激光辅助固态薄膜淀积技术的进展 |
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引用本文: | 宋登元.激光辅助固态薄膜淀积技术的进展[J].激光技术,1991,15(5):284-289. |
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作者姓名: | 宋登元 |
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作者单位: | 1.河北大学电子系, 保定 |
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摘 要: | 本文综述了近年来激光辅助固态薄膜淀积技术的进展。简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。侧重详细介绍了这种技术在制备微电子器件所需要的高Tc超导体膜、金属膜、半导体膜和介质膜中的应用。
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关 键 词: | 半导体器件 固态薄膜 激光 淀积 |
收稿时间: | 1990-08-17 |
Advances in deposition techniques of laser-assisted solid state thin film |
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Abstract: | This atticle reviews recent advances in deposition technique of laser-assisted solid state thin films.The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition(PLED) and laser-induced chemical vapor deposition(LCVD) are simply introduce.Applications of this technique in preparing the thin films,such as high-T.superconductive films,metallic films,semi-conductive films and insulation films,used in microelectronic elements are thoroughly presented. |
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