAs cap layer, which can flatten the GaAs surface effectively. Though the method results in a blueshift of PL peak wavelength and a broadening of PL line width, it is essential for the fabrication of room temperature working QD lasers.     

MOVPE生长的InGaN/GaN单量子阱的光致发光和光吸收特性

研究了用金属有机物气相外延(MOVPE)法在蓝宝石衬底上生长的In组分浓度保持不变的InGaN/GaN单量子阱结构在室温下的发光特性和光吸收特性.实验结果表明,在InGaN厚度<3nm时,随着样品InGaN势阱层宽度的增加(1nm),光致发光(PL)谱的发光峰值波长出现明显的红移33nm现象,而且发光强度下降8%,谱线半峰全宽(FWHM)展宽,通过对样品的透射、反射光谱研究发现,量子阱层窄(1.5nm)的样品在波长接近红外区时出现无吸收的现象,即R+T达到了100%,而在阱层较宽的样品中没有发现这一现象,对引起这些现象的原因进行了讨论.这些结果有助于开发和优化三族氮化物半导体光电器件的进一步研究工作.     

Hexagonal (wurtzite) GaN inclusions as a defect in cubic (zinc-blende) GaN

The dependence of the hexagonal fraction with thickness in MBE-grown bulk cubic (c-) GaN epilayer is presented in this paper. A number of c-GaN epilayers with different thicknesses were characterized via PL and XRD measurements. From the PL spectra, the signal due to h-GaN inclusions increases as the thickness of the c-GaN increases. On the contrary, in the XRD diffractogram, c-GaN shows a dominant signal at all thicknesses, and only a weak peak at ∼35° is observed in the diffractogram, implying the existence of a small amount of h-GaN in the c-GaN layer. The best quality of c-GaN is observed in the first 10 μm of GaN on the top of GaAs substrate. Even though the hexagonal content increases with the thickness, the average content remains below 20% in c-GaN layers up to 50 μm thick. The surface morphology of thick c-GaN is also presented.     

压强对β胡萝卜素分子的电子-声子耦合常数的影响

电子-声子耦合常数不仅可以反映出分子中π电子离域程度的强弱, 有效共轭长度的大小, 同时也可以表征分子中的原子和电子在外界环境作用下的相互振动耦合程度的强弱。在一些研究中电子-声子耦合常数被定义为无量纲的系数。应用R.Tubino等引用的一种有量纲的电子-声子耦合常数, 建立其与黄昆因子的关系式, 进而可以计算出共轭键中单个振动模的数值。压强对多烯分子吸收光谱、拉曼光谱频移影响的研究已有报道, 但对拉曼散射截面、黄昆因子、电子-声子耦合常数的研究还没有报道。测量了β胡萝卜素分子在二硫化碳溶液中0.04～0.60 GPa的压强范围内的紫外-可见吸收光谱和共振拉曼光谱。实验结果表明, 随着压强的增加, CS₂溶液中的β胡萝卜素分子的紫外-可见吸收光谱的吸收带发生明显的红移现象, 而拉曼光谱的特征谱线却发生蓝移的现象, 拉曼散射截面减小, 电子-声子耦合常数增加。其机理是随着压强的增加, β胡萝卜素分子被压缩又结构有序性下降, 导致电子能隙变窄, 有效共轭长度变短, π电子离域范围减小, 拉曼散射截面减小, 黄昆因子、电子-声子耦合常数增加。     

ZnSe/BeTe Ⅱ型量子阱中界面结构对发光特性的影响

报道了具有特殊界面结构(界面包含三个Zn—Te或Te—Zn化学键)的非掺杂ZnSe/BeTe II 型量子阱在低温(5—10 K)条件下的空间间接光致发光(PL)光谱的实验结果. PL光谱显示了一个较弱的双峰结构和较低的线性偏振度,并且这两个峰的线性偏振度相反. 此外,这个PL光谱也强烈地依赖于一个外加电场的变化. 这些结果表明样品的两个发光峰是分别来自两个界面的发光跃迁,并且特殊界面结构降低了空间间接PL的发光效率和线性偏振性,以及界面附近的内秉电场. 随着激发强度的增加,PL谱的高能端发光峰显示了一个 关键词： Ⅱ型量子阱 光致发光 界面结构     

Effects of GaN cap layer thickness on an AlN/GaN heterostructure

In this study, we investigate the effects of GaN cap layer thickness on the two-dimensional electron gas (2DEG) electron density and 2DEG electron mobility of AlN/GaN heterostructures by using the temperature-dependent Hall measurement and theoretical fitting method. The results of our analysis clearly indicate that the GaN cap layer thickness of an AlN/GaN heterostructure has influences on the 2DEG electron density and the electron mobility. For the AlN/GaN heterostructures with a 3-nm AlN barrier layer, the optimized thickness of the GaN cap layer is around 4 nm and the strained a-axis lattice constant of the AlN barrier layer is less than that of GaN.     

Ti缓冲层及退火处理对Si(111)基片上生长的ZnO薄膜结构和发光特性的影响

采用反应磁控溅射法在Si（111）基片上制备了带有Ti缓冲层的高c轴取向ZnO薄膜.通过X射线衍射分析和光致荧光光谱测量,研究了Ti缓冲层厚度和退火处理对ZnO薄膜结晶质量和光致荧光特性的影响.研究结果表明,Ti缓冲层的引入可以有效改善Si基片上ZnO薄膜的发光性能,但缓冲层存在一个最佳的厚度.薄膜应力是影响ZnO薄膜紫外荧光发射性能的重要因素,较小的残余应力对ZnO薄膜的紫外荧光发射是有利的,残余应力的存在可以改变ZnO薄膜紫外荧光发射能量.随着退火温度的增加,薄膜中的张应力增大,导致带隙宽度减小以及激子复合跃迁峰逐渐向低能方向移动. 关键词： ZnO薄膜 缓冲层 退火处理 应力分析     

阶梯AlGaN外延新型Al_(0.25)Ga_(0.75)N/GaNHEMTs击穿特性分析

为了优化AlGaN/GaN HEMTs器件表面电场,提高击穿电压,本文首次提出了一种新型阶梯AlGaN/GaN HEMTs结构.新结构利用AlGaN/GaN异质结形成的2DEG浓度随外延AlGaN层厚度降低而减小的规律,通过减薄靠近栅边缘外延的AlGaN层,使沟道2DEG浓度分区,形成栅边缘低浓度2DEG区,低的2DEG使阶梯AlGaN交界出现新的电场峰,新电场峰的出现有效降低了栅边缘的高峰电场,优化了AlGaN/GaN HEMTs器件的表面电场分布,使器件击穿电压从传统结构的446 V,提高到新结构的640 V.为了获得与实际测试结果一致的击穿曲线,本文在GaN缓冲层中设定了一定浓度的受主型缺陷,通过仿真分析验证了国际上外延GaN缓冲层时掺入受主型离子的原因,并通过仿真分析获得了与实际测试结果一致的击穿曲线.     

电场调谐InAs单量子点的发光光谱

采用稳态和时间分辨发光光谱,研究了生长在p-i-n二极管结构内的InAs单量子点发光光谱的电场调谐特性.随着电场强度的增加,观察到量子点中激子发光的Stark 效应.通过选择不同波长的激光线激发量子点样品,发现随着电场强度的增加导致量子点发光强度的减弱,这是由于量子点俘获载流子概率的减小所致,而激子寿命的增加源于电场导致激子的Stark效应. 关键词： InAs单量子点 Stark效应 电子-空穴分离     

Optical excitation and emission processes of Si-QD/SiO2 multilayer films with different SiO2 layer thicknesses

Si-rich oxide/SiO₂ multilayer films with different SiO₂ layer thicknesses have been deposited by the plasma enhanced chemical vapor deposition technique, and crystallized Si quantum dot (Si-QD)/SiO₂ multilayer films are obtained after annealing at 1100 ^°C. The photoluminescence (PL) intensity of the multilayer films increases significantly with increasing SiO₂ layer thickness, and the PL peak shifts from 1.25 eV to 1.34 eV. The PL excitation spectra indicate that the maximal PL excitation intensity is located at 4.1 eV, and an excitation–transfer mechanism exists in the excitation processes. The PL decay time for a certain wavelength is a constant when the SiO₂ thickness is larger than 2 nm, and a slow PL decay process is obtained when the SiO₂ layer is 1 nm. In addition, the PL peak shifts toward high energy with decreasing temperature only when the SiO₂ layer is thick enough. Detailed analyses show that the mechanism of PL changes from the quantum confinement effect to interface defects with decreasing SiO₂ layer thickness.     

含石墨烯临界耦合谐振器的吸收特性研究

临界耦合谐振器是一种薄膜结构, 可以吸收几乎所有的入射电磁波而不产生散射. 为了有效的实现和控制临界耦合现象, 本文提出了在临界耦合结构中加入了基于石墨烯的多层薄膜结构来代替原来的吸收薄膜层. 计算表明临界耦合现象出现在近红外波段, 且可以通过调节石墨烯的费米能级来获得不同的临界耦合频率; 另外改变多层薄膜结构中介质的厚度、石墨烯的层数, 实现了临界耦合现象的可调谐性, 同时对于弛豫时间和入射角度对吸收效率的影响也做了相应讨论. 本文理论结果为基于石墨烯的临界耦合器件和光探测器件的设计提供了理论依据.     

Si衬底GaN基LED外延薄膜转移至金属基板的应力变化

采用电镀金属基板及湿法腐蚀衬底的方法将硅衬底上外延生长的GaNMQWLED薄膜转移至不同结构的金属基板,通过高分辨X射线衍射(HRXRD)和光致发光(PL)研究了转移的GaN薄膜应力变化。研究发现:(1)转移至铜基板、铬基板、铜/镍/铜叠层基板等三种基板的GaN薄膜张应力均减小,其中转移至铬基板的GaN薄膜张应力最小。(2)随着铬基板中铬主体层厚度的增加,转移后的GaN薄膜应力不发生明显变化。     

Ir(PPY)3掺杂PVK的电致发光机理

近几年来发展起来的电致磷光(electrophosphorescence)是有机发光二极管(OLED)研究的新生长点。对电致磷光发光机理的研究随即得到了人们普遍的关注。比较了不同正向偏压条件下Ir(PPY)₃掺杂聚乙烯基咔唑(PVK)的光致发光(PL)和电致发光(EL)光谱。研究结果显示在电场和注入电流的共同作用下,PL光谱中基质PVK发光的相对强度并没有发生显著的变化。电场或注入载流子不会影响PVK向Ir(PPY)₃的能量传递。磷光掺杂聚合物EL主要是由于载流子在掺杂磷光分子上的直接复合,而不是由基质向磷光掺杂分子的能量传递。     

多层介质膜脉冲压缩光栅近场光学特性分析

利用傅里叶模式理论分析了TE波自准直角入射的使用条件下，多层介质膜光栅的光栅区和多层膜区电场分布的特点.分别讨论了HfO₂和SiO₂为顶层光栅材料时，光栅结构参数对光栅脊峰值电场的影响，结果表明，对于不同膜厚的顶层材料，存在一个最佳膜厚度，使光栅脊峰值电场最小，并且当膜厚增大时，设计大高宽比的光栅可以降低该电场峰值.最后，在大角度条件下使用多层膜光栅也可以降低光栅脊处的峰值电场. 关键词： 衍射光学 多层介质膜光栅 模式理论 损伤阈值     

Studies of magnetization reversals about two kinds of MR curves observed in the spin valve using the (110) magnetite pinning layer

In the spin valves composed of Co/Cu/Co on the epitaxial (110) Fe₃O₄ as the pinning layer, we found out that shapes of magnetoresistance (MR) curves depended on thickness of the cobalt pinned layer (PL) with the field applied in the 〈110〉 direction of Fe₃O₄: (1) the flat-shaped MR curve showed low MR ratio under 2 nm thickness of cobalt pinned layer (PL): (2) the unusually shaped MR curve showed high MR ratio over 5 nm thickness of PL in spite of the hard direction of Co layers. We assumed that the synchronous magnetization reversal (SR) of PL and Fe₃O₄ would occur at the MR switching field due to 90° coupling between PL and Fe₃O₄ layers. Then, only occurrence of SR of PL cause the drastic change of the magnetization relative angle between FL and PL, indicating the observation of the unusually shaped MR curve having high MR ratio. On the other hand, the SR of cobalt free layer (FL) together with the PL flip also occur due to the large contribution of Néel-type ferromagnetic coupling between FL and PL, which lead to less changing the relative angle of FL and PL during magnetization processes, indicating the observation of a flat-shaped MR curve having low MR ratio. This dependence of PL thickness on MR curves might come from the balance of Néel (ferromagnetic) and stray field (antiferromagnetic) coupling due to magnetic free pole at edge of PL.