Direct Holographic Patterning of ZnO |
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| Authors: | Clotaire Chevalier‐César Komla Nomenyo Anna Rumyantseva Anisha Gokarna Agnieszka Gwiazda Gilles Lérondel |
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| Affiliation: | Laboratoire de Nanotechnologie et d'Instrumentation Optique, Institut Charles Delaunay, CNRS UMR 6281, Université de Technologie de Troyes, Troyes, France |
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| Abstract: | Zinc oxide thin films are holographically patterned on submicronic scale by direct photodissolution method. The photodissolution process in solution is highly sensitive in the UV range (355 nm). 1D and 2D nanostructures are successfully obtained by this photoresist‐free process. The kinetic of the reaction is studied by recording the transmitted intensity through the evolution of the ZnO film thickness along the reaction time. Application of an electrical potential strongly increases the dissolution rate (1.5 μm min?1) and decreases the pattern formation time. As a first demonstration of the potential of all‐in liquid direct ZnO heterostructuring, selective growth of ZnO nanorods is performed by chemical bath deposition using holographically patterned ZnO films as a substrate. |
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| Keywords: | direct photodissolution laser interference lithography multifunctional material zinc oxide |
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