| 准分子激光直接清洗硅片上油脂的实验研究 |
| |
| 引用本文： | 谭东晖,陆冬生.准分子激光直接清洗硅片上油脂的实验研究[J].激光技术,1995,19(5):319-310. |
| |
| 作者姓名： | 谭东晖 陆冬生 |
| |
| 作者单位： | 1.华中理工大学激光技术国家重点实验室, 武汉, 430074 |
| |
| 基金项目： | 激光技术国家重点实验室开放基金 |
| |
| 摘 要： | 本文报道了采用输出激光波长为308nm,脉冲宽度为28ns的准分子激光直接清洗硅片上油脂的实验研究,通过改变光束大小或调节激光输出能量来改变基片表面上的激光能量密度,研究激光能量密度对激光清洗效果的影响。从实验中得到硅片的激光清洗阈值为0.2J/cm2,损伤阈值为1.2J/cm2。
|
| 关 键 词： | 准分子激光 表面清洗 油脂 硅片 |
Experiment studies of excimer laser cleaning of grease-contaminated Si substrate |
| |
| Tan Donghui,Lu Dongsheng,Song Wendong,Fan Yongchang,An Chengwu.Experiment studies of excimer laser cleaning of grease-contaminated Si substrate[J].Laser Technology,1995,19(5):319-310. |
| |
| Authors: | Tan Donghui Lu Dongsheng Song Wendong Fan Yongchang An Chengwu |
| |
| Abstract: | This paper reported the experiment that used excimer laser(308nm,28ns)to clean the surface of Si substrate. The influnce of laser energy density on laser cleaning was studied. During the test,the energy density irrated on the substrate surface was altered by changing the size of the light beam or adjusting the output energy of the laser.The result obtained was that the cleaning threshold of Si substrate is 0.2J/cm2,while the damage threshold of it is 1.2J/cm2. |
| |
| Keywords: | excimer laser surface cleaning grease silicon wafer |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《激光技术》浏览原始摘要信息 |
|
点击此处可从《激光技术》下载全文 |
|
